Plasma-assisted approaches in inorganic nanostructure fabrication.
Plasma is a unique medium for chemical reactions and materials preparations, which also finds its application in the current tide of nanostructure fabrication. Although plasma-assisted approaches have been long used in thin-film deposition and the top-down scheme of micro-/nanofabrication, fabrication of zero- and one-dimensional inorganic nanostructures through the bottom-up scheme is a relatively new focus of plasma application. In this article, recent plasma-assisted techniques in inorganic zero- and one-dimensional nanostructure fabrication are reviewed, which includes four categories of plasma-assisted approaches: plasma-enhanced chemical vapor deposition, thermal plasma sintering with liquid/solid feeding, thermal plasma evaporation and condensation, and plasma treatment of solids. The special effects and the advantages of plasmas on nanostructure fabrication are illustrated with examples, emphasizing on the understandings and ideas for controlling the growth, structure, and properties during plasma-assisted fabrications. This Review provides insight into the utilization of the special properties of plasmas in nanostructure fabrication.
Zheng
Jie
J
Beijing National Laboratory for Molecular Sciences, The State Key Laboratory of Rare Earth Materials Chemistry and Applications, College of Chemistry and Molecular Engineering, Peking University, Beijing 100871, P. R. China.
Yang
Rong
R
Xie
Lei
L
Qu
Jianglan
J
Liu
Yang
Y
Li
Xingguo
X
D007287:Inorganic Chemicals / Q000737:chemistry; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure; D036103:Nanotechnology / Q000379:methods*
D007287:Inorganic Chemicals