title: Facile approach to patterned binary polymer brush through photolithography and surface-initiated photopolymerization.
abstract: Taking advantage of the photobleaching and co-initiating properties of the dendritic thioxanthone (TX) photoinitiator, we developed a general and facile approach to fabricate patterned binary polymer brushes by combining photolithography and surface-initiated photopolymerization (SIPP). The dendritic TX photoinitiator monolayer was immobilized covalently on a silicon slide surface, followed by photobleaching through a mask. The resulting slides could initiate photopolymerization of methyl methacrylate (MMA) to generate a patterned poly (methyl methacrylate) (PMMA) brush, and subsequently initiate styrene (St) in the presence of TX to obtain patterned binary poly (methyl methacrylate)-polystyrene (PMMA-PS) brushes. This general and facile method could be of use in large-scale patterned binary polymer brush fabrication.
authors.affiliation: Shanghai Jiao Tong University, People's Republic of China.
authors.forename: Xinyan
authors.initials: X
authors.lastname: Jia
authors.forename: Xuesong
authors.initials: X
authors.lastname: Jiang
authors.forename: Rui
authors.initials: R
authors.lastname: Liu
authors.forename: Jie
authors.initials: J
authors.lastname: Yin
mesh_terms: D008027:Light; D008422:Materials Testing; D018625:Microscopy, Atomic Force / Q000379:methods; D008956:Models, Chemical; D015233:Models, Statistical; D008970:Molecular Weight; D038761:Photobleaching; D010777:Photochemistry / Q000379:methods*; D011108:Polymers / Q000737:chemistry*; D012822:Silicon Dioxide / Q000737:chemistry; D020058:Styrene / Q000737:chemistry; D013499:Surface Properties; D013892:Thioxanthenes / Q000737:chemistry; D013997:Time Factors; D044004:Xanthones / Q000737:chemistry
chemical_list: D011108:Polymers; D013892:Thioxanthenes; D044004:Xanthones; D020058:Styrene; D012822:Silicon Dioxide; C484911:thioxanthone