title: Highly condensed fluorinated methacrylate hybrid material for transparent low-kappa passivation layer in LCD-TFT.
abstract: Photocurable and highly condensed fluorinated methacrylate oligosiloxane, with a low dielectric constant (kappa = 2.54), was prepared by a nonhydrolytic sol-gel condensation reaction. The oligosiloxane resin was then spin-coated, photocured, and thermally baked in order to fabricate a fluorinated methacrylate hybrid material (FM hybrimer) thin film. This study investigated the application of this FM hybrimer film as a low-kappa passivation layer in LCD-based thin film transistors (TFT). It was found that a dielectric constant as low as kappa = 2.54 could be obtained, without introducing pores in the dense FM hybrimer films. This study compares FM hybrimer film characteristics with those required for passivation layers in LCD-TFTs, including thermal stability, optical transmittance, hydrophobicity, gap fill, and planarization effects as well as electrical insulation.
authors.affiliation: Laboratory of Optical Materials and Coating (LOMC), Department of Materials Science and Engineering, Korea.
authors.forename: Ji-Hoon
authors.initials: JH
authors.lastname: Oh
authors.forename: Seung-Yeon
authors.initials: SY
authors.lastname: Kwak
authors.forename: Seung-Cheol
authors.initials: SC
authors.lastname: Yang
authors.forename: Byeong-Soo
authors.initials: BS
authors.lastname: Bae