title: Ti-Si-C thin films produced by magnetron sputtering: correlation between physical properties, mechanical properties and tribological behavior.
abstract: Ti-Si-C thin films were deposited onto silicon, stainless steel and high-speed steel substrates by magnetron sputtering, using different chamber configurations. The composition of the produced films was obtained by Electron Probe Micro-Analysis (EPMA) and the structure by X-ray diffraction (XRD). The hardness and residual stresses were obtained by depth-sensing indentation and substrate deflection measurements (using Stoney's equation), respectively. The tribological behavior of the produced films was studied by pin-on-disc. The increase of the concentration of non-metallic elements (carbon and silicon) caused significant changes in their properties. Structural analysis revealed the possibility of the coexistence of different phases in the prepared films, namely Ti metallic phase (alpha-Ti or beta-Ti) in the films with higher Ti content. The coatings with highest carbon contents, exhibited mainly a sub-stoichiometric fcc NaCI TiC-type structure. These structural changes were also confirmed by resistivity measurements, whose values ranged from 10(3) omega/sq for low non-metal concentration, up to 10(6) omega/sq for the highest metalloid concentration. A strong increase of hardness and residual stresses was observed with the increase of the non-metal concentration in the films. The hardness (H) values ranged between 11 and 27 GPa, with a clear dependence on both crystalline structure and composition features. Following the mechanical behavior, the tribological results showed similar trends, with both friction coefficients and wear revealing also a straight correlation with the composition and crystalline structure of the coatings.
authors.affiliation: Physics Department, University of Minho, Campus de Gualtar, 4710-057 Braga, Portugal.
authors.forename: L
authors.initials: L
authors.lastname: Cunha
authors.forename: F
authors.initials: F
authors.lastname: Vaz
authors.forename: C
authors.initials: C
authors.lastname: Moura
authors.forename: D
authors.initials: D
authors.lastname: Munteanu
authors.forename: C
authors.initials: C
authors.lastname: Ionescu
authors.forename: J P
authors.initials: JP
authors.lastname: Rivière
authors.forename: E
authors.initials: E
authors.lastname: Le Bourhis
mesh_terms: D017554:Carbon Compounds, Inorganic / Q000737:chemistry*; D003460:Crystallization / Q000379:methods; D017097:Electric Impedance; D004595:Electroplating / Q000379:methods*; D017276:Friction; D008280:Magnetics; D008422:Materials Testing; D008567:Membranes, Artificial; D049329:Nanostructures / Q000737:chemistry*; D036103:Nanotechnology / Q000379:methods*; D017640:Silicates / Q000737:chemistry*; D017655:Silicon Compounds / Q000737:chemistry*; D013223:Statistics as Topic; D013314:Stress, Mechanical; D014025:Titanium / Q000737:chemistry*
chemical_list: D017554:Carbon Compounds, Inorganic; D008567:Membranes, Artificial; D017640:Silicates; D017655:Silicon Compounds; C103828:titanium silicide; D014025:Titanium; C022088:silicon carbide