title: Nanopattern formation in self-assembled monolayers of thiol-capped Au nanocrystals.
abstract: The structure and the stability of the transferred monolayers of gold-thiol nanoparticles, formed at air-water interface at different surface pressure, on to silicon surface have been studied using two complementary techniques, x-ray reflectivity and atomic force microscopy (AFM). Networklike nanopatterns, observed through AFM, of the in-plane aggregated nanoparticles can be attributed to the late stage drying of the liquid trapped in the islands formed by nanoparticles. During drying process the trapped liquid leaves pinholes in the islands which by the process of nucleation and growth carry the mobile nanoparticles on their advancing fronts such that the nanoparticles are trapped at the boundaries of similar adjacent holes. This process continues bringing about in-plane as well as out-of-plane restructuring in the monolayer until the liquid evaporates completely rendering a patterned structure to the islands and instability in the monolayer is then stabilized.
authors.affiliation: Saha Institute of Nuclear Physics, 1/AF Bidhannagar, Kolkata 700 064, India.
authors.forename: R
authors.initials: R
authors.lastname: Banerjee
authors.forename: S
authors.initials: S
authors.lastname: Hazra
authors.forename: S
authors.initials: S
authors.lastname: Banerjee
authors.forename: M K
authors.initials: MK
authors.lastname: Sanyal
mesh_terms: D000388:Air; D006046:Gold / Q000737:chemistry*; D053768:Metal Nanoparticles / Q000737:chemistry*; D018625:Microscopy, Atomic Force / Q000379:methods; D046529:Microscopy, Electron, Transmission / Q000379:methods; D015233:Models, Statistical; D036103:Nanotechnology / Q000379:methods*; D010084:Oxidation-Reduction; D013056:Spectrophotometry, Ultraviolet / Q000379:methods; D013438:Sulfhydryl Compounds / Q000737:chemistry; D014867:Water / Q000737:chemistry; D014965:X-Rays
chemical_list: D013438:Sulfhydryl Compounds; D014867:Water; D006046:Gold