title: Deep-etched sinusoidal polarizing beam splitter grating.
abstract: A sinusoidal-shaped fused-silica grating as a highly efficient polarizing beam splitter (PBS) is investigated based on the simplified modal method. The grating structure depends mainly on the ratio of groove depth to grating period and the ratio of incident wavelength to grating period. These ratios can be used as a guideline for the grating design at different wavelengths. A sinusoidal-groove PBS grating is designed at a wavelength of 1310 nm under Littrow mounting, and the transmitted TM and TE polarized waves are mainly diffracted into the zeroth order and the -1st order, respectively. The grating profile is optimized by using rigorous coupled-wave analysis. The designed PBS grating is highly efficient (>95.98%) over the O-band wavelength range (1260-1360 nm) for both TE and TM polarizations. The sinusoidal grating can exhibit higher diffraction efficiency, larger extinction ratio, and less reflection loss than the rectangular-groove PBS grating. By applying wet etching technology on the rectangular grating, which was manufactured by holographic recording and inductively coupled plasma etching technology, the sinusoidal grating can be approximately fabricated. Experimental results are in agreement with theoretical values.
authors.affiliation: Information Optics Lab, Shanghai Institute of Optics and Fine Mechanics, Academia Sinica, P.O. Box 800-211, Shanghai 201800, China.
authors.forename: Jijun
authors.initials: J
authors.lastname: Feng
authors.forename: Changhe
authors.initials: C
authors.lastname: Zhou
authors.forename: Hongchao
authors.initials: H
authors.lastname: Cao
authors.forename: Peng
authors.initials: P
authors.lastname: Lv