Residual stress of free-standing membranes of yttria-stabilized zirconia for micro solid oxide fuel cell applications.
The present study is devoted to analyze the compatibility of yttria-stabilized zirconia thin films prepared by pulsed laser deposition and metalorganic chemical vapor deposition techniques, with microfabrication processes based on silicon technologies for micro solid oxide fuel cells applications. Deposition of yttria-stabilized zirconia on Si/SiO2/Si3N4 substrates was optimized for both techniques in order to obtain high density and homogeneity, as well as a good crystallinity for film thicknesses ranging from 60 to 240 nm. In addition, stabilized zirconia free-standing membranes were fabricated from the deposited films with surface areas between 50 x 50 microm2 and 820 x 820 microm2. Particular emphasis was made on the analysis of the effect of the nature of the deposition technique and the different design and fabrication parameters (membrane area, thickness and substrate deposition temperature) on the residual stress of the membranes in order to control their thermomechanical stability for application as electrolyte in micro solid oxide fuel cells.
Tarancón
Albert
A
IMB-CNM (CSIC), National Institute of Microelectronics, CSIC, Campus UAB, 08193 Bellaterra, Barcelona, Spain.
Sabaté
Neus
N
Cavallaro
Andrea
A
Gràcia
Isabel
I
Roqueta
Jaume
J
Garbayo
Iñigo
I
Esquivel
Juan P
JP
Garcia
Gemma
G
Cané
Carles
C
Santiso
José
J