title: In situ peeling of one-dimensional nanostructures using a dual-probe nanotweezer.
abstract: We reported a method for in situ peeling force measurement of one-dimensional nanostructures using a dual-probe nanotweezer, which is developed on the principle of force microscopy. Benefiting from capabilities of image scanning and accurate force sensing, the nanotweezer is capable of positioning one-dimensional nanostructures deposited on a surface and then performing in situ peeling tests with pick-and-place operations at different peeling locations of interest along a selected nanostructure. In experiments, nanoscale peeling of silicon nanowires (SiNWs) on a silicon substrate has been studied. Peeling locations at the end and in the middle of the SiNW were tested and the results indicate that approximate peeling energies are needed.
authors.affiliation: Institut des Systèmes Intelligents et Robotique, Université Pierre et Marie Curie/CNRS UMR 7222, BC 173, 4 Place Jussieu, 75005 Paris, France. xie@isir.upmc.fr
authors.forename: Hui
authors.initials: H
authors.lastname: Xie
authors.forename: Stéphane
authors.initials: S
authors.lastname: Régnier
mesh_terms: D000465:Algorithms; D003198:Computer Simulation; D036103:Nanotechnology / Q000295:instrumentation* / Q000379:methods*; D012825:Silicon
chemical_list: D012825:Silicon