title: Rapid and sensitive electrochemical sensing of DNA damage induced by V2O5 nanobelts/HCl/H2O2 system in natural dsDNA layer-by-layer films.
abstract: The detection of DNA damage is one of the most important topics in the DNA research fields. In the present work, oppositely charged natural dsDNA and poly(diallyldimethyl ammonium chloride) (PDDA) were assembled into (PDDA/dsDNA)(3) layer-by-layer films on electrode surface, and Ru(bpy)(3)(2+) and Co(phen)(3)(3+) in solution were used as electroactive probes to detect oxidative damage of natural dsDNA in the films after incubation of the films in V(2)O(5) nanobelts/HCl/H(2)O(2) solution. The mechanism of DNA oxidative damage caused by the V(2)O(5) nanobelts/HCl/H(2)O(2) system was similar to that of Fenton-type reaction. The reaction of V(2)O(5) nanobelts with HCl would produce V(IV), and the produced V(IV) would further react with H(2)O(2), generating hydroxyl radicals (OH*) as in the Fenton-type reaction, which could severely damage DNA in the films. The present work provided an in vitro model system to mimic the pathway of DNA damage in real bioprocess through a simple electrochemical approach combined with layer-by-layer assembly. This approach also showed promising applications in rapid and sensitive screening of new nanomaterials and chemicals in vitro for their potential genotoxicity.
authors.affiliation: Key Laboratory of Eco-chemical Engineering (Ministry of Education), College of Chemistry and Molecular Engineering, Qingdao University of Science and Technology, Qingdao 266042, China.
authors.forename: Wei
authors.initials: W
authors.lastname: Zhang
authors.forename: Tao
authors.initials: T
authors.lastname: Yang
authors.forename: Weijuan
authors.initials: W
authors.lastname: Li
authors.forename: Guicun
authors.initials: G
authors.lastname: Li
authors.forename: Kui
authors.initials: K
authors.lastname: Jiao
mesh_terms: D015374:Biosensing Techniques / Q000295:instrumentation*; D003217:Conductometry / Q000295:instrumentation*; D004247:DNA / Q000032:analysis / Q000737:chemistry / Q000235:genetics*; D004249:DNA Damage / Q000235:genetics*; D004566:Electrodes; D004867:Equipment Design; D019544:Equipment Failure Analysis; D006851:Hydrochloric Acid / Q000737:chemistry; D006861:Hydrogen Peroxide / Q000737:chemistry; D008567:Membranes, Artificial; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure; D015203:Reproducibility of Results; D012680:Sensitivity and Specificity; D017968:Vanadium Compounds / Q000737:chemistry*
chemical_list: D008567:Membranes, Artificial; D017968:Vanadium Compounds; D004247:DNA; D006861:Hydrogen Peroxide; C066075:vanadium pentoxide; D006851:Hydrochloric Acid