Growth of TiO2 nanorods on a Ta substrate by metal-organic chemical vapor deposition.
TiO2 nanorods were successfully grown on Tantalum (Ta) substrates using titanium tetra isopropoxide (TTIP) as a single precursor without any carriers or bubbling gases. For characterization of the TiO2 structures, scanning electron microscopy (SEM), X-ray diffraction (XRD), and X-ray photoelectron spectroscopy (XPS) were employed. For substrate temperatures below 800 degrees C, a rough film structure without nanorods could be found. However, at a sample temperature of 800 degrees C, nanorod structures with a respective diameter and length of 0.1 approximately 0.2 microm and 0.7 approximately 1.5 microm, respectively, could be synthesized. The nanorods exhibited a rutile phase with a 2:1 stoichiometry of O:Ti, identified using XRD and XPS. When the growth temperature exceeded 800 degrees C, agglomeration of the nanorods was identified.
Lee
Kang Suk
KS
Department of Chemistry, Sungkyunkwan University, Suwon 440-746, Korea.
Hyun
Jae-Sung
JS
Seo
Hyun Ook
HO
Kim
Young Dok
YD
Boo
Jin-Hyo
JH