In situ peeling of one-dimensional nanostructures using a dual-probe nanotweezer.
We reported a method for in situ peeling force measurement of one-dimensional nanostructures using a dual-probe nanotweezer, which is developed on the principle of force microscopy. Benefiting from capabilities of image scanning and accurate force sensing, the nanotweezer is capable of positioning one-dimensional nanostructures deposited on a surface and then performing in situ peeling tests with pick-and-place operations at different peeling locations of interest along a selected nanostructure. In experiments, nanoscale peeling of silicon nanowires (SiNWs) on a silicon substrate has been studied. Peeling locations at the end and in the middle of the SiNW were tested and the results indicate that approximate peeling energies are needed.
Xie
Hui
H
Institut des Systèmes Intelligents et Robotique, Université Pierre et Marie Curie/CNRS UMR 7222, BC 173, 4 Place Jussieu, 75005 Paris, France. xie@isir.upmc.fr
Régnier
Stéphane
S
D000465:Algorithms; D003198:Computer Simulation; D036103:Nanotechnology / Q000295:instrumentation* / Q000379:methods*; D012825:Silicon
D012825:Silicon