title: Chemically modified superhydrophobic WO(x) nanowire arrays and UV photopatterning.
abstract: A facile route is reported for the fabrication of superhydrophobic tungsten oxide (WO(x)) nanowire surfaces through the chemical adsorption of alkyltrichlorosilane with a static water contact angle (CA) of 163.5 degrees. It is confirmed that CAs on the superhydrophobic surface decreased gradually under UV illumination because of the UV-assisted decomposition of alkyltrichlorosilane chemically adsorbed onto the surface. Superhydrophobic-superhydrophilic switching is also demonstrated by alternating self-assembled monolayer deposition and UV irradiation on the photopatterned nanowire surfaces. Furthermore, the superhydrophobic surface could be transformed selectively into a hydrophilic state by simply exposing the surface to UV through a shadow mask. These studies provide a relatively simple strategy for the design of superhydrophobic surfaces.
authors.affiliation: Surface Chemistry Laboratory of Electronic Materials, Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang 790-784, Korea.
authors.forename: Geunjae
authors.initials: G
authors.lastname: Kwak
authors.forename: Mikyung
authors.initials: M
authors.lastname: Lee
authors.forename: Kijung
authors.initials: K
authors.lastname: Yong