Aerial image based technique for measurement of lens aberrations up to 37th Zernike coefficient in lithographic tools under partial coherent illumination.
This paper proposes a technique for in situ measurement of lens aberrations up to the 37th Zernike coefficient in lithographic tools under partial coherent illumination. The technique requires the acquisition and analysis of aerial image intensities of a set of 36 binary gratings with different pitches and orientations. By simplifying the theoretical derivation of the optical imaging under partial coherent illumination, two linear models are proposed in a compact expression with two matrixes, which can be easily obtained in advance by numerical calculation instead of by lithographic simulators, and then used to determine the Zernike coefficients of odd aberration and even aberration respectively. The simulation work conducted by PROLITH has validated the theoretical derivation and confirms that such a technique yields a superior quality of wavefront estimate with an accuracy of Zernike coefficients on the order of 0.1 m lambdas (lambda = 193 nm) and an accuracy of wavefronts on the order of m lambdas, due to further considering the influence of the partial coherence factor on pupil sampling. It is fully expected that this technique will simple to implement and will provide a useful practical means for the in-line monitoring of imaging quality of lithographic tools under partial coherent illumination.
Liu
Wei
W
Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan 430074, China.
Liu
Shiyuan
S
Zhou
Tingting
T
Wang
Lijuan
L