title: Tunable Bragg reflectors on silicon-on-insulator rib waveguides.
abstract: We present the design, fabrication and characterization of Bragg reflectors on silicon-on-insulator rib waveguides. The fabrication is based on a new double lithographic process, combining electron-beam lithography for the grating and photolithography for the waveguides. This process allows the realization of low loss reflectors, which were fully characterized. The influence of the etching depth and of the waveguide geometry on the reflector performance is considered. We demonstrate a reflectivity larger than 80% over a bandwidth of 0.8 nm with an insertion loss of only 0.5 dB. A thermal tunability of the device is also considered, showing that a shift of the reflected wavelength of 77 pm/K is possible.
authors.affiliation: Technische Universität Berlin, Fachgebiet Hochfrequenztechnik, Einsteinufer 25, 10587 Berlin, Germany. ivano.giuntoni@tu-berlin.de
authors.forename: Ivano
authors.initials: I
authors.lastname: Giuntoni
authors.forename: Andrzej
authors.initials: A
authors.lastname: Gajda
authors.forename: Michael
authors.initials: M
authors.lastname: Krause
authors.forename: Ralf
authors.initials: R
authors.lastname: Steingrüber
authors.forename: Jürgen
authors.initials: J
authors.lastname: Bruns
authors.forename: Klaus
authors.initials: K
authors.lastname: Petermann