Note: Thermal analog to atomic force microscopy force-displacement measurements for nanoscale interfacial contact resistance.
Thermal diffusion measurements on polymethylmethacrylate-coated Si substrates using heated atomic force microscopy tips were performed to determine the contact resistance between an organic thin film and Si. The measurement methodology presented demonstrates how the thermal contrast signal obtained during a force-displacement ramp is used to quantify the resistance to heat transfer through an internal interface. The results also delineate the interrogation thickness beyond which thermal diffusion in the organic thin film is not affected appreciably by the underlying substrate.
Iverson
Brian D
BD
Sandia National Laboratories, Albuquerque, New Mexico 87185, USA.
Blendell
John E
JE
Garimella
Suresh V
SV