Parallel optical nanolithography using nanoscale bowtie aperture array.
We report results of parallel optical nanolithography using nanoscale bowtie aperture array. These nanoscale bowtie aperture arrays are used to focus a laser beam into multiple nanoscale light spots for parallel nano-lithography. Our work employed a frequency-tripled diode-pumped solid state (DPSS) laser (lambda = 355 nm) and Shipley S1805 photoresist. An interference-based optical alignment system was employed to position the bowtie aperture arrays with the photoresist surface. Nanoscale direct-writing of sub-100nm features in photoresist in parallel is demonstrated.
Uppuluri
Sreemanth M V
SM
School of Mechanical Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, IN 47906,USA.
Kinzel
Edward C
EC
Li
Yan
Y
Xu
Xianfan
X
D000465:Algorithms; D000535:Aluminum / Q000737:chemistry; D004867:Equipment Design; D008027:Light; D015233:Models, Statistical; D049329:Nanostructures; D036103:Nanotechnology / Q000379:methods*; D055095:Optics and Photonics; D010777:Photochemistry / Q000379:methods
D000535:Aluminum