Oxidized silicon-on-insulator (OxSOI) from bulk silicon: a new photonic platform.
We demonstrate a bulk silicon alternative to the conventional silicon-on-insulator photonics platform, using common CMOS process-based Si(3)N(4) masking and oxidation techniques. We show waveguide losses as low as 2.92 dB/cm with a technique that can be implemented on the front-end of a typical CMOS fabrication line.
Sherwood-Droz
Nicolás
N
School of Electrical and Computer Engineering, Cornell University, Ithaca, NY 14853, USA. nrs35@cornell.edu
Gondarenko
Alexander
A
Lipson
Michal
M
D004553:Electric Conductivity; D004867:Equipment Design; D019544:Equipment Failure Analysis; D010084:Oxidation-Reduction; D017785:Photons; D012031:Refractometry / Q000295:instrumentation*; D012825:Silicon / Q000737:chemistry*
D012825:Silicon