title: Near-field ellipsometry for thin film characterization.
abstract: A near-field ellipsometry method is presented for nano-scale thin film characterization. The technique fuses the topographic and ellipso-metric optical measurements that are simultaneously obtained by a scanning near-field optical microscopy (SNOM). It is shown that the proposed near-field ellipsometry is able to attain nano-scale lateral resolution and correct artifacts in characterization. The effectiveness of the proposed method is verified by simulation and experimental studies.
authors.affiliation: Singapore Institute of Manufacturing Technology, 71 Nanyang Drive, 638075, Singapore.
authors.forename: Zhuang
authors.initials: Z
authors.lastname: Liu
authors.forename: Ying
authors.initials: Y
authors.lastname: Zhang
authors.forename: Shaw Wei
authors.initials: SW
authors.lastname: Kok
authors.forename: Boon Ping
authors.initials: BP
authors.lastname: Ng
authors.forename: Yeng Chai
authors.initials: YC
authors.lastname: Soh
mesh_terms: D008422:Materials Testing / Q000379:methods*; D008567:Membranes, Artificial; D020527:Microscopy, Scanning Probe / Q000379:methods*; D013499:Surface Properties
chemical_list: D008567:Membranes, Artificial