title: Effect of repeated x-ray exposure on the resolution of amorphous selenium based x-ray imagers.
abstract: OBJECTIVE
  A numerical model and the experimental methods to study the x-ray exposure dependent change in the modulation transfer function (MTF) of amorphous selenium (a-Se) based active matrix flat panel imagers (AMFPIs) are described. The physical mechanisms responsible for the x-ray exposure dependent change in MTF are also investigated.
  
  
  METHODS
  A numerical model for describing the x-ray exposure dependent MTF of a-Se based AMFPIs has been developed. The x-ray sensitivity and MTF of an a-Se AMFPI have been measured as a function of exposure. The instantaneous electric field and free and trapped carrier distributions in the photoconductor layer are obtained by numerically solving the Poisson's equation, continuity equations, and trapping rate equations using the backward Euler finite difference method. From the trapped carrier distributions, a method for calculating the MTF due to incomplete charge collection is proposed.
  
  
  RESULTS
  The model developed in this work and the experimental data show a reasonably good agreement. The model is able to simultaneously predict the dependence of the sensitivity and MTF on accumulated exposure at different applied fields and bias polarities, with the same charge transport parameters that are typical of the particular a-Se photoconductive layer that is used in these AMFPIs. Under negative bias, the MTF actually improves with the accumulated x-ray exposure while the sensitivity decreases. The MTF enhancement with exposure decreases with increasing applied field.
  
  
  CONCLUSIONS
  The most prevalent processes that control the MTF under negative bias are the recombination of drifting holes with previously trapped electrons (electrons remain in deep traps due to their long release times compared with the time scale of the experiments) and the deep trapping of drifting holes and electrons.
authors.affiliation: Department of Electrical and Computer Engineering, Concordia University, 1455 de Maisonneuve W, Montreal, Quebec H3G 1M8, Canada. kabir@encs.concordia.ca
authors.forename: M Z
authors.initials: MZ
authors.lastname: Kabir
authors.forename: L
authors.initials: L
authors.lastname: Chowdhury
authors.forename: G
authors.initials: G
authors.lastname: DeCrescenzo
authors.forename: O
authors.initials: O
authors.lastname: Tousignant
authors.forename: S O
authors.initials: SO
authors.lastname: Kasap
authors.forename: J A
authors.initials: JA
authors.lastname: Rowlands
mesh_terms: D004307:Dose-Response Relationship, Radiation; D004867:Equipment Design; D019544:Equipment Failure Analysis; D011829:Radiation Dosage; D015203:Reproducibility of Results; D012643:Selenium / Q000528:radiation effects*; D012680:Sensitivity and Specificity; D014963:X-Ray Intensifying Screens
chemical_list: D012643:Selenium
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