Near-field ellipsometry for thin film characterization.
A near-field ellipsometry method is presented for nano-scale thin film characterization. The technique fuses the topographic and ellipso-metric optical measurements that are simultaneously obtained by a scanning near-field optical microscopy (SNOM). It is shown that the proposed near-field ellipsometry is able to attain nano-scale lateral resolution and correct artifacts in characterization. The effectiveness of the proposed method is verified by simulation and experimental studies.
Liu
Zhuang
Z
Singapore Institute of Manufacturing Technology, 71 Nanyang Drive, 638075, Singapore.
Zhang
Ying
Y
Kok
Shaw Wei
SW
Ng
Boon Ping
BP
Soh
Yeng Chai
YC
D008422:Materials Testing / Q000379:methods*; D008567:Membranes, Artificial; D020527:Microscopy, Scanning Probe / Q000379:methods*; D013499:Surface Properties
D008567:Membranes, Artificial