Enhanced surface sensitivity in secondary ion mass spectrometric analysis of organic thin films using size-selected Ar gas-cluster ion projectiles.
A size-selected argon (Ar) gas-cluster ion beam (GCIB) was applied to the secondary ion mass spectrometry (SIMS) of a 1,4-didodecylbenzene (DDB) thin film. The samples were also analyzed by SIMS using an atomic Ar(+) ion projectile and X-ray photoelectron spectroscopy (XPS). Compared with those in the atomic-Ar(+) SIMS spectrum, the fragment species, including siloxane contaminants present on the sample surface, were enhanced several hundred times in the Ar gas-cluster SIMS spectrum. XPS spectra during beam irradiation indicate that the Ar GCIB sputters contaminants on the surface more effectively than the atomic Ar(+) ion beam. These results indicate that a large gas-cluster projectile can sputter a much shallower volume of organic material than small projectiles, resulting in an extremely surface-sensitive analysis of organic thin films.
Tanaka
Motohiro
M
Department of Mechanical and System Engineering, Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeji, Hyogo 671-2201, Japan.
Moritani
Kousuke
K
Hirota
Tomokazu
T
Toyoda
Noriaki
N
Yamada
Isao
I
Inui
Norio
N
Mochiji
Kozo
K
D001128:Argon / Q000737:chemistry*; D001555:Benzene Derivatives / Q000737:chemistry*; D056951:Photoelectron Spectroscopy; D012833:Siloxanes / Q000737:chemistry; D018629:Spectrometry, Mass, Secondary Ion / Q000379:methods*; D013499:Surface Properties
D001555:Benzene Derivatives; D012833:Siloxanes; D001128:Argon