title: Fabrication of surface plasmon-coupled si nanodots in au-embedded silicon oxide nanowires.
authors.affiliation: Samsung Advanced Institute of Technology, Suwon, South Korea. gs8144.park@samsung.com <gs8144.park@samsung.com>
authors.forename: Gyeong-Su
authors.initials: GS
authors.lastname: Park
authors.forename: Hyuksang
authors.initials: H
authors.lastname: Kwon
authors.forename: Eun Kyung
authors.initials: EK
authors.lastname: Lee
authors.forename: Seong Keun
authors.initials: SK
authors.lastname: Kim
authors.forename: Jun Ho
authors.initials: JH
authors.lastname: Lee
authors.forename: Xiang Shu
authors.initials: XS
authors.lastname: Li
authors.forename: Jae Gwan
authors.initials: JG
authors.lastname: Chung
authors.forename: Sung
authors.initials: S
authors.lastname: Heo
authors.forename: In Yong
authors.initials: IY
authors.lastname: Song
authors.forename: Jae Hak
authors.initials: JH
authors.lastname: Lee
authors.forename: Byoung Lyong
authors.initials: BL
authors.lastname: Choi
authors.forename: Jong Min
authors.initials: JM
authors.lastname: Kim
mesh_terms: D006046:Gold / Q000737:chemistry*; D053768:Metal Nanoparticles / Q000737:chemistry*; D017348:Microscopy, Electron, Scanning Transmission; D053770:Nanowires / Q000737:chemistry*; D012822:Silicon Dioxide / Q000737:chemistry*; D020349:Surface Plasmon Resonance; D013499:Surface Properties
chemical_list: D006046:Gold; D012822:Silicon Dioxide