title: Parallel optical nanolithography using nanoscale bowtie aperture array.
abstract: We report results of parallel optical nanolithography using nanoscale bowtie aperture array. These nanoscale bowtie aperture arrays are used to focus a laser beam into multiple nanoscale light spots for parallel nano-lithography. Our work employed a frequency-tripled diode-pumped solid state (DPSS) laser (lambda = 355 nm) and Shipley S1805 photoresist. An interference-based optical alignment system was employed to position the bowtie aperture arrays with the photoresist surface. Nanoscale direct-writing of sub-100nm features in photoresist in parallel is demonstrated.
authors.affiliation: School of Mechanical Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, IN 47906,USA.
authors.forename: Sreemanth M V
authors.initials: SM
authors.lastname: Uppuluri
authors.forename: Edward C
authors.initials: EC
authors.lastname: Kinzel
authors.forename: Yan
authors.initials: Y
authors.lastname: Li
authors.forename: Xianfan
authors.initials: X
authors.lastname: Xu
mesh_terms: D000465:Algorithms; D000535:Aluminum / Q000737:chemistry; D004867:Equipment Design; D008027:Light; D015233:Models, Statistical; D049329:Nanostructures; D036103:Nanotechnology / Q000379:methods*; D055095:Optics and Photonics; D010777:Photochemistry / Q000379:methods
chemical_list: D000535:Aluminum