Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging.
We discuss the aberration-induced intensity imbalance of alternating phase-shifting mask (Alt-PSM) in lithographic imaging, in contrast to numerous studies on mask-induced intensity imbalance. Based on the Hopkins theory of partial coherent imaging, a linear relationship between the intensity difference of adjacent peaks in an Alt-PSM image and even aberration is established by formulations and verified by numerical results. The application of the linear relationship is briefly discussed.
Peng
Bo
B
Information Optics Laboratory, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China.
Wang
Xiangzhao
X
Qiu
Zicheng
Z
Yuan
Qiongyan
Q
Cao
Yuting
Y