Nonlithographic patterning and metal-assisted chemical etching for manufacturing of tunable light-emitting silicon nanowire arrays.
Semiconductor nanowires have potential applications in photovoltaics, batteries, and thermoelectrics. We report a top-down fabrication method that involves the combination of superionic-solid-state-stamping (S4) patterning with metal-assisted-chemical-etching (MacEtch), to produce silicon nanowire arrays with defined geometry and optical properties in a manufacturable fashion. Strong light emission in the entire visible and near infrared wavelength range at room temperature, tunable by etching condition, attributed to surface features, and enhanced by silver surface plasmon, is demonstrated.
Chern
Winston
W
Center for Nanoscale Chemical-Electrical-Mechanical Manufacturing Systems, University of Illinois, Urbana, Illinois 61822, USA.
Hsu
Keng
K
Chun
Ik Su
IS
Azeredo
Bruno P de
BP
Ahmed
Numair
N
Kim
Kyou-Hyun
KH
Zuo
Jian-min
JM
Fang
Nick
N
Ferreira
Placid
P
Li
Xiuling
X
D003460:Crystallization / Q000379:methods*; D004867:Equipment Design; D019544:Equipment Failure Analysis; D008029:Lighting / Q000295:instrumentation*; D008422:Materials Testing; D008968:Molecular Conformation; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000295:instrumentation*; D010316:Particle Size; D012666:Semiconductors; D012825:Silicon / Q000737:chemistry*; D012834:Silver / Q000737:chemistry*; D013499:Surface Properties
D012834:Silver; D012825:Silicon