title: Nanoscale three-dimensional patterning of molecular resists by scanning probes.
abstract: For patterning organic resists, optical and electron beam lithography are the most established methods; however, at resolutions below 30 nanometers, inherent problems result from unwanted exposure of the resist in nearby areas. We present a scanning probe lithography method based on the local desorption of a glassy organic resist by a heatable probe. We demonstrate patterning at a half pitch down to 15 nanometers without proximity corrections and with throughputs approaching those of Gaussian electron beam lithography at similar resolution. These patterns can be transferred to other substrates, and material can be removed in successive steps in order to fabricate complex three-dimensional structures.
authors.affiliation: IBM Research-Zurich, Säumerstrasse 4, 8803 Rüschlikon, Switzerland.
authors.forename: David
authors.initials: D
authors.lastname: Pires
authors.forename: James L
authors.initials: JL
authors.lastname: Hedrick
authors.forename: Anuja
authors.initials: A
authors.lastname: De Silva
authors.forename: Jane
authors.initials: J
authors.lastname: Frommer
authors.forename: Bernd
authors.initials: B
authors.lastname: Gotsmann
authors.forename: Heiko
authors.initials: H
authors.lastname: Wolf
authors.forename: Michel
authors.initials: M
authors.lastname: Despont
authors.forename: Urs
authors.initials: U
authors.lastname: Duerig
authors.forename: Armin W
authors.initials: AW
authors.lastname: Knoll