Solvent properties of hydrazine in the preparation of metal chalcogenide bulk materials and films.
A combination of unique solvent properties of hydrazine enables the direct dissolution of a range of metal chalcogenides at ambient temperature, rendering this an extraordinarily simple and soft synthetic approach to prepare new metal chalcogenide-based materials. The extended metal chalcogenide parent framework is broken up during this process, and the resulting metal chalcogenide building units are re-organized into network structures (from 0D to 3D) based upon their interactions with the hydrazine/hydrazinium moieties. This Perspective will review recent crystal and materials chemistry developments within this family of compounds and will briefly discuss the utility of this approach in metal chalcogenide thin-film deposition.
Yuan
Min
M
IBM T. J. Watson Research Center, P. O. Box 218, Yorktown Heights, NY 10598, USA.
Mitzi
David B
DB
D018011:Chalcogens / Q000737:chemistry*; D006834:Hydrazines / Q000737:chemistry*; D008422:Materials Testing; D008567:Membranes, Artificial; D008670:Metals / Q000737:chemistry*; D012997:Solvents / Q000737:chemistry; D013696:Temperature
D018011:Chalcogens; D006834:Hydrazines; D008567:Membranes, Artificial; D008670:Metals; D012997:Solvents; C029424:hydrazine