Patterning microfluidic device wettability using flow confinement.
We present a simple method to spatially pattern the surface properties of microfluidic devices using flow confinement. Our technique allows surface patterning with micron-scale resolution. To demonstrate its effectiveness, we use it to pattern wettability to form W/O/W and O/W/O double emulsions.
Abate
Adam R
AR
School of Engineering and Applied Sciences/Department of Physics, Harvard University, Cambridge, Massachusetts, USA.
Thiele
Julian
J
Weinhart
Marie
M
Weitz
David A
DA