Soft x-ray radiation from laser-produced plasmas: characterization of radiation emission and its use in x-ray lithography.
Laser pulses of 15 ns and </=3 J at 1064nm and </=1.2 J at 532 nm were focused onto steel targets to produce plasmas emitting intense soft x-ray radiation pulses. The plasma generation is described, and the x-ray emission is spectrally and spatially characterized. Using this plasma as an x-ray source, FBM120 resist was exposed through a gold patterned 2-microm silicon mask. Exposing the same resist to a primary standard source (electron storage ring BESSY) the plasma x-ray emission was evaluated resulting in conversion efficiencies (laser into x-ray radiation) of up to 3.4% for 1064 nm and up to 5.0% for 532-nm laser radiation pulses.
Kühne
M
M
Petzold
H C
HC