Electron attachment to sulfur oxyhalides: SOF2, SOCl2, SO2F2, SO2Cl2, and SO2FCl attachment rate coefficients, 300-900 K.
Electron attachment to SOF(2), SOCl(2), SO(2)F(2), SO(2)FCl, and SO(2)Cl(2) was studied with two flowing-afterglow Langmuir-probe apparatuses over the temperature range 300-900 K. Attachment rate coefficients at 300 K are k(a) = 2.6+/-0.8x10(-10)(SOF(2)), 1.8+/-0.5x10(-8)(SOCl(2)), 4.8+/-0.7x10(-10)(SO(2)F(2)), 2.4+/-0.7x10(-9)(SO(2)Cl(2)), and 2.0+/-0.6x10(-7) cm(3) s(-1)(SO(2)FCl). Arrhenius plots of the data imply activation energies of 56+/-22 meV(SOF(2)), 92+/-40(SO(2)F(2)), 44+/-22 meV(SOCl(2)), and 29+/-15 meV(SO(2)Cl(2)). The rate coefficients for SO(2)FCl decrease slightly with temperature, commensurate with the decrease in the capture rate coefficient. Electron attachment to SOF(2) and SO(2)F(2) is nondissociative, while reaction with SOCl(2), SO(2)FCl, and SO(2)Cl(2) is dissociative. Dissociative attachment is dominated by channels arising from S-Cl bond cleavage but also includes a minor channel forming a dihalide product ion. Branching fraction data are reported for the dissociative attachment channels.
Miller
Thomas M
TM
Space Vehicles Directorate, Air Force Research Laboratory, 29 Randolph Road, Hanscom Air Force Base, Massachusetts 01731-3010, USA. thomas.miller.3@bc.edu
Friedman
Jeffrey F
JF
Caples
Connor M
CM
Shuman
Nicholas S
NS
Van Doren
Jane M
JM
Bardaro
Michael F
MF
Nguyen
Pho
P
Zweiben
Cindy
C
Campbell
Matthew J
MJ
Viggiano
A A
AA
D017606:Chlorine Compounds / Q000737:chemistry*; D004583:Electrons; D017611:Fluorine Compounds / Q000737:chemistry*; D017601:Oxygen Compounds / Q000737:chemistry*; D013457:Sulfur Compounds / Q000737:chemistry*; D013696:Temperature
D017606:Chlorine Compounds; D017611:Fluorine Compounds; D017601:Oxygen Compounds; D013457:Sulfur Compounds