title: Use of a rapid thermal annealing system to initiate indiffusion for fabrication of Ti:LiNbO(3) optical channel waveguides.
abstract: A rapid thermal annealing (RTA) system has been used to initiate indiffusion of Ti into LiNbO(3) for fabrication of optical channel waveguides. Four separate processes are investigated, each with different RTA temperature vs time variations followed by furnace heating. The sample processed with a fast initial ramp of temperature vs time to 875 degrees C yielded the lowest waveguide propagation loss of 1 dB/cm at a wavelength of 632.8 nm, compared with samples processed with other RTA variations and with a sample undergoing only furnace processing. Use of a dry O(2) ambient during RTA resulted in a smoother waveguide surface with no outdiffusion, when compared with use of a wet O(2) ambient.
authors.forename: D C
authors.initials: DC
authors.lastname: Cromer
authors.forename: G N
authors.initials: GN
authors.lastname: De Brabander
authors.forename: J T
authors.initials: JT
authors.lastname: Boyd
authors.forename: H E
authors.initials: HE
authors.lastname: Jackson
authors.forename: S
authors.initials: S
authors.lastname: Sriram