title: H(+) lithography for 3-D integration of optical circuits.
abstract: Optical structures in polymethylmethacrylate can be generated with a high energy H(+) beam. The depth of the structures is up to 1 mm. We describe this new technique and demonstrate first results.
authors.forename: K H
authors.initials: KH
authors.lastname: Brenner
authors.forename: M
authors.initials: M
authors.lastname: Frank
authors.forename: M
authors.initials: M
authors.lastname: Kufner
authors.forename: S
authors.initials: S
authors.lastname: Kufner