title: Laser scanner for direct writing lithography.
abstract: A laser scanner and a stepping xy stage have been developed for direct writing lithography in the micron and the submicron range. System design is described and examples of exposed photoresist with a structure size of 1 microm are presented.
authors.forename: C
authors.initials: C
authors.lastname: Rensch
authors.forename: S
authors.initials: S
authors.lastname: Hell
authors.forename: M V
authors.initials: MV
authors.lastname: Schickfus
authors.forename: S
authors.initials: S
authors.lastname: Hunklinger