title: Surface segregation of fluorinated moieties on poly(methyl methacrylate-ran-2-perfluorooctylethyl methacrylate) films during film formation: Entropic or enthalpic influences.
abstract: The effects of solvents, fluorinated monomer content and film-formation methods on the surface structures of random copolymers composed of methyl methacrylate (MMA) and 2-perfluorooctylethyl methacrylate (FMA) were investigated by contact angle goniometry, X-ray photoelectron spectroscopy, sum frequency generation (SFG) vibrational spectroscopy and surface tension measurement. It is found that, with cyclohexanone as the solvent, there is a critical FMA content of 9mol%, below which the copolymer films by spin coating have a more surface segregation extent of fluorinated moieties than those by solution casting; above which the copolymer films by solution casting have a more surface segregation extent of fluorinated moieties than those by spin coating. However, with toluene as solvent, the critical FMA content lowers down to 3mol%. We believe that the solvent nature and the content of fluorinated moieties in the random copolymer have the great effect because the combined effect of these two factors can determine the random copolymer chain conformations and their thermodynamic dominating factors in the solution and at the solution-air interface. A thermodynamic analysis combining the entropic and enthalpic effects is suggested to explain the observed phenomenon. This research is believed to obtain an enhanced understanding of the surface formation mechanism of the polymer films and thus demonstrate how to promote the segregation of fluorinated moieties at the polymer film surfaces.
authors.affiliation: Department of Chemistry, Key Laboratory of Advanced Textile Materials and Manufacturing Technology of the Education Ministry, Zhejiang Sci-Tech University, Hangzhou 310018, China.
authors.forename: Xiuyun
authors.initials: X
authors.lastname: Ye
authors.forename: Biao
authors.initials: B
authors.lastname: Zuo
authors.forename: Mao
authors.initials: M
authors.lastname: Deng
authors.forename: Yanlin
authors.initials: Y
authors.lastname: Hei
authors.forename: Huagang
authors.initials: H
authors.lastname: Ni
authors.forename: Xiaolin
authors.initials: X
authors.lastname: Lu
authors.forename: Xinping
authors.initials: X
authors.lastname: Wang