title: Photoactive gate dielectrics.
authors.affiliation: Peking University, Beijing, P. R. China.
authors.forename: Qian
authors.initials: Q
authors.lastname: Shen
authors.forename: Linjun
authors.initials: L
authors.lastname: Wang
authors.forename: Song
authors.initials: S
authors.lastname: Liu
authors.forename: Yang
authors.initials: Y
authors.lastname: Cao
authors.forename: Lin
authors.initials: L
authors.lastname: Gan
authors.forename: Xuefeng
authors.initials: X
authors.lastname: Guo
authors.forename: Michael L
authors.initials: ML
authors.lastname: Steigerwald
authors.forename: Zhigang
authors.initials: Z
authors.lastname: Shuai
authors.forename: Zhongfan
authors.initials: Z
authors.lastname: Liu
authors.forename: Colin
authors.initials: C
authors.lastname: Nuckolls
mesh_terms: D001578:Benzopyrans / Q000737:chemistry*; D004553:Electric Conductivity; D004563:Electrochemistry; D007211:Indoles / Q000737:chemistry*; D009574:Nitro Compounds / Q000737:chemistry*; D010777:Photochemistry; D019904:Polymethyl Methacrylate / Q000737:chemistry*; D012666:Semiconductors / Q000295:instrumentation*
chemical_list: D001578:Benzopyrans; D007211:Indoles; D009574:Nitro Compounds; C088184:spiropyran; D019904:Polymethyl Methacrylate