title: Fabrication of antireflective sub-wavelength structures on silicon nitride using nano cluster mask for solar cell application.
abstract: We have developed a simple and scalable approach for fabricating sub-wavelength structures (SWS) on silicon nitride by means of self-assembled nickel nanoparticle masks and inductively coupled plasma (ICP) ion etching. Silicon nitride SWS surfaces with diameter of 160-200 nm and a height of 140-150 nm were obtained. A low reflectivity below 1% was observed over wavelength from 590 to 680 nm. Using the measured reflectivity data in PC1D, the solar cell characteristics has been compared for single layer anti-reflection (SLAR) coatings and SWS and a 0.8% improvement in efficiency has been seen.
authors.affiliation: Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu, Taiwan. edc@mail.nctu.edu.tw.
authors.forename: Kartikachandra
authors.initials: K
authors.lastname: Sahoo
authors.forename: Men-Ku
authors.initials: MK
authors.lastname: Lin
authors.forename: Edward-Yi
authors.initials: EY
authors.lastname: Chang
authors.forename: Yi-Yao
authors.initials: YY
authors.lastname: Lu
authors.forename: Chun-Chi
authors.initials: CC
authors.lastname: Chen
authors.forename: Jin-Hua
authors.initials: JH
authors.lastname: Huang
authors.forename: Chun-Wei
authors.initials: CW
authors.lastname: Chang