title: Maskless photolithography via holographic optical projection.
abstract: We propose an inexpensive novel rapid prototyping approach to a maskless and fully adaptive photolithographic process. Phase-only computer-generated holograms of lithographic masks displayed on a liquid-crystal-on-silicon spatial light modulator were used in a holographic optical lithography system. Using holographic projection allows diffraction-limited performance within the given parameters of the optical system, adaptive software refocusing, and a continuous, pixel-free pattern. With the demonstrator, we have successfully proven the concept for micrometer-size lithographic features.
authors.affiliation: Centre of Molecular Materials for Photonics & Electronics, Department of Engineering, University of Cambridge, 9 J. J. Thomson Avenue, Cambridge CB3 0FA, UK.
authors.forename: Christoph
authors.initials: C
authors.lastname: Bay
authors.forename: Nils
authors.initials: N
authors.lastname: Hübner
authors.forename: Jon
authors.initials: J
authors.lastname: Freeman
authors.forename: Tim
authors.initials: T
authors.lastname: Wilkinson