title: Lateral shift effect on the spatial interference of light wave propagating in the single-layered dielectric film.
abstract: Under the oblique incidence condition, the multiple reflection of wave packets in a layered film structure will have a lateral shift increasing with the film thickness. In the analysis of the spatial interference with consideration of the lateral shift effect, a set of new analytic formulae to normalize the intensity of the s-and p-polarized wave packet was obtained to reduce the error of the ellipsometry parameters significantly as the optical path difference delta is close to mpi. The principle and method developed in this work also can be applied to other film structures in more general applications.
authors.affiliation: Department of Optical Science and Engineering, Fudan University, Shanghai 200433, China.
authors.forename: Yuan
authors.initials: Y
authors.lastname: Zhao
authors.forename: Ming-Yu
authors.initials: MY
authors.lastname: Sheng
authors.forename: Yu-Xiang
authors.initials: YX
authors.lastname: Zheng
authors.forename: Min
authors.initials: M
authors.lastname: Xu
authors.forename: Hai-Bin
authors.initials: HB
authors.lastname: Zhao
authors.forename: Liang-Yao
authors.initials: LY
authors.lastname: Chen
mesh_terms: D003198:Computer Simulation; D008027:Light; D008567:Membranes, Artificial; D008962:Models, Theoretical; D012031:Refractometry / Q000379:methods*; D012542:Scattering, Radiation
chemical_list: D008567:Membranes, Artificial