Single photomask, multilevel kinoforms in quartz and photoresist: manufacture and evaluation.
Kinoforms manufactured in photoresist by photolithographic techniques using a single, ten-level, grey scale photomask, exposed in a specially designed laser exposure system, are described. Kinoforms designed for uniform as well as for partial Gaussian beam illumination are discussed. The highest measured diffraction efficiency was 55%. Photoresist kinoforms were transferred into quartz substrates by reactive ion etching. The highest measured diffraction efficiency for the resulting all-quartz kinoforms was 53%.
Andersson
H
H
Ekberg
M
M
Hård
S
S
Jacobsson
S
S
Larsson
M
M
Nilsson
T
T