title: Single photomask, multilevel kinoforms in quartz and photoresist: manufacture and evaluation.
abstract: Kinoforms manufactured in photoresist by photolithographic techniques using a single, ten-level, grey scale photomask, exposed in a specially designed laser exposure system, are described. Kinoforms designed for uniform as well as for partial Gaussian beam illumination are discussed. The highest measured diffraction efficiency was 55%. Photoresist kinoforms were transferred into quartz substrates by reactive ion etching. The highest measured diffraction efficiency for the resulting all-quartz kinoforms was 53%.
authors.forename: H
authors.initials: H
authors.lastname: Andersson
authors.forename: M
authors.initials: M
authors.lastname: Ekberg
authors.forename: S
authors.initials: S
authors.lastname: Hård
authors.forename: S
authors.initials: S
authors.lastname: Jacobsson
authors.forename: M
authors.initials: M
authors.lastname: Larsson
authors.forename: T
authors.initials: T
authors.lastname: Nilsson