Maskless photolithography via holographic optical projection.
We propose an inexpensive novel rapid prototyping approach to a maskless and fully adaptive photolithographic process. Phase-only computer-generated holograms of lithographic masks displayed on a liquid-crystal-on-silicon spatial light modulator were used in a holographic optical lithography system. Using holographic projection allows diffraction-limited performance within the given parameters of the optical system, adaptive software refocusing, and a continuous, pixel-free pattern. With the demonstrator, we have successfully proven the concept for micrometer-size lithographic features.
Bay
Christoph
C
Centre of Molecular Materials for Photonics & Electronics, Department of Engineering, University of Cambridge, 9 J. J. Thomson Avenue, Cambridge CB3 0FA, UK.
Hübner
Nils
N
Freeman
Jon
J
Wilkinson
Tim
T