title: Nanolithography method by using localized surface plasmon mask generated with polydimethylsiloxane soft mold on thin metal film.
abstract: We propose a photolithographic method to fabricate nanostructures by employing a localized surface plasmon (LSP) mask generated by a soft mold on a thin metal film. The soft mold can be formed by transparent materials, such as polydimethylsiloxane, contacting firmly to the metal film. The pattern edges of the mold, serving as the fine tapers, can be used to excite LSPs and accumulate a large amount of localized energy from the incident light field, providing a modulated optical field in the resist with nanometer feature size. Nanolithographic results with a minimum feature size of 30 nm are demonstrated.
authors.affiliation: State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu 610209, China.
authors.forename: Yukun
authors.initials: Y
authors.lastname: Zhang
authors.forename: Xiaochun
authors.initials: X
authors.lastname: Dong
authors.forename: Jinglei
authors.initials: J
authors.lastname: Du
authors.forename: Xingzhan
authors.initials: X
authors.lastname: Wei
authors.forename: Lifang
authors.initials: L
authors.lastname: Shi
authors.forename: Qiling
authors.initials: Q
authors.lastname: Deng
authors.forename: Chunlei
authors.initials: C
authors.lastname: Du