title: 100 nm period grating by high-index phase-mask immersion lithography.
abstract: The interferogram of a high index phase mask of 200 nm period under normal incidence of a collimated beam at 244 nm wavelength with substantially suppressed zeroth order produces a 100 nm period grating in a resist film under immersion. The paper describes the phase mask design, its fabrication, the effect of electron-beam lithographic stitching errors and optical assessment of the fabricated sub-cutoff grating.
authors.affiliation: Université de Lyon, Laboratoire Hubert Curien, UMR CNRS 5516, Saint-Etienne, France.
authors.forename: Yannick
authors.initials: Y
authors.lastname: Bourgin
authors.forename: Yves
authors.initials: Y
authors.lastname: Jourlin
authors.forename: Olivier
authors.initials: O
authors.lastname: Parriaux
authors.forename: Anne
authors.initials: A
authors.lastname: Talneau
authors.forename: Svetlen
authors.initials: S
authors.lastname: Tonchev
authors.forename: Colette
authors.initials: C
authors.lastname: Veillas
authors.forename: Petri
authors.initials: P
authors.lastname: Karvinen
authors.forename: Nicolas
authors.initials: N
authors.lastname: Passilly
authors.forename: Ahmad R
authors.initials: AR
authors.lastname: Md Zain
authors.forename: Richard M
authors.initials: RM
authors.lastname: De La Rue
authors.forename: Jürgen
authors.initials: J
authors.lastname: Van Erps
authors.forename: David
authors.initials: D
authors.lastname: Troadec
mesh_terms: D004867:Equipment Design; D019544:Equipment Failure Analysis; D036103:Nanotechnology / Q000295:instrumentation*; D010781:Photography / Q000295:instrumentation*; D012031:Refractometry / Q000295:instrumentation*