Fabrication of antireflective sub-wavelength structures on silicon nitride using nano cluster mask for solar cell application.
We have developed a simple and scalable approach for fabricating sub-wavelength structures (SWS) on silicon nitride by means of self-assembled nickel nanoparticle masks and inductively coupled plasma (ICP) ion etching. Silicon nitride SWS surfaces with diameter of 160-200 nm and a height of 140-150 nm were obtained. A low reflectivity below 1% was observed over wavelength from 590 to 680 nm. Using the measured reflectivity data in PC1D, the solar cell characteristics has been compared for single layer anti-reflection (SLAR) coatings and SWS and a 0.8% improvement in efficiency has been seen.
Sahoo
Kartikachandra
K
Department of Materials Science and Engineering, National Chiao Tung University, Hsinchu, Taiwan. edc@mail.nctu.edu.tw.
Lin
Men-Ku
MK
Chang
Edward-Yi
EY
Lu
Yi-Yao
YY
Chen
Chun-Chi
CC
Huang
Jin-Hua
JH
Chang
Chun-Wei
CW