Titania-assisted electron-beam and synchrotron lithography.
Novel imaging layer technology for electron-beam and extreme-ultraviolet lithographic processes based upon generation of Pd nanoparticles in the Pd(2+)-loaded TiO(2) films was developed. The electroless metallization of the patterned TiO(2):Pd(2+) films yields both negative and positive nickel images with resolution down to approximately 100 nm.
Skorb
Ekaterina V
EV
Chemistry Department, Belarusian State University, Minsk, Belarus. skorb@mpikg.mpg.de
Grützmacher
Detlev
D
Dais
Christian
C
Guzenko
Vitaliy A
VA
Sokolov
Valeriy G
VG
Gaevskaya
Tatjana V
TV
Sviridov
Dmitry V
DV