title: Thin-film composite materials as a dielectric layer for flexible metal-insulator-metal capacitors.
abstract: A new organic-organic nanoscale composite thin-film (NCTF) dielectric has been synthesized by solution deposition of 1-bromoadamantane and triblock copolymer (Pluronic P123, BASF, EO20-PO70-EO20), in which the precursor solution has been achieved with organic additives. We have used a sol-gel process to make a metal-insulator-metal capacitor (MIM) comprising a nanoscale (10 nm-thick) thin-film on a flexible polyimide (PI) substrate at room temperature. Scanning electron microscope and atomic force microscope revealed that the deposited NCTFs were crack-free, uniform, highly resistant to moisture absorption, and well adhered on the Au-Cr/PI. The electrical properties of 1-bromoadamantane-P123 NCTF were characterized by dielectric constant, capacitance, and leakage current measurements. The 1-bromoadamantane-P123 NCTF on the PI substrate showed a low leakage current density of 5.5 x 10(-11) A cm(-2) and good capacitance of 2.4 fF at 1 MHz. In addition, the calculated dielectric constant of 1-bromoadamantane-P123 NCTF was 1.9, making them suitable candidates for use in future flexible electronic devices as a stable intermetal dielectric. The electrical insulating properties of 1-bromoadamantane-P123 NCTF have been improved due to the optimized dipole moments of the van der Waals interactions.
authors.affiliation: Institute of Nanotechnology, Department of Materials Science and Engineering, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu 30050, R.O.C. Taiwan.
authors.forename: Jitendra N
authors.initials: JN
authors.lastname: Tiwari
authors.forename: Jagan Singh
authors.initials: JS
authors.lastname: Meena
authors.forename: Chung-Shu
authors.initials: CS
authors.lastname: Wu
authors.forename: Rajanish N
authors.initials: RN
authors.lastname: Tiwari
authors.forename: Min-Ching
authors.initials: MC
authors.lastname: Chu
authors.forename: Feng-Chih
authors.initials: FC
authors.lastname: Chang
authors.forename: Fu-Hsiang
authors.initials: FH
authors.lastname: Ko
mesh_terms: D025802:Electric Capacitance; D004581:Electronics / Q000295:instrumentation*; D008422:Materials Testing; D008670:Metals; D053761:Nanocomposites / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D008670:Metals