Analytical characterization of BC(x)N(y) films generated by LPCVD with triethylamine borane.
Triethylamine borane (TEAB) and He, N(2) or NH(3) were applied as additional reaction gases in the production of BC(x)N(y) layers by low-pressure chemical vapor deposition (LPCVD). These layers were deposited on Si(100) wafers and characterized chemically by X-ray photoelectron spectroscopy (XPS) and synchrotron radiation-based total-reflection X-ray fluorescence analysis combined with near-edge X-ray absorption fine-structure spectroscopy (TXRF-NEXAFS). The composition of the material produced without NH(3) was found to be dominated by B-C bonds with the stoichiometric formula B(2)C(3)N. B-N bonds with the formula B(2)CN(3) were preferred when NH(3) was added. A first attempt was made to compare the results obtained by applying trimethylamine borane and TEAB as single-source precursors.
Baake
Olaf
O
Department of Materials Science, Technische Universität Darmstadt, Petersenstr. 23, 64287, Darmstadt, Germany.
Hoffmann
Peter S
PS
Kosinova
Marina L
ML
Klein
Andreas
A
Pollakowski
Beatrix
B
Beckhoff
Burkhard
B
Fainer
Nadeshda I
NI
Trunova
Valentina A
VA
Ensinger
Wolfgang
W