Fabrication of a 3D nanoscale crossbar circuit by nanotransfer-printing lithography.
Nanotransfer-printing lithography simplifies the fabrication of a 3D nanoscale crossbar circuit. Gold nanowires 100 nm in width and with 100 nm spacing are printed onto a polymer layer of electrically switchable, LiClO(4)-doped poly[2-methoxy-5-(2'-ethylhexyloxy)-p-phenylene vinylene] mixed with an epoxy. The transfer process can be repeated to obtain a multilayer nanoscale crossbar structure. This process paves the way toward fabricating 3D circuits with ultrahigh device density and neuromorphic architectures.
Stuart
Colin
C
Department of Mechanical and Aerospace Engineering, University of California, Los Angeles, 420 Westwood Plaza, Los Angeles, CA 90095, USA.
Park
Hee-Kun
HK
Chen
Yong
Y
D004566:Electrodes; D008855:Microscopy, Electron, Scanning; D036103:Nanotechnology / Q000379:methods*; D053770:Nanowires / Q000737:chemistry* / Q000648:ultrastructure