title: Titania-assisted electron-beam and synchrotron lithography.
abstract: Novel imaging layer technology for electron-beam and extreme-ultraviolet lithographic processes based upon generation of Pd nanoparticles in the Pd(2+)-loaded TiO(2) films was developed. The electroless metallization of the patterned TiO(2):Pd(2+) films yields both negative and positive nickel images with resolution down to approximately 100 nm.
authors.affiliation: Chemistry Department, Belarusian State University, Minsk, Belarus. skorb@mpikg.mpg.de
authors.forename: Ekaterina V
authors.initials: EV
authors.lastname: Skorb
authors.forename: Detlev
authors.initials: D
authors.lastname: Grützmacher
authors.forename: Christian
authors.initials: C
authors.lastname: Dais
authors.forename: Vitaliy A
authors.initials: VA
authors.lastname: Guzenko
authors.forename: Valeriy G
authors.initials: VG
authors.lastname: Sokolov
authors.forename: Tatjana V
authors.initials: TV
authors.lastname: Gaevskaya
authors.forename: Dmitry V
authors.initials: DV
authors.lastname: Sviridov