title: Genetic analysis of tolerance to photo-oxidative stress induced by high light in winter wheat (Triticum aestivum L.).
abstract: High light induced photooxidation (HLIP) usually leads to leaf premature senescence and causes great yield loss in winter wheat. In order to explore the genetic control of wheat tolerance to HLIP stress, a quantitative trait loci (QTL) analysis was conducted on a set of doubled haploid population, derived from two winter wheat cultivars. Actual values of chlorophyll content (Chl), minimum fluorescence level (Fo), maximum fluorescence level (Fm), and the maximum quantum efficiency of photosystem II (Fv/Fm) under both HLIP and non-stress conditions as well as the ratios of HLIP to non-stress were evaluated. HLIP considerably reduced Chl, Fm, and Fv/Fm, but increased Fo, compared with that under non-stress condition. A total of 27, 16, and 28 QTLs were associated with the investigated traits under HLIP and non-stress and the ratios of HLIP to non-stress, respectively. Most of the QTLs for the ratios of HLIP to non-stress collocated or nearly linked with those detected under HLIP condition. HLIP-induced QTLs were mapped on 15 chromosomes, involving in 1A, 1B, 1D, 2A, 2B, 2D, 3A, 3B, 4A, 4D, 5B, 6A, 6B, 7A, and 7D while those expressed under non-stress condition involved in nine chromosomes, including 1B, 1D, 2A, 2B, 3B, 4A, 5A, 5B, and 7A. The expression patterns of QTLs under HLIP condition were different from that under non-stress condition except for six loci on five chromosomes. The phenotypic variance explained by individual QTL ranged from 5.0% to 19.7% under HLIP, 8.3% to 20.8% under non-stress, and 4.9% to 20.2% for the ratios of HLIP to non-stress, respectively. Some markers, for example, Xgwm192 and WMC331 on 4D regulating Chl, Fo, Fm, and Fv/Fm under HLIP condition, might be used in marker assistant selection.
authors.affiliation: State Key Laboratory of Plant Cell and Chromosome Engineering, Institute of Genetics and Developmental Biology, Chinese Academy of Sciences, Beijing, China.
authors.forename: Hongwei
authors.initials: H
authors.lastname: Li
authors.forename: Yiping
authors.initials: Y
authors.lastname: Tong
authors.forename: Bin
authors.initials: B
authors.lastname: Li
authors.forename: Ruilian
authors.initials: R
authors.lastname: Jing
authors.forename: Congming
authors.initials: C
authors.lastname: Lu
authors.forename: Zhensheng
authors.initials: Z
authors.lastname: Li
mesh_terms: D004307:Dose-Response Relationship, Radiation; D018745:Genome, Plant / Q000235:genetics; D008027:Light / Q000009:adverse effects*; D010084:Oxidation-Reduction / Q000528:radiation effects; D018384:Oxidative Stress / Q000235:genetics* / Q000528:radiation effects*; D010641:Phenotype; D040641:Quantitative Trait Loci / Q000235:genetics; D014908:Triticum / Q000235:genetics / Q000502:physiology* / Q000528:radiation effects*