title: Analytical characterization of BC(x)N(y) films generated by LPCVD with triethylamine borane.
abstract: Triethylamine borane (TEAB) and He, N(2) or NH(3) were applied as additional reaction gases in the production of BC(x)N(y) layers by low-pressure chemical vapor deposition (LPCVD). These layers were deposited on Si(100) wafers and characterized chemically by X-ray photoelectron spectroscopy (XPS) and synchrotron radiation-based total-reflection X-ray fluorescence analysis combined with near-edge X-ray absorption fine-structure spectroscopy (TXRF-NEXAFS). The composition of the material produced without NH(3) was found to be dominated by B-C bonds with the stoichiometric formula B(2)C(3)N. B-N bonds with the formula B(2)CN(3) were preferred when NH(3) was added. A first attempt was made to compare the results obtained by applying trimethylamine borane and TEAB as single-source precursors.
authors.affiliation: Department of Materials Science, Technische Universität Darmstadt, Petersenstr. 23, 64287, Darmstadt, Germany.
authors.forename: Olaf
authors.initials: O
authors.lastname: Baake
authors.forename: Peter S
authors.initials: PS
authors.lastname: Hoffmann
authors.forename: Marina L
authors.initials: ML
authors.lastname: Kosinova
authors.forename: Andreas
authors.initials: A
authors.lastname: Klein
authors.forename: Beatrix
authors.initials: B
authors.lastname: Pollakowski
authors.forename: Burkhard
authors.initials: B
authors.lastname: Beckhoff
authors.forename: Nadeshda I
authors.initials: NI
authors.lastname: Fainer
authors.forename: Valentina A
authors.initials: VA
authors.lastname: Trunova
authors.forename: Wolfgang
authors.initials: W
authors.lastname: Ensinger