title: Fabrication of concave silicon micro-mirrors.
abstract: We have fabricated spherical and cylindrical concave micro-mirrors in silicon with dimensions from 20 microm to 100 microm. The fabrication process involves standard photolithography followed by large area ion beam irradiation and electrochemical anodisation in a HF electrolyte. After thermal oxidation the silicon surface roughness is less than 2 nm. We also present a multilayer porous silicon distributed Bragg reflector fabricated on concave silicon surfaces which selectively reflect and focus a band of wavelengths from a parallel beam of incident white light. Development of such low roughness concave microstructures opens up new applications in areas such as silicon photonics and quantum information science.
authors.affiliation: Physics Department, National University of Singapore, Lower Kent Ridge Road, 119260, Singapore. g0601170@nus.edu.sg
authors.forename: Yueh Sheng
authors.initials: YS
authors.lastname: Ow
authors.forename: Mark B H
authors.initials: MB
authors.lastname: Breese
authors.forename: Sara
authors.initials: S
authors.lastname: Azimi