Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks.
We have realized the first demonstration of a table-top aerial imaging microscope capable of characterizing pattern and defect printability in extreme ultraviolet lithography masks. The microscope combines the output of a 13.2 nm wavelength, table-top, plasma-based, EUV laser with zone plate optics to mimic the imaging conditions of an EUV lithographic stepper. We have characterized the illumination of the system and performed line-edge roughness measurements on an EUVL mask. The results open a path for the development of a compact aerial imaging microscope for high-volume manufacturing.
Brizuela
Fernando
F
National Science Foundation Engineering Research Center for Extreme Ultraviolet Science and Technology, Colorado State University, Fort Collins, CO 80523, USA. brizuela@engr.colostate.edu
Carbajo
Sergio
S
Sakdinawat
Anne
A
Alessi
David
D
Martz
Dale H
DH
Wang
Yong
Y
Luther
Bradley
B
Goldberg
Kenneth A
KA
Mochi
Iacopo
I
Attwood
David T
DT
La Fontaine
Bruno
B
Rocca
Jorge J
JJ
Menoni
Carmen S
CS