Intrinsic topological insulator Bi2Te3 thin films on Si and their thickness limit.
Li
Yao-Yi
YY
Key Lab for Atomic, Molecular and Nanoscience, Department of Physics, Tsinghua University, Beijing, P R China.
Wang
Guang
G
Zhu
Xie-Gang
XG
Liu
Min-Hao
MH
Ye
Cun
C
Chen
Xi
X
Wang
Ya-Yu
YY
He
Ke
K
Wang
Li-Li
LL
Ma
Xu-Cun
XC
Zhang
Hai-Jun
HJ
Dai
Xi
X
Fang
Zhong
Z
Xie
Xin-Cheng
XC
Liu
Ying
Y
Qi
Xiao-Liang
XL
Jia
Jin-Feng
JF
Zhang
Shou-Cheng
SC
Xue
Qi-Kun
QK
D001729:Bismuth / Q000737:chemistry*; D008958:Models, Molecular; D008968:Molecular Conformation; D012666:Semiconductors; D012825:Silicon / Q000737:chemistry*; D013499:Surface Properties; D013691:Tellurium / Q000737:chemistry*
C542787:bismuth telluride; D013691:Tellurium; D001729:Bismuth; D012825:Silicon