title: Extreme ultraviolet laser-based table-top aerial image metrology of lithographic masks.
abstract: We have realized the first demonstration of a table-top aerial imaging microscope capable of characterizing pattern and defect printability in extreme ultraviolet lithography masks. The microscope combines the output of a 13.2 nm wavelength, table-top, plasma-based, EUV laser with zone plate optics to mimic the imaging conditions of an EUV lithographic stepper. We have characterized the illumination of the system and performed line-edge roughness measurements on an EUVL mask. The results open a path for the development of a compact aerial imaging microscope for high-volume manufacturing.
authors.affiliation: National Science Foundation Engineering Research Center for Extreme Ultraviolet Science and Technology, Colorado State University, Fort Collins, CO 80523, USA. brizuela@engr.colostate.edu
authors.forename: Fernando
authors.initials: F
authors.lastname: Brizuela
authors.forename: Sergio
authors.initials: S
authors.lastname: Carbajo
authors.forename: Anne
authors.initials: A
authors.lastname: Sakdinawat
authors.forename: David
authors.initials: D
authors.lastname: Alessi
authors.forename: Dale H
authors.initials: DH
authors.lastname: Martz
authors.forename: Yong
authors.initials: Y
authors.lastname: Wang
authors.forename: Bradley
authors.initials: B
authors.lastname: Luther
authors.forename: Kenneth A
authors.initials: KA
authors.lastname: Goldberg
authors.forename: Iacopo
authors.initials: I
authors.lastname: Mochi
authors.forename: David T
authors.initials: DT
authors.lastname: Attwood
authors.forename: Bruno
authors.initials: B
authors.lastname: La Fontaine
authors.forename: Jorge J
authors.initials: JJ
authors.lastname: Rocca
authors.forename: Carmen S
authors.initials: CS
authors.lastname: Menoni