title: High-speed spatial atomic-layer deposition of aluminum oxide layers for solar cell passivation.
authors.affiliation: TNO Science & Industry, PO Box 6235, 5600 HE Eindhoven, The Netherlands. paul.poodt@tno.nl
authors.forename: Paul
authors.initials: P
authors.lastname: Poodt
authors.forename: Adriaan
authors.initials: A
authors.lastname: Lankhorst
authors.forename: Fred
authors.initials: F
authors.lastname: Roozeboom
authors.forename: Karel
authors.initials: K
authors.lastname: Spee
authors.forename: Diederik
authors.initials: D
authors.lastname: Maas
authors.forename: Ad
authors.initials: A
authors.lastname: Vermeer
mesh_terms: D000537:Aluminum Oxide / Q000737:chemistry*; D011211:Electric Power Supplies; D012825:Silicon / Q000737:chemistry; D012993:Solar Energy; D013499:Surface Properties
chemical_list: D000537:Aluminum Oxide; D012825:Silicon