High-speed spatial atomic-layer deposition of aluminum oxide layers for solar cell passivation.
Poodt
Paul
P
TNO Science & Industry, PO Box 6235, 5600 HE Eindhoven, The Netherlands. paul.poodt@tno.nl
Lankhorst
Adriaan
A
Roozeboom
Fred
F
Spee
Karel
K
Maas
Diederik
D
Vermeer
Ad
A
D000537:Aluminum Oxide / Q000737:chemistry*; D011211:Electric Power Supplies; D012825:Silicon / Q000737:chemistry; D012993:Solar Energy; D013499:Surface Properties
D000537:Aluminum Oxide; D012825:Silicon