title: Efficient directional coupling between silicon and copper plasmonic nanoslot waveguides: toward metal-oxide-silicon nanophotonics.
abstract: Coupling plasmonics and silicon photonics is the best way to bridge the size gap between macroscopic optics and nanodevices in general and especially nanoelectronic devices. We report on the realization of key blocks for future plasmonic planar integrated optics, nano-optical couplers, and nanoslot waveguides that are compatible both with the silicon photonics and the CMOS microelectronics. Copper-based devices provide for very efficient optical coupling, unexpectedly low propagation losses and a broadband sub-50 nm optical confinement. The fabrication in a standard frontline microelectronic facilities hints broad possibilities of hybrid opto-electronic very large scale integration.
authors.affiliation: CEA, LETI, MINATEC, DOPT 17 rue des martyrs 38054 Grenoble cedex 9, France.
authors.forename: Cécile
authors.initials: C
authors.lastname: Delacour
authors.forename: Sylvain
authors.initials: S
authors.lastname: Blaize
authors.forename: Philippe
authors.initials: P
authors.lastname: Grosse
authors.forename: Jean Marc
authors.initials: JM
authors.lastname: Fedeli
authors.forename: Aurélien
authors.initials: A
authors.lastname: Bruyant
authors.forename: Rafael
authors.initials: R
authors.lastname: Salas-Montiel
authors.forename: Gilles
authors.initials: G
authors.lastname: Lerondel
authors.forename: Alexei
authors.initials: A
authors.lastname: Chelnokov