title: Self-organized nanodot pattern fabrication using the reverse sputtering method.
abstract: We demonstrate the synthesis of high density periodic 2D nanodot patterns using reverse sputtering in magnetron sputtering equipment on a single crystal Si substrate and sputter-deposited Si-thin film. In this etching process, a minute amount of Ta is supplied by DC sputtering or splashing from the substrate holder surface. STEM, EDX, TEM and XPS analyses confirmed preferentially localized Ta-silicide in the nanodots. The nanodot pattern formation is attributed to the repeated adsorption and desorption of Ta and Si molecules forming Ta-silicide, and its segregation with self-organization. We also discuss power and time dependence of the nanodot pattern sizes and hole structure formation as a side-effect. This simple process is conducted at room temperature and makes use of an extremely simple setup. Our result promises a significant improvement in the productivity of quantum dot devices and has the potential to trigger their worldwide spread.
authors.affiliation: Advanced Technology Research Laboratories, Sharp Corporation, Tenri, Nara, Japan. iwata.noboru@sharp.co.jp
authors.forename: N
authors.initials: N
authors.lastname: Iwata
authors.forename: G
authors.initials: G
authors.lastname: Mori
authors.forename: N
authors.initials: N
authors.lastname: Arai
authors.forename: Y
authors.initials: Y
authors.lastname: Murakami
authors.forename: A
authors.initials: A
authors.lastname: Takahashi