Trace element analysis of rough diamond by LA-ICP-MS: a case of source discrimination?
Current profiling of rough diamond source is performed using different physical and/or morphological techniques that require strong knowledge and experience in the field. More recently, chemical impurities have been used to discriminate diamond source and with the advance of laser ablation-inductively coupled plasma-mass spectrometry (LA-ICP-MS) empirical profiling of rough diamonds is possible to some extent. In this study, we present a LA-ICP-MS methodology that we developed for analyzing ultra-trace element impurities in rough diamond for origin determination ("profiling"). Diamonds from two sources were analyzed by LA-ICP-MS and were statistically classified by accepted methods. For the two diamond populations analyzed in this study, binomial logistic regression produced a better overall correct classification than linear discriminant analysis. The results suggest that an anticipated matrix match reference material would improve the robustness of our methodology for forensic applications.
Dalpé
Claude
C
Royal Canadian Mounted Police, National Police Services, Forensic Science and Identification Services, Materials Profiling, 1200 Vanier Parkway, Ottawa, Ontario K1A 0R2, Canada. claude.dalpe@rcmp-grc.gc.ca
Hudon
Pierre
P
Ballantyne
David J
DJ
Williams
Darrell
D
Marcotte
Denis
D