title: E-beam lithography for micro-nanofabrication.
abstract: Electron beam lithography (EBL) is one of the tools of choice for writing micro- and nanostructures on a wide variety of materials. This is largely due to the fact that modern EBL machines are capable of writing nanometer-sized structures on areas up to mm(2). The aim of this contribution is to give technical and practical backgrounds in this extremely flexible nanofabrication technique.
authors.affiliation: Melbourne Centre for Nanofabrication, 151 Wellington Rd., Clayton, Victoria 3168, Australia.
authors.forename: Matteo
authors.initials: M
authors.lastname: Altissimo