Programmable soft lithography: solvent-assisted nanoscale embossing.
This paper reports an all-moldable nanofabrication platform that can generate, from a single master, large-area nanoscale patterns with programmable densities, fill factors, and lattice symmetries. Solvent-assisted nanoscale embossing (SANE) could increase the spacing of patterns up to 100% as well as decrease them down to 50% in a single step by stretching or heating a polymer substrate. Also, SANE could reduce critical feature sizes as small as 45% compared to the master by controlled swelling of patterned molds with different solvents. These capabilities were applied to generate plasmonic nanoparticle arrays with continuously variable separations and hence different optical properties on the same substrate.
Lee
Min Hyung
MH
Department of Chemistry, Northwestern University, Evanston, Illinois 60208, USA.
Huntington
Mark D
MD
Zhou
Wei
W
Yang
Jiun-Chan
JC
Odom
Teri W
TW
D003460:Crystallization / Q000379:methods*; D020724:Elastomers / Q000737:chemistry*; D004867:Equipment Design; D019544:Equipment Failure Analysis; D046911:Macromolecular Substances / Q000737:chemistry; D008422:Materials Testing; D008968:Molecular Conformation; D050997:Nanomedicine; D053758:Nanoparticles / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000379:methods*; D010316:Particle Size; D012031:Refractometry; D012997:Solvents / Q000737:chemistry*; D020349:Surface Plasmon Resonance / Q000379:methods*; D013499:Surface Properties
D020724:Elastomers; D046911:Macromolecular Substances; D012997:Solvents