title: Additive nanoscale embedding of functional nanoparticles on silicon surface.
abstract: We present a novel additive process, which allows the spatially controlled integration of nanoparticles (NPs) inside silicon surfaces. The NPs are placed between a conductive stamp and a silicon surface; by applying a bias voltage a SiO(2) layer grows underneath the stamp protrusions, thus embedding the particles. We report the successful nanoembedding of CoFe(2)O(4) nanoparticles patterned in lines, grids and logic structures.
authors.affiliation: CNR-ISMN, Via P Gobetti 101, I-40129, Bologna, Italy. m.cavallini@bo.ismn.cnr.it
authors.forename: Massimiliano
authors.initials: M
authors.lastname: Cavallini
authors.forename: Felice C
authors.initials: FC
authors.lastname: Simeone
authors.forename: Francesco
authors.initials: F
authors.lastname: Borgatti
authors.forename: Cristiano
authors.initials: C
authors.lastname: Albonetti
authors.forename: Vittorio
authors.initials: V
authors.lastname: Morandi
authors.forename: Claudio
authors.initials: C
authors.lastname: Sangregorio
authors.forename: Claudia
authors.initials: C
authors.lastname: Innocenti
authors.forename: Francesco
authors.initials: F
authors.lastname: Pineider
authors.forename: Emilia
authors.initials: E
authors.lastname: Annese
authors.forename: Giancarlo
authors.initials: G
authors.lastname: Panaccione
authors.forename: Luca
authors.initials: L
authors.lastname: Pasquali
mesh_terms: D002384:Catalysis; D003035:Cobalt / Q000737:chemistry; D004553:Electric Conductivity; D004581:Electronics; D005290:Ferric Compounds / Q000737:chemistry; D008422:Materials Testing; D018625:Microscopy, Atomic Force / Q000379:methods; D053758:Nanoparticles / Q000737:chemistry*; D049329:Nanostructures / Q000737:chemistry; D036103:Nanotechnology / Q000379:methods*; D012825:Silicon / Q000737:chemistry*; D012822:Silicon Dioxide / Q000737:chemistry*
chemical_list: D005290:Ferric Compounds; C000499:ferric oxide; D003035:Cobalt; D012822:Silicon Dioxide; D012825:Silicon