title: Antireflection behavior of multidimensional nanostructures patterned using a conformable elastomeric phase mask in a single exposure step.
authors: Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology, Daejeon, Republic of Korea.
authors: Junyong
authors: J
authors: Park
authors: Sanghoon
authors: S
authors: Yoon
authors: Kisuk
authors: K
authors: Kang
authors: Seokwoo
authors: S
authors: Jeon
mesh_terms: D020099:Coated Materials, Biocompatible / Q000138:chemical synthesis* / Q000737:chemistry*; D004548:Elasticity; D020724:Elastomers / Q000737:chemistry*; D008027:Light; D008422:Materials Testing; D008855:Microscopy, Electron, Scanning; D008954:Models, Biological; D049329:Nanostructures / Q000737:chemistry* / Q000528:radiation effects; D036103:Nanotechnology / Q000379:methods*; D044367:Phase Transition; D010777:Photochemistry / Q000379:methods; D012031:Refractometry / Q000295:instrumentation / Q000379:methods; D013499:Surface Properties
chemical_list: D020099:Coated Materials, Biocompatible; D020724:Elastomers