title: Photoresist resolution measurement during the exposure process.
abstract: The index-modulation evolution of a positive photoresist material was measured during the holographic exposure of sinusoidal patterns. The exposures were performed in a stabilized holographic setup that permits easy changes in the period. The results show the lowering of the recorded index modulation when the period decreases.
authors: M S
authors: MS
authors: Sthel
authors: C R
authors: CR
authors: Lima
authors: L
authors: L
authors: Cescato