Cubic silsesquioxanes as a green, high-performance mold material for nanoimprint lithography.
Ro
Hyun Wook
HW
Polymers Division, National Institute of Standards and Technology (NIST), 100 Bureau Dr., Gaithersburg, MD 20899, USA. hyun.ro@nist.gov
Popova
Vera
V
Chen
Lei
L
Forster
Aaron M
AM
Ding
Yifu
Y
Alvine
Kyle J
KJ
Krug
Dave J
DJ
Laine
Richard M
RM
Soles
Christopher L
CL
D018625:Microscopy, Atomic Force; D054802:Molecular Imprinting; D036103:Nanotechnology; D017646:Organosilicon Compounds / Q000737:chemistry*; D011108:Polymers / Q000737:chemistry; D012822:Silicon Dioxide / Q000737:chemistry; D014961:X-Ray Diffraction
D017646:Organosilicon Compounds; D011108:Polymers; D012822:Silicon Dioxide