Aberration analysis in aerial images formed by lithographic lenses.
A test procedure for the final assembly of lenses that does not need exposed photographic plates is introduced. It is based on the metrological simulation of optical ray tracing. A measuring example illustrates its suitability for ultraviolet optical systems in particular. The measuring apparatus displays the distortion vectors directly in the aerial image, gives a wave-front analysis, and performs an analogous distortion analysis.
Freitag
W
W
Grossmann
W
W
Grunewald
U
U