title: Cubic silsesquioxanes as a green, high-performance mold material for nanoimprint lithography.
authors: Polymers Division, National Institute of Standards and Technology (NIST), 100 Bureau Dr., Gaithersburg, MD 20899, USA. hyun.ro@nist.gov
authors: Hyun Wook
authors: HW
authors: Ro
authors: Vera
authors: V
authors: Popova
authors: Lei
authors: L
authors: Chen
authors: Aaron M
authors: AM
authors: Forster
authors: Yifu
authors: Y
authors: Ding
authors: Kyle J
authors: KJ
authors: Alvine
authors: Dave J
authors: DJ
authors: Krug
authors: Richard M
authors: RM
authors: Laine
authors: Christopher L
authors: CL
authors: Soles
mesh_terms: D018625:Microscopy, Atomic Force; D054802:Molecular Imprinting; D036103:Nanotechnology; D017646:Organosilicon Compounds / Q000737:chemistry*; D011108:Polymers / Q000737:chemistry; D012822:Silicon Dioxide / Q000737:chemistry; D014961:X-Ray Diffraction
chemical_list: D017646:Organosilicon Compounds; D011108:Polymers; D012822:Silicon Dioxide