title: Patterning dewetting in thin polymer films by spatially directed photocrosslinking.
abstract: In this report we examine the dewetting of spin-cast poly (styrene) films in a confined geometry. We designed a platform for laterally confining PS by photo-patterning crosslinks in spin-coated thin films. Heating the patterned film above the glass transition temperature of PS results in localized dewetting patterns in regions that were not crosslinked, while the crosslinked pattern serves as a rigid barrier that confines the retraction of the uncrosslinked polymer in micron-sized domains. The barriers also provide a favorable surface that the liquid PS wets onto, forming a rim at the boundary of crosslinked and uncrosslinked polymer. The resulting patterns are shown to be dependent on the irradiation and annealing time, the dimensions of the uncrosslinked region and the thickness of the film.
authors: Department of Chemistry, Columbia University, 3000 Broadway, MC 3157, NY 10027, USA. gtcarroll@gmail.com
authors: Gregory T
authors: GT
authors: Carroll
authors: Nicholas J
authors: NJ
authors: Turro
authors: Jeffrey T
authors: JT
authors: Koberstein
mesh_terms: D003432:Cross-Linking Reagents / Q000138:chemical synthesis / Q000737:chemistry*; D008567:Membranes, Artificial; D010316:Particle Size; D055668:Photochemical Processes; D011137:Polystyrenes / Q000138:chemical synthesis / Q000737:chemistry*; D013499:Surface Properties; D017155:Wettability
chemical_list: D003432:Cross-Linking Reagents; D008567:Membranes, Artificial; D011137:Polystyrenes