Large-range refractive-index control of silicon monoxide antireflection coatings using oblique incident thermal evaporation.
With silicon monoxide films thermally evaporated at various angles between the substrate normal and the vapor stream, we obtain a refractive-index change ranging from 2.04 to 1.27, with evaporation angles ranging from 0 to 80 deg, respectively. This method provides an alternative to evaporating with a partial pressure of oxygen, which is now used to control the refractive index. Also, the selectivity of the lower range of refractive-index values may satisfy the needs of special applications that require a value lower than what is available from common bulk materials.
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