title: Aberration analysis in aerial images formed by lithographic lenses.
abstract: A test procedure for the final assembly of lenses that does not need exposed photographic plates is introduced. It is based on the metrological simulation of optical ray tracing. A measuring example illustrates its suitability for ultraviolet optical systems in particular. The measuring apparatus displays the distortion vectors directly in the aerial image, gives a wave-front analysis, and performs an analogous distortion analysis.
authors: W
authors: W
authors: Freitag
authors: W
authors: W
authors: Grossmann
authors: U
authors: U
authors: Grunewald