title: Achromatic holographic configuration for 100-nm-period lithography.
abstract: For the fabrication of large-area, spatially coherent gratings with periods of 100 nm or less, a grating interferometer is preferred over a conventional holographic configuration because of the limited coherence of available sources. Using a configuration that employs two matched fused silica phase gratings and an ArF excimer laser, we obtain high-quality 100-nm gratings in polymethyl methacrylate. We analyze the conditions for achieving high-contrast fringes with such an achromatic holographic configuration and show that the depth of focus depends only on the spatial coherence of the source. We also describe a highly accurate method for calculating the diffraction efficiency of the phase gratings as a function of polarization, incidence angle, and grating structure.
authors: A
authors: A
authors: Yen
authors: E H
authors: EH
authors: Anderson
authors: R A
authors: RA
authors: Ghanbari
authors: M L
authors: ML
authors: Schattenburg
authors: H I
authors: HI
authors: Smith