Surface energy modification by spin-cast, large-area graphene film for block copolymer lithography.
We demonstrate a surface energy modification method exploiting graphene film. Spin-cast, atomic layer thick, large-area reduced graphene film successfully played the role of surface energy modifier for arbitrary surfaces. The degree of reduction enabled the tuning of the surface energy. Sufficiently reduced graphene served as a neutral surface modifier to induce surface perpendicular lamellae or cylinders in a block copolymer nanotemplate. Our approach integrating large-area graphene film preparation with block copolymer lithography is potentially advantageous in creating semiconducting graphene nanoribbons and nanoporous graphene.
Kim
Bong Hoon
BH
Department of Materials Science and Engineering, KI for the Nanocentury, KAIST, Daejeon 305-701, Republic of Korea.
Kim
Ju Young
JY
Jeong
Seong-Jun
SJ
Hwang
Jin Ok
JO
Lee
Duck Hyun
DH
Shin
Dong Ok
DO
Choi
Sung-Yool
SY
Kim
Sang Ouk
SO