title: Surface energy modification by spin-cast, large-area graphene film for block copolymer lithography.
abstract: We demonstrate a surface energy modification method exploiting graphene film. Spin-cast, atomic layer thick, large-area reduced graphene film successfully played the role of surface energy modifier for arbitrary surfaces. The degree of reduction enabled the tuning of the surface energy. Sufficiently reduced graphene served as a neutral surface modifier to induce surface perpendicular lamellae or cylinders in a block copolymer nanotemplate. Our approach integrating large-area graphene film preparation with block copolymer lithography is potentially advantageous in creating semiconducting graphene nanoribbons and nanoporous graphene.
authors.affiliation: Department of Materials Science and Engineering, KI for the Nanocentury, KAIST, Daejeon 305-701, Republic of Korea.
authors.forename: Bong Hoon
authors.initials: BH
authors.lastname: Kim
authors.forename: Ju Young
authors.initials: JY
authors.lastname: Kim
authors.forename: Seong-Jun
authors.initials: SJ
authors.lastname: Jeong
authors.forename: Jin Ok
authors.initials: JO
authors.lastname: Hwang
authors.forename: Duck Hyun
authors.initials: DH
authors.lastname: Lee
authors.forename: Dong Ok
authors.initials: DO
authors.lastname: Shin
authors.forename: Sung-Yool
authors.initials: SY
authors.lastname: Choi
authors.forename: Sang Ouk
authors.initials: SO
authors.lastname: Kim