Graphoepitaxial assembly of symmetric block copolymers on weakly preferential substrates.
Han
Eungnak
E
Department of Materials Science and Engineering, University of Wisconsin, Madison, Wisconsin 53706, USA.
Kang
Huiman
H
Liu
Chi-Chun
CC
Nealey
Paul F
PF
Gopalan
Padma
P
D019904:Polymethyl Methacrylate / Q000737:chemistry*; D011137:Polystyrenes / Q000737:chemistry*
D011137:Polystyrenes; D019904:Polymethyl Methacrylate