title: High-pressure chemical deposition for void-free filling of extreme aspect ratio templates.
authors.affiliation: Department of Chemistry, Department of Materials Science and Engineeering and Materials Research Institute, Pennsylvania State University, University Park, PA 16802, USA.
authors.forename: Neil F
authors.initials: NF
authors.lastname: Baril
authors.forename: Banafsheh
authors.initials: B
authors.lastname: Keshavarzi
authors.forename: Justin R
authors.initials: JR
authors.lastname: Sparks
authors.forename: Mahesh
authors.initials: M
authors.lastname: Krishnamurthi
authors.forename: Ivan
authors.initials: I
authors.lastname: Temnykh
authors.forename: Pier J A
authors.initials: PJ
authors.lastname: Sazio
authors.forename: Anna C
authors.initials: AC
authors.lastname: Peacock
authors.forename: Ali
authors.initials: A
authors.lastname: Borhan
authors.forename: Venkatraman
authors.initials: V
authors.lastname: Gopalan
authors.forename: John V
authors.initials: JV
authors.lastname: Badding
mesh_terms: D008859:Microscopy, Polarization / Q000379:methods*; D055100:Optical Fibers / Q000145:classification* / Q000191:economics / Q000639:trends; D011312:Pressure; D012825:Silicon / Q000737:chemistry*
chemical_list: D012825:Silicon