title: Thermal stability of soft x-ray Mo-Si and MoSi(2)-Si multilayer mirrors.
abstract: The thermal stability of Mo-Si multilayers prepared by magnetron sputtering is studied. It is found that degradation of x-ray reflectivity of Mo-Si multilayers under heat loading is connected with the roughening of Mo-Si interfaces and the formation of compounds Mo(x)Si(y),. To avoid these degradation mechanisms we fabricated and tested MoSi(2)-Si multilayers under heat loading. The MoSi(2)-Si multilayer appeared to be much more stable both in period and x-ray reflectivity because of thermodynamic equilibrium of the components MoSi(2) and Si at the interface. The working temperature of MoSi(2)-Si multilayers reaches 1000 K.
authors.forename: V V
authors.initials: VV
authors.lastname: Kondratenko
authors.forename: Y P
authors.initials: YP
authors.lastname: Pershin
authors.forename: O V
authors.initials: OV
authors.lastname: Poltseva
authors.forename: A I
authors.initials: AI
authors.lastname: Fedorenko
authors.forename: E N
authors.initials: EN
authors.lastname: Zubarev
authors.forename: S A
authors.initials: SA
authors.lastname: Yulin
authors.forename: V
authors.initials: V
authors.lastname: Kozhevnikov
authors.forename: S I
authors.initials: SI
authors.lastname: Sagitov
authors.forename: V A
authors.initials: VA
authors.lastname: Chirkov
authors.forename: V E
authors.initials: VE
authors.lastname: Levashov
authors.forename: A V
authors.initials: AV
authors.lastname: Vinogradov