title: Graphoepitaxial assembly of symmetric block copolymers on weakly preferential substrates.
authors.affiliation: Department of Materials Science and Engineering, University of Wisconsin, Madison, Wisconsin 53706, USA.
authors.forename: Eungnak
authors.initials: E
authors.lastname: Han
authors.forename: Huiman
authors.initials: H
authors.lastname: Kang
authors.forename: Chi-Chun
authors.initials: CC
authors.lastname: Liu
authors.forename: Paul F
authors.initials: PF
authors.lastname: Nealey
authors.forename: Padma
authors.initials: P
authors.lastname: Gopalan
mesh_terms: D019904:Polymethyl Methacrylate / Q000737:chemistry*; D011137:Polystyrenes / Q000737:chemistry*
chemical_list: D011137:Polystyrenes; D019904:Polymethyl Methacrylate