title: Self-assembly of organic monolayers as protective and conductive bridges for nanometric surface-mount applications.
abstract: In this work, we present a novel surface-mount placement process that could potentially overcome the inadequacies of the currently used stencil-printing technology, when applied to devices in which either their lateral and/or their horizontal dimensions approach the nanometric scale. Our novel process is based on the "bottom-up" design of an adhesive layer, operative in the molecular/nanoscale level, through the use of self-assembled monolayers (SAMs) that could form protective and conductive bridges between pads and components. On the basis of previous results, 1,4-phenylene diisocyanide (PDI) and terephthalic acid (TPA) were chosen to serve as the best candidates for the achievement of this goal. The quality and stability of these SAMs on annealed Cu surfaces (Rrms=0.15-1.1 nm) were examined in detail. Measurements showed that the SAMs of TPA and PDI molecules formed on top of Cu substrates created thermally stable organic monolayers with high surface coverage (∼90%), in which the molecules were closely packed and well-ordered. Moreover, the molecules assumed a standing-up phase conformation, in which the molecules bonded to the Cu substrate through one terminal functional group, with the other terminal group residing away from the substrate. To examine the ability of these monolayers to serve as "molecular wires," i.e., the capability to provide electrical conductivity, we developed a novel fabrication method of a parallel plate junction (PPJ) in order to create symmetric Cu-SAM-Cu electrical junctions. The current-bias measurements of these junctions indicated high tunneling efficiency. These achievements imply that the SAMs used in this study can serve as conductive molecular bridges that can potentially bind circuital pads/components.
authors.affiliation: Department of Chemical Engineering and Russell Berrie Nanotechnology Institute, Technion-Israel Institute of Technology, Haifa 32000, Israel.
authors.forename: Ilia
authors.initials: I
authors.lastname: Platzman
authors.forename: Hossam
authors.initials: H
authors.lastname: Haick
authors.forename: Rina
authors.initials: R
authors.lastname: Tannenbaum
mesh_terms: D003460:Crystallization / Q000379:methods; D004553:Electric Conductivity; D004581:Electronics / Q000295:instrumentation; D008422:Materials Testing; D053758:Nanoparticles / Q000737:chemistry* / Q000528:radiation effects*; D009930:Organic Chemicals / Q000737:chemistry*; D010316:Particle Size; D013499:Surface Properties
chemical_list: D009930:Organic Chemicals