title: Aligning lithography on opposite surfaces of a substrate.
abstract: Equipment has been developed for aligning lithographic features between opposite surfaces of substrates to within 1 microm. It will work with opaque substrates and allows registration to existing features on the other surface.
authors.forename: P N
authors.initials: PN
authors.lastname: Everett
authors.forename: W F
authors.initials: WF
authors.lastname: Delaney