title: Efficient storage, computation, and exposure of computer-generated holograms by electron-beam lithography.
abstract: An efficient storage format was developed for computer-generated holograms for use in electron-beam lithography. This method employs run-length encoding and Lempel-Ziv-Welch compression and succeeds in exposing holograms that were previously infeasible owing to the hologram's tremendous pattern-data file size. These holograms also require significant computation; thus the algorithm was implemented on a parallel computer, which improved performance by 2 orders of magnitude. The decompression algorithm was integrated into the Cambridge electron-beam machine's front-end processor.Although this provides much-needed ability, some hardware enhancements will be required in the future to overcome inadequacies in the current front-end processor that result in a lengthy exposure time.
authors.forename: D M
authors.initials: DM
authors.lastname: Newman
authors.forename: R W
authors.initials: RW
authors.lastname: Hawley
authors.forename: D L
authors.initials: DL
authors.lastname: Goeckel
authors.forename: R D
authors.initials: RD
authors.lastname: Crawford
authors.forename: S
authors.initials: S
authors.lastname: Abraham
authors.forename: N C
authors.initials: NC
authors.lastname: Gallagher