title: Photoresist templates for wafer-scale defect-free evaporative lithography.
authors.affiliation: Institute of Materials Research and Engineering, Singapore.
authors.forename: Xiaosong
authors.initials: X
authors.lastname: Tang
authors.forename: Sean J
authors.initials: SJ
authors.lastname: O'Shea
authors.forename: Ivan U
authors.initials: IU
authors.lastname: Vakarelski
mesh_terms: D006046:Gold / Q000737:chemistry*; D008027:Light; D055616:Microtechnology / Q000295:instrumentation / Q000379:methods*; D053758:Nanoparticles / Q000737:chemistry*; D036103:Nanotechnology / Q000379:methods
chemical_list: D006046:Gold