title: [Calculation of dislocation destiny using X-ray diffraction for 4H-SiC homoepitaxial layers].
abstract: A theoretical and experimental study on calculating dislocation destiny for 4H-SiC homoepitaxial layers has been carried out. There is some difficulty in measuring dislocation density if it is more than 10(6) * cm(-2). In the paper, a theoretical analysis is made about the effects of dislocation density on the results of X-ray diffraction, and the relationship of dislocation density and FWHM spread is obtained. Then the X-ray diffraction curves of 4H-SiC in omego2theta with two different crystal faces are presented from which the density of dislocation is calculated. According to the result, the cause of dislocation origin is analyzed and the methods of decreasing dislocation density are proposed.
authors.affiliation: Key Laboratory of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics, Xidian University, Xi'an 710071, China. rxjia@mail.xidian.edu.cn
authors.forename: Ren-xu
authors.initials: RX
authors.lastname: Jia
authors.forename: Yu-ming
authors.initials: YM
authors.lastname: Zhang
authors.forename: Yi-men
authors.initials: YM
authors.lastname: Zhang
authors.forename: Hui
authors.initials: H
authors.lastname: Guo