Comparative study of titanium dioxide thin films produced by electron-beam evaporation and by reactive low-voltage ion plating.
Titanium dioxide (TiO(2)) is often used as a high refractive-index material for multilayer optical coatings. However, the optical properties of TiO(2) films depend strongly on the deposition process and its parameters. A comparative study of TiO(2) films fabricated by conventional electron-beam evaporation and by reactive low-voltage ion plating that uses different phases of Ti-O as starting materials is reported. Results on the variability of TiO(2) thin films are analyzed in relation to process parameters. The potential of fabricating high and low refractive-index multilayer stacks with TiO(2) only, by employing two different deposition processes, is presented with a practical example.
Balasubramanian
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K
Han
X F
XF
Guenther
K H
KH