title: Reflection mask defect repair.
abstract: We developed a new technique for the repair of opaque defects on soft-x-ray projection lithography reflection masks by using ion-beam etching and a thin Si overcoat on the multilayer mirror. This technique clears the defect without damaging the multilayer mirror or introducing an absorptive element into the multilayer. Our procedure uses a beam of low atomic number ions (Si or Ar) of reduced beam energy and a thin Si overcoat to protect the multilayer mirror.
authors.forename: A M
authors.initials: AM
authors.lastname: Hawryluk
authors.forename: D
authors.initials: D
authors.lastname: Stewart