title: Emission spectroscopy of reactive low-voltage ion plating for metal-oxide thin films.
abstract: Excited species in the plasma present during reactive low-voltage ion plating (RLVIP) of refractory oxide films are studied by using emission spectroscopy. We believe we have found a higher ratio of atomic to molecular oxygen then reported for earlier analyses that employed a quadrupole mass spectrometer. The application of emission spectroscopy to the RLVIP process and self-actinometry are discussed with examples of stable and unstable processes.
authors.forename: S
authors.initials: S
authors.lastname: Zarrabian
authors.forename: C
authors.initials: C
authors.lastname: Lee
authors.forename: K H
authors.initials: KH
authors.lastname: Guenther