title: Determination of interface roughness by using a spectroscopic total-integrated-scatter instrument.
abstract: A spectroscopic total-integrated-scatter instrument has been constructed. It uses a Coblentz sphere for the collection of the scattered light and a lamp with a monochromator as a light source. It can be used to measure diffuse reflectance as well as transmittance. The instrument has been used to measure diffuse reflectance of thermally and chemical-vapor-deposition oxidized silicon wafers. Comparisons are made with measurements by using a spectrophotometer with an integrating sphere. The data have been interpreted with a parameterized model for light scattering from a double layer, to obtain rms surfaceroughness values for the two interfaces of the oxide film.
authors.forename: D
authors.initials: D
authors.lastname: Rönnow
authors.forename: M
authors.initials: M
authors.lastname: Bergkvist
authors.forename: A
authors.initials: A
authors.lastname: Roos
authors.forename: C G
authors.initials: CG
authors.lastname: Ribbing