title: Comparative study of titanium dioxide thin films produced by electron-beam evaporation and by reactive low-voltage ion plating.
abstract: Titanium dioxide (TiO(2)) is often used as a high refractive-index material for multilayer optical coatings. However, the optical properties of TiO(2) films depend strongly on the deposition process and its parameters. A comparative study of TiO(2) films fabricated by conventional electron-beam evaporation and by reactive low-voltage ion plating that uses different phases of Ti-O as starting materials is reported. Results on the variability of TiO(2) thin films are analyzed in relation to process parameters. The potential of fabricating high and low refractive-index multilayer stacks with TiO(2) only, by employing two different deposition processes, is presented with a practical example.
authors.forename: K
authors.initials: K
authors.lastname: Balasubramanian
authors.forename: X F
authors.initials: XF
authors.lastname: Han
authors.forename: K H
authors.initials: KH
authors.lastname: Guenther