title: Physical optics modeling in soft-x-ray projection lithography.
abstract: We develop a diffraction-based tool that can predict the image quality in projection lithography systems. The effects of partial coherence and source variations and imaging defects in both the condenser and the camera optics can all be determined.
authors.forename: W C
authors.initials: WC
authors.lastname: Sweatt
authors.forename: G N
authors.initials: GN
authors.lastname: Lawrence