title: Electron-beam writing system and its application to large and high-density diffractive optic elements.
abstract: An electron-beam writing system that is chartacterized by a stationary electron beam and a continuously spinning table is proposed and developed for diffractive optic elements with axisymmetric patterns. This system allows us to fabricate continuously concentric or radialized high-density microgratings with effective areas over the electron-beam deflection limits. For a fine electron-dose distribution, we adopted multiple-revolution writing and electron-beam modulation. Several test gratings, including a rotary encoder disk with a 1.57-µm grating pitch and a 15-mm diameter and a blazed micro-Fresnel lens with a 4.5-mm diameter and a N.A. of 0.45, are successfully demonstrated with real-time data processing.
authors.forename: S
authors.initials: S
authors.lastname: Ogata
authors.forename: M
authors.initials: M
authors.lastname: Tada
authors.forename: M
authors.initials: M
authors.lastname: Yoneda