Arrays of nanoscale lenses for subwavelength optical lithography.
Poly(ethylene glycol) (PEG) polymer lens arrays are made by using dip-pen nanolithography to deposit nanoscale PEG features on hydrophobically modified quartz glass. The dimensions of the PEG lenses are controlled by tuning dwell time and polymer molecular weight. The PEG polymer lenses on the quartz substrate act as a phase-shift photomask for fabricating subwavelength scale features, ∼ 100 nm in width. Depending upon UV irradiation time during the photolithography, the photoresist nanostructures can be transitioned from well-shaped (short time) to ring-shaped (long time) features. The technique can be used to pattern large areas through the use of cantilever arrays.
Jang
Jae-Won
JW
Department of Chemistry, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208-3113, United States.
Zheng
Zijian
Z
Lee
One-Sun
OS
Shim
Wooyoung
W
Zheng
Gengfeng
G
Schatz
George C
GC
Mirkin
Chad A
CA
D004867:Equipment Design; D019544:Equipment Failure Analysis; D007909:Lenses; D036103:Nanotechnology / Q000295:instrumentation*; D010316:Particle Size; D010781:Photography / Q000379:methods*; D011092:Polyethylene Glycols / Q000737:chemistry*
D011092:Polyethylene Glycols