High-temperature ellipsometer system to determine the optical properties of materials.
A high-temperature ellipsometer system was developed that permits determination of the optical properties of solid and liquid bulk samples for temperatures as high as 2300 °C. The angles of incidence may be varied from 40° to 50°. The system was tested with a silicon wafer sample in inert gas environments of helium, argon, and nitrogen. In addition the possible sources of error in the inferred refractive index, especially in the context of Faraday effects, were assessed.
Charalampopoulos
T T
TT
Stagg
B J
BJ