Characterization of inhomogeneous transparent thin films on transparent substrates by spectroscopic ellipsometry: refractive indices n(λ) of some fluoride coating materials.
By incorporation of an achromatic three-reflection quarterwave retarder to a spectroscopic ellipsometer and application of appropriate calibration and error correction procedures, it has been possible to characterize real thin-film fluoride optical coatings that are inhomogeneous. The refractive index and its dispersion with wavelengths greater than 300-700 nm as well as the depth profile of voids in the film have been determined for AlF(3), CeF(3), HfF(4), LaF(3), ScF(3) and YF(3) films on vitreous silica substrates.
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