title: Graphene oxide thin films for flexible nonvolatile memory applications.
authors.affiliation: Department of Materials Science and Engineering, KAIST, Daejeon 305-701, Korea.
authors.forename: Hu Young
authors.initials: HY
authors.lastname: Jeong
authors.forename: Jong Yun
authors.initials: JY
authors.lastname: Kim
authors.forename: Jeong Won
authors.initials: JW
authors.lastname: Kim
authors.forename: Jin Ok
authors.initials: JO
authors.lastname: Hwang
authors.forename: Ji-Eun
authors.initials: JE
authors.lastname: Kim
authors.forename: Jeong Yong
authors.initials: JY
authors.lastname: Lee
authors.forename: Tae Hyun
authors.initials: TH
authors.lastname: Yoon
authors.forename: Byung Jin
authors.initials: BJ
authors.lastname: Cho
authors.forename: Sang Ouk
authors.initials: SO
authors.lastname: Kim
authors.forename: Rodney S
authors.initials: RS
authors.lastname: Ruoff
authors.forename: Sung-Yool
authors.initials: SY
authors.lastname: Choi