title: Advanced mask aligner lithography: new illumination system.
authors.affiliation: SUSS MicroOptics SA, Jaquet-Droz 7, 2000 Neuchâtel, Switzerland. voelkel@suss.ch
authors.forename: Reinhard
authors.initials: R
authors.lastname: Voelkel
authors.forename: Uwe
authors.initials: U
authors.lastname: Vogler
authors.forename: Andreas
authors.initials: A
authors.lastname: Bich
authors.forename: Pascal
authors.initials: P
authors.lastname: Pernet
authors.forename: Kenneth J
authors.initials: KJ
authors.lastname: Weible
authors.forename: Michael
authors.initials: M
authors.lastname: Hornung
authors.forename: Ralph
authors.initials: R
authors.lastname: Zoberbier
authors.forename: Elmar
authors.initials: E
authors.lastname: Cullmann
authors.forename: Lorenz
authors.initials: L
authors.lastname: Stuerzebecher
authors.forename: Torsten
authors.initials: T
authors.lastname: Harzendorf
authors.forename: Uwe D
authors.initials: UD
authors.lastname: Zeitner