title: Advanced mask aligner lithography: fabrication of periodic patterns using pinhole array mask and Talbot effect.
authors.affiliation: Fraunhofer Institut für Angewandte Optik und Feinmechanik IOF, Jena, Germany. lorenz.stuerzebecher@iof.fraunhofer.de
authors.forename: Lorenz
authors.initials: L
authors.lastname: Stuerzebecher
authors.forename: Torsten
authors.initials: T
authors.lastname: Harzendorf
authors.forename: Uwe
authors.initials: U
authors.lastname: Vogler
authors.forename: Uwe D
authors.initials: UD
authors.lastname: Zeitner
authors.forename: Reinhard
authors.initials: R
authors.lastname: Voelkel