title: Step and repeat UV nanoimprint lithography on pre-spin coated resist film: a promising route for fabricating nanodevices.
authors.affiliation: aBeam Technologies, Castro Valley, CA 94546, USA. cp@abeamtech.com
authors.forename: C
authors.initials: C
authors.lastname: Peroz
authors.forename: S
authors.initials: S
authors.lastname: Dhuey
authors.forename: M
authors.initials: M
authors.lastname: Volger
authors.forename: Y
authors.initials: Y
authors.lastname: Wu
authors.forename: D
authors.initials: D
authors.lastname: Olynick
authors.forename: S
authors.initials: S
authors.lastname: Cabrini