title: Generalized formulations for aerial image based lens aberration metrology in lithographic tools with arbitrarily shaped illumination sources.
authors.affiliation: Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology, Wuhan, China.
authors.forename: Wei
authors.initials: W
authors.lastname: Liu
authors.forename: Shiyuan
authors.initials: S
authors.lastname: Liu
authors.forename: Tielin
authors.initials: T
authors.lastname: Shi
authors.forename: Zirong
authors.initials: Z
authors.lastname: Tang