Development of a colloidal lithography method for patterning nonplanar surfaces.
A colloidal lithography method has been developed for patterning nonplanar surfaces. Hexagonal noncontiguously packed (HNCP) colloidal particles 127 nm-2.7 μm in diameter were first formed at the air-water interface and then adsorbed onto a substrate coated with a layer of polymer adhesive ∼17 nm thick. The adhesive layer plays the critical role of securing the order of the particles against the destructive lateral capillary force generated by a thin film of water after the initial transfer of the particles from the air-water interface. The soft lithography method is robust and very simple to carry out. It is applicable to a variety of surface curvatures and for both inorganic and organic colloidal particles.
Department of Polymer Science, University of Akron, Akron, Ohio 44325-3909, United States.
Sarang P
SP
Bhawalkar
Jun
J
Qian
Michael C
MC
Heiber
Li
L
Jia
D000388:Air; D003102:Colloids; D008855:Microscopy, Electron, Scanning; D011327:Printing / Q000379:methods*; D013499:Surface Properties; D014867:Water / Q000737:chemistry
D003102:Colloids; D014867:Water