Very-large-scale-integration fabrication technique for binary-phase gratings on sapphire.
An efficient, high-yield process for the production of binary-phase holograms is presented by controlled deposition of silicon nitride over a sapphire substrate with the binary structure formed by plasma etch of the silicon nitride. Optical results are presented for a 16 × 16 transmission fanout element that shows near-optimal performance.
A J
AJ
Stevens
W J
WJ
Hossack
S
S
Samus