Programming nanostructures of polymer brushes by dip-pen nanodisplacement lithography (DNL).
We report a facile and versatile scanning probe based approach-dip-pen nanodisplacement lithography (DNL)--for manipulating nanostructures of polymer brushes. Nanostructured polymer brushes with sizes as small as 25 nm are made by DNL patterning of the initiator molecules and subsequent surface-initiated polymerization. Nanoconfinement effects including chain collapsing and spreading are observed in the nanopatterned polymer brushes. In addition to chemical structure, size, topography and shape, our approach can also readily program the grafting density, chain configuration, hierarchical structure and multiplexing of the polymer brushes, which allows for the realization of complex chemical surfaces.
Nanotechnology Center, Institute of Textiles and Clothing, The Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong SAR, China.
Xuqing
X
Liu
Yi
Y
Li
Zijian
Z
Zheng
D018625:Microscopy, Atomic Force; D049329:Nanostructures / Q000737:chemistry*; D011108:Polymers / Q000737:chemistry*; D011109:Polymethacrylic Acids / Q000737:chemistry; D000644:Quaternary Ammonium Compounds / Q000737:chemistry; D013499:Surface Properties
D011108:Polymers; D011109:Polymethacrylic Acids; D000644:Quaternary Ammonium Compounds; C543347:poly(2-(methacryoyloxy)ethyl)trimethylammonium chloride