Highly stable transparent amorphous oxide semiconductor thin-film transistors having double-stacked active layers.
Park
Jae Chul
JC
Samsung Advanced Institute of Technology, Yongin, Korea.
Kim
Sangwook
S
Kim
Sunil
S
Kim
Changjung
C
Song
Ihun
I
Park
Youngsoo
Y
Jung
U-In
UI
Kim
Dae Hwan
DH
Lee
Jang-Sik
JS
D006195:Hafnium / Q000737:chemistry; D007204:Indium / Q000737:chemistry; D010087:Oxides / Q000737:chemistry*; D014173:Transistors, Electronic; D015034:Zinc Oxide / Q000737:chemistry
D010087:Oxides; D007204:Indium; D015034:Zinc Oxide; D006195:Hafnium