title: Highly conformal SiO2/Al2O3 nanolaminate gas-diffusion barriers for large-area flexible electronics applications.
authors.affiliation: Display and Nanosystem Laboratory, College of Engineering, Korea University, Seoul, Korea.
authors.forename: Jin-Hwan
authors.initials: JH
authors.lastname: Choi
authors.forename: Young-Min
authors.initials: YM
authors.lastname: Kim
authors.forename: Young-Wook
authors.initials: YW
authors.lastname: Park
authors.forename: Tae-Hyun
authors.initials: TH
authors.lastname: Park
authors.forename: Jin-Wook
authors.initials: JW
authors.lastname: Jeong
authors.forename: Hyun-Ju
authors.initials: HJ
authors.lastname: Choi
authors.forename: Eun-Ho
authors.initials: EH
authors.lastname: Song
authors.forename: Jin-Woo
authors.initials: JW
authors.lastname: Lee
authors.forename: Cheol-Ho
authors.initials: CH
authors.lastname: Kim
authors.forename: Byeong-Kwon
authors.initials: BK
authors.lastname: Ju