Block copolymer nanolithography: translation of molecular level control to nanoscale patterns.
The self-asembly of block copolymers is a promising platform for the "bottom-up" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.
Department of Chemical and Biological Engineering, Korea University, 136-713 Seoul, Korea.
Joona
J
Bang
Unyong
U
Jeong
Du Yeol
du Y
Ryu
Thomas P
TP
Russell
Craig J
CJ
Hawker