Flexible replication technique for high-aspect-ratio nanostructures.
A flexible, nondestructive, and cost-effective replication technique for nanostructures is presented. The advantages of the process are: 1) it allows for tailoring structural parameters of the replica (e.g., line width) nearly independent of the structural geometry of the master; 2) it allows for replication of high-aspect-ratio structures also in polymer materials from solution (especially noncurable polymers) such as polystyrene and polymethylmethacrylate; 3) it includes an easy separation process, thus preserving the master for repeated use. Linear grating replicas with line widths ranging from 88 to 300 nm are obtained using a single nanostructured master. Nanofibers and complex nanopatterned replicas are achievable. The presented technique and its flexibility show that atomic layer deposition is a unique tool for the preparation of high-efficiency polarizer diffractive optics, photonics, electronics, and catalysts.
Max Planck Institute of Microstructure Physics, Weinberg 2, Halle, Saale 06120, Germany. mknez@mpi-halle.de
Adriana
A
Szeghalmi
Kornelia
K
Sklarek
Michael
M
Helgert
Robert
R
Brunner
Wilfried
W
Erfurth
Ulrich
U
Gosele
Mato
M
Knez
D049329:Nanostructures; D036103:Nanotechnology / Q000379:methods*