title: Oxidative reactions of silicon atoms and clusters at ultralow temperature in helium droplets.
abstract: The reaction between Si and O(2) was studied in liquid He droplets at low temperature (T = 0.37 K) by monitoring the energy release during the reaction. Additionally, the reactions of Si atoms and clusters with the oxidation agents H(2)O and O(2) have been studied by mass spectrometry. It was found that Si atoms react fast with O(2) molecules. On the other hand, Si atoms and clusters do not react with H(2)O molecules. The energy released during the chemical reaction leads to the ejection of the products from small He droplets. In contrast, large He droplets (N(He) > 20000) are capable of keeping part of the reaction products in their interior. The observation of SiO(2) products with the mass spectrometer reveals that the He droplet can stabilize intermediate products in the exit channel.
authors.affiliation: Laboratory Astrophysics Group of the Max Planck Institute for Astronomy at the Friedrich Schiller University Jena, Institute of Solid State Physics, Helmholtzweg 3, D-07743 Jena, Germany.
authors.forename: Serge A
authors.initials: SA
authors.lastname: Krasnokutski
authors.forename: Friedrich
authors.initials: F
authors.lastname: Huisken