title: Precision crystal corner cube arrays for optical gratings formed by (100) silicon planes with selective epitaxial growth.
abstract: High-quality, micrometer scale, corner cube arrays were grown on (111) silicon substrates by selective epitaxial growth (SEG) techniques. Sixteen different arrays were produced that had periodic corner spacing ranging from 3 to 50 µm. The arrays were formed by suppressing silicon SEG in a regular geometric pattern, producing the three mutually perpendicular (100) smooth crystal planes. For coherent light of 633-nm wavelengtha sharp diffraction pattern of threefold symmetry was observed out to 7 maxima, as well as a retroreflection component.
authors.forename: G W
authors.initials: GW
authors.lastname: Neudeck
authors.forename: J
authors.initials: J
authors.lastname: Spitz
authors.forename: J C
authors.initials: JC
authors.lastname: Chang
authors.forename: J P
authors.initials: JP
authors.lastname: Denton
authors.forename: N
authors.initials: N
authors.lastname: Gallagher