title: Monolithic formation of thin films on the vertical surface of a substrate by a dual-ion-beam sputtering technique.
abstract: We have developed a novel method for the selective deposition of thin films on the vertical surface of a planar substrate with a vertical step. This was done with a dual-ion-beam sputtering apparatus that is equipped with two ion-beam sources. Using this technique a multilayer filter was monolithically formed on the vertical surface of a Si substrate on which a photodetector had been fabricated, and clear filtering-photodetecting characteristics were observed. This technique can be applied to the monolithic integration of thin-film devices and waveguide-type optical devices with a vertical end facet.
authors.forename: Y
authors.initials: Y
authors.lastname: Uzawa
authors.forename: S
authors.initials: S
authors.lastname: Niida
authors.forename: M
authors.initials: M
authors.lastname: Daibo
authors.forename: Y
authors.initials: Y
authors.lastname: Kokubun