Compact and low cross-talk silicon-on-insulator crossing using a periodic dielectric waveguide.
We propose and experimentally demonstrate a compact, highly efficient, and negligible cross-talk silicon-on-insulator crossing using a periodic dielectric waveguide. The crossing occupies a footprint of less than 4 μm × 4 μm. Around 0.7 dB insertion loss and lower than -40 dB, cross talk was achieved experimentally over a broad wavelength range.
Department of Physics and Tsinghua-Foxconn Nanotechnology Research Center, Tsinghua University, Beijing 100084, China.
Junbo
J
Feng
Qunqing
Q
Li
Shoushan
S
Fan