Growth orientation dependent hardness for epitaxial wurtzite InN films.
We report the hardness of wurtzite InN thin film grown with different crystalline orientations of heteroepitaxial s-plane (1101) and a-plane (1120) on r-plane (1102) Al2O3, and homoepitaxial film on c-plane (0001) Al2O3. Hardness values along with elastic properties are studied using nanoindentation technique. Maximum hardness is reported for c-plane (approximately 8 GPa), which is followed by s-plane (approximately 5.5 GPa) and then a-plane (approximately 4 GPa) oriented InN Films. Peierls force in the slip system of different crystalline orientations for wurtzite sample is calculated for explaining the systematic variations in hardness values of these films grown with different crystalline orientations.
Surface and Nanoscience Division, Indira Gandhi Centre forAtomic Research, Kalpakkam 603102, India.
Satender
S
Kataria
Ting-Wei
TW
Liu
Ching-Lien
CL
Hsiao
Sandip
S
Dhara
Li-Chyong
LC
Chen
Kuei-Hsein
KH
Chen
Sitaram
S
Dash
Ashok Kumar
AK
Tyagi