A simple soft lithographic nanopatterning of gold on gallium arsenide via galvanic displacement.
Nanoscale patterning of gold layers on GaAs substrate is demonstrated using a combination of soft lithographic molding and galvanic displacement deposition. First, an electroless deposition method has been developed to plate gold on GaAs with ease and cost-effectiveness. The electroless metallization process is performed by dipping the GaAs substrates into a gold salt solution without any reducing agents or additives. The deposition proceeds via galvanic displacement in which gold ions in the aqueous solution are reduced by electrons arising from the GaAs substrate itself. The deposition rate, surface morphology and adhesion property can be modulated by the plating parameters such as the choice of acids and the immersion time. Second, soft lithographic patterning of nanodots, nanorings, and nanolines are demonstrated on GaAs substrates with hard-polydimethylsiloxane (h-PDMS) mold and plasma etching. This method can be easily applied to the metallization and nanopatterning of gold on GaAs surfaces.
Nano-Mechanical Systems Research Division, Korea Institute of Machinery and Materials, Daejon 305-343, Korea.
Hyuneui
H
Lim
Jung-Hyun
JH
Noh
Dae-Geun
DG
Choi
Wan-Doo
WD
Kim
Roya
R
Maboudian