title: Interferometric lithography for nanoscale feature patterning: a comparative analysis between laser interference, evanescent wave interference, and surface plasmon interference.
abstract: In this paper, we experimentally demonstrate and compare single-exposure multiple-beam interference lithography based on conventional laser interference, evanescent wave interference, and surface plasmon interference. The proposed two-beam and four-beam interference approaches are carried out theoretically and verified experimentally, employing the proposed configurations so as to realize the patterning of one- and two-dimensional periodic features on photoresists. A custom-fabricated grating is employed in the configuration in order to achieve two- and four-beam interference.
authors.affiliation: School of Mechanical and Aerospace Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798.
authors.forename: Kandammathe Valiyaveedu
authors.initials: KV
authors.lastname: Sreekanth
authors.forename: Jeun Kee
authors.initials: JK
authors.lastname: Chua
authors.forename: Vadakke Matham
authors.initials: VM
authors.lastname: Murukeshan