title: Anisotropic oxygen plasma etching of colloidal particles in electrospun fibers.
abstract: Oxygen plasma etching of electrospun polymer fibers containing spherical colloids is presented as a new approach towards anisotropic colloidal nanoparticles. The detailed morphology of the resulting nanoparticles can be precisely controlled in a continuous way. The same approach is also amenable to prepare inorganic nanoparticles with double-sided patches.
authors.affiliation: Beijing National Laboratory for Molecular Sciences, Institute of Chemistry, Chinese Academy of Sciences, Beijing 100190, China.
authors.forename: Tao
authors.initials: T
authors.lastname: Ding
authors.forename: Ye
authors.initials: Y
authors.lastname: Tian
authors.forename: Kui
authors.initials: K
authors.lastname: Liang
authors.forename: Koen
authors.initials: K
authors.lastname: Clays
authors.forename: Kai
authors.initials: K
authors.lastname: Song
authors.forename: Guoqiang
authors.initials: G
authors.lastname: Yang
authors.forename: Chen-Ho
authors.initials: CH
authors.lastname: Tung
mesh_terms: D003102:Colloids / Q000737:chemistry*; D053758:Nanoparticles / Q000737:chemistry / Q000648:ultrastructure; D010100:Oxygen / Q000737:chemistry*; D011137:Polystyrenes / Q000737:chemistry; D011205:Povidone / Q000737:chemistry; D012822:Silicon Dioxide / Q000737:chemistry
chemical_list: D003102:Colloids; D011137:Polystyrenes; D012822:Silicon Dioxide; D011205:Povidone; D010100:Oxygen