title: A high voltage pulse power supply for metal plasma immersion ion implantation and deposition.
abstract: We describe the design and implementation of a high voltage pulse power supply (pulser) that supports the operation of a repetitively pulsed filtered vacuum arc plasma deposition facility in plasma immersion ion implantation and deposition (Mepiiid) mode. Negative pulses (micropulses) of up to 20 kV in magnitude and 20 A peak current are provided in gated pulse packets (macropulses) over a broad range of possible pulse width and duty cycle. Application of the system consisting of filtered vacuum arc and high voltage pulser is demonstrated by forming diamond-like carbon (DLC) thin films with and without substrate bias provided by the pulser. Significantly enhanced film∕substrate adhesion is observed when the pulser is used to induce interface mixing between the DLC film and the underlying Si substrate.
authors.affiliation: Institute of Physics, University of São Paulo, C.P. 66318, CEP 05315-970 São Paulo SP, Brazil. mcsalvadori@if.usp.br
authors.forename: M C
authors.initials: MC
authors.lastname: Salvadori
authors.forename: F S
authors.initials: FS
authors.lastname: Teixeira
authors.forename: W W R
authors.initials: WW
authors.lastname: Araújo
authors.forename: L G
authors.initials: LG
authors.lastname: Sgubin
authors.forename: N S
authors.initials: NS
authors.lastname: Sochugov
authors.forename: R E
authors.initials: RE
authors.lastname: Spirin
authors.forename: I G
authors.initials: IG
authors.lastname: Brown