title: Microwave atomic force microscopy imaging for nanometer-scale electrical property characterization.
abstract: We introduce a new type of microscopy which is capable of investigating surface topography and electrical property of conductive and dielectric materials simultaneously on a nanometer scale. The microwave atomic force microscopy is a combination of the principles of the scanning probe microscope and the microwave-measurement technique. As a result, under the noncontact AFM working conditions, we successfully generated a microwave image of a 200-nm Au film coating on a glass wafer substrate with a spatial resolution of 120 nm and a measured voltage difference of 19.2 mV between the two materials.
authors.affiliation: Department of Mechanical Science and Engineering, Nagoya University, Furo-Cho, Chikusa-ku, Nagoya 4648603, Japan.
authors.forename: Lan
authors.initials: L
authors.lastname: Zhang
authors.forename: Yang
authors.initials: Y
authors.lastname: Ju
authors.forename: Atsushi
authors.initials: A
authors.lastname: Hosoi
authors.forename: Akifumi
authors.initials: A
authors.lastname: Fujimoto