title: M³: Microscope-based maskless micropatterning with dry film photoresist.
abstract: We present a maskless micropatterning system that utilizes a fluorescence microscope with programmable X-Y stage and dry film photoresist to realize feature sizes in the sub-millimeter range (40-700 μm). The method allows for flexible in-house maskless photolithography without a dedicated microfabrication facility and is well-suited for rapid prototyping of microfluidic channels, scaffold templates for protein/cell patterning or optically-guided cell encapsulation for biomedical applications.
authors.affiliation: Department of Biomedical Engineering, Stony Brook University, Stony Brook, NY 11794-8181, USA.
authors.forename: Steven Y
authors.initials: SY
authors.lastname: Leigh
authors.forename: Aashay
authors.initials: A
authors.lastname: Tattu
authors.forename: Joseph S B
authors.initials: JS
authors.lastname: Mitchell
authors.forename: Emilia
authors.initials: E
authors.lastname: Entcheva
mesh_terms: D008027:Light; D046210:Microfluidic Analytical Techniques; D008856:Microscopy, Fluorescence / Q000379:methods*; D055616:Microtechnology / Q000379:methods*; D011327:Printing; D013997:Time Factors