title: Effect of chain length on the assembly of mercaptoalkanoic acid multilayer films ligated through divalent Cu ions.
abstract: The structural stability of alkenthiolate monolayers assembled on gold surfaces is a result of the well-defined organization of the individual molecules within the film. The formation of three-dimensional films assembled by stacking multiple molecular monolayers is substantially more challenging because the correct organization of the molecular components is required not only within the individual monolayers but also between the monolayers of the film. In this paper we examine the structure of multilayer films based on mercaptoalkanoic acid monolayers in which ligation between adjacent monolayers is achieved using the interaction of carboxylic acid and thiol groups with a divalent Cu ion. Using contact angle analysis and atomic force microscopy, we show that the use of Cu(2+) has profound implications on the properties and structure of the multilayer film. In particular, the divalent ions effectively prohibit the complete assembly of the next monolayer. For multilayer SAMs assembled from short alkane chains with six methylene groups, we find that molecules in the incomplete adlayer organize themselves randomly over the underlying monolayer. However, as the number of methylene groups increases (11 and 16 methylene groups), the upper layer tends to fracture into discrete islands which cover around 50% of the surface. The height of these islands is found to be equal to that expected for a complete, well-ordered monolayer assembled from the equivalent mercaptoalkanoic acid molecules. This relationship between chain length and island growth results from the migration of molecules into ordered aggregates driven by the reduction of free energy associated with maximizing intermolecular interactions.
authors.affiliation: School of Electronic and Electrical Engineering, University of Leeds, Leeds LS2 9JT, UK. s.d.johnson@leeds.ac.uk
authors.forename: Steven
authors.initials: S
authors.lastname: Johnson
authors.forename: Jocelyn
authors.initials: J
authors.lastname: Chan
authors.forename: David
authors.initials: D
authors.lastname: Evans
authors.forename: A Giles
authors.initials: AG
authors.lastname: Davies
authors.forename: Christoph
authors.initials: C
authors.lastname: Wälti
mesh_terms: D003300:Copper / Q000737:chemistry*; D007477:Ions / Q000737:chemistry*; D008567:Membranes, Artificial; D018625:Microscopy, Atomic Force
chemical_list: D007477:Ions; D008567:Membranes, Artificial; D003300:Copper