title: Fabrication of high-aspect-ratio poly(2-hydroxyethyl methacrylate) brushes patterned on silica surfaces by very-large-scale integration process.
abstract: We used a novel fabricated process including electron beam and isotropic oxygen plasma to generate signal line patterns of polymerized 2-hydroxyethyl methacrylate (HEMA) on patterned Si(1 0 0) surfaces. Isotropic oxygen plasma was introduced to enhance the resolutions of the line and dots patterns of the PHEMA brush are approached to 350 nm and 2 μm, respectively. We established the surface grafting polymerization kinetics of the PHEMA chains on silicon surface by to fit the thickness and number-average molecular weight (M(n)). The propagation rate (k(p)) and active grafting specie deactivation rate (k(d)) lies in the range of ~3.6 × 10(-2) s(-1) M(-1) and 4.8 × 10(-5) s(-1), respectively. The measured thicknesses by ellipsometer and analyzed M(n) of "free" PHEMA by gel permeation chromatography (GPC) are fitted well by the polymerization kinetic model. In addition, aspect-ratios (height/width) are used to define the shape of patterned PHEMA brushes. The high-aspect-ratio of the PHEMA brush line with width of 350 nm is 0.27. We use a graft polymerization/solvent immersion method for generating various patterns of polymer brushes to investigate the deformation of the PHEMA brush through aspect-ratios.
authors.affiliation: Department of Polymer Engineering, National Taiwan University of Science and Technology, 43, Sec. 4, Keelung Rd., Taipei 106, Taiwan, ROC. jkchen@mail.ntust.edu.tw
authors.forename: Jem-Kun
authors.initials: JK
authors.lastname: Chen
authors.forename: Tsung-Yen
authors.initials: TY
authors.lastname: Chen
mesh_terms: D004583:Electrons; D008420:Manufactured Materials; D015394:Molecular Structure; D008970:Molecular Weight; D010100:Oxygen; D011102:Polyhydroxyethyl Methacrylate / Q000737:chemistry* / Q000378:metabolism; D058105:Polymerization; D011108:Polymers / Q000737:chemistry; D012822:Silicon Dioxide / Q000737:chemistry* / Q000378:metabolism; D012997:Solvents; D013499:Surface Properties
chemical_list: D011108:Polymers; D012997:Solvents; D011102:Polyhydroxyethyl Methacrylate; D012822:Silicon Dioxide; D010100:Oxygen