title: Quantum lithography beyond the diffraction limit via Rabi oscillations.
abstract: We propose a quantum optical method to do the subwavelength lithography. Our method is similar to the traditional lithography but adding a critical step before dissociating the chemical bound of the photoresist. The subwavelength pattern is achieved by inducing the multi-Rabi oscillation between the two atomic levels. The proposed method does not require multiphoton absorption and the entanglement of photons. It is expected to be realizable using current technology.
authors.affiliation: Institute for Quantum Studies and Department of Physics and Astronomy, Texas A&M University, College Station, Texas 77843-4242, USA.
authors.forename: Zeyang
authors.initials: Z
authors.lastname: Liao
authors.forename: M
authors.initials: M
authors.lastname: Al-Amri
authors.forename: M Suhail
authors.initials: MS
authors.lastname: Zubairy