title: In situ probing of fast defect annealing in Cu and Ni with a high-intensity positron beam.
abstract: A high-intensity positron beam is used for specific in situ monitoring of thermally activated fast defect annealing in Cu and Ni on a time scale of minutes. The atomistic technique of positron-electron annihilation is combined with macroscopic high-precision length-change measurements under the same thermal conditions. The combination of these two methods as demonstrated in this case study allows for a detailed analysis of multistage defect annealing in solids distinguishing vacancies, dislocations, and grain growth.
authors.affiliation: Institute of Materials Physics, Graz University of Technology, A-8010 Graz, Austria.
authors.forename: Bernd
authors.initials: B
authors.lastname: Oberdorfer
authors.forename: Eva-Maria
authors.initials: EM
authors.lastname: Steyskal
authors.forename: Wolfgang
authors.initials: W
authors.lastname: Sprengel
authors.forename: Werner
authors.initials: W
authors.lastname: Puff
authors.forename: Philip
authors.initials: P
authors.lastname: Pikart
authors.forename: Christoph
authors.initials: C
authors.lastname: Hugenschmidt
authors.forename: Michael
authors.initials: M
authors.lastname: Zehetbauer
authors.forename: Reinhard
authors.initials: R
authors.lastname: Pippan
authors.forename: Roland
authors.initials: R
authors.lastname: Würschum