title: Selective layer-by-layer self-assembly on patterned porous films modulated by Cassie-Wenzel transition.
abstract: We describe a robust and facile approach to the selective modification of patterned porous films via layer-by-layer (LBL) self-assembly. Positively charged honeycomb-patterned films were prepared from polystyrene-block-poly(N,N-dimethyl-aminoethyl methacrylate) (PS-b-PDMAEMA) and a PS/PDMAEMA blend by the breath figure method followed by surface quaternization. Alginate and chitosan were alternately deposited on the films via LBL self-assembly. The assembly on the PS-b-PDMAEMA film exhibits two stages with different growth rates, as elucidated by water contact angles, fluorescence microscopy, and quartz crystal microbalance results. The assembly can be controlled on the top surface or across all surfaces of the film by changing the number of deposition cycles. We confirm that there exists a Cassie-Wenzel transition with an increase in deposition cycles, which is responsible for the tunable assembly. For the PS/PDMAEMA film, the pores can be completely wetted and the polyelectrolytes selectively assemble inside the pores, instead of on the top surface. The controllable selective assembly forms unique hierarchical structures and opens a new route for surface modification of patterned porous films.
authors.affiliation: MOE Key Laboratory of Macromolecular Synthesis and Functionalization, Department of Polymer Science and Engineering, Zhejiang University, Hangzhou 310027, China.
authors.forename: Bei-Bei
authors.initials: BB
authors.lastname: Ke
authors.forename: Ling-Shu
authors.initials: LS
authors.lastname: Wan
authors.forename: Yang
authors.initials: Y
authors.lastname: Li
authors.forename: Ming-Yao
authors.initials: MY
authors.lastname: Xu
authors.forename: Zhi-Kang
authors.initials: ZK
authors.lastname: Xu
mesh_terms: D000464:Alginates / Q000737:chemistry; D048271:Chitosan / Q000737:chemistry; D020723:Glucuronic Acid / Q000737:chemistry; D006603:Hexuronic Acids / Q000737:chemistry; D008689:Methacrylates / Q000737:chemistry*; D009757:Nylons / Q000737:chemistry*; D011137:Polystyrenes / Q000737:chemistry*; D016062:Porosity
chemical_list: D000464:Alginates; D006603:Hexuronic Acids; D008689:Methacrylates; D009757:Nylons; D011137:Polystyrenes; C407037:poly(2-(dimethylamino)ethyl methacrylate); D020723:Glucuronic Acid; D048271:Chitosan