title: High-fidelity conformation of graphene to SiO2 topographic features.
abstract: High-resolution noncontact atomic force microscopy of SiO2 reveals previously unresolved roughness at the few-nm length scale, and scanning tunneling microscopy of graphene on SiO2 shows graphene to be slightly smoother than the supporting SiO2 substrate. A quantitative energetic analysis explains the observed roughness of graphene on SiO2 as extrinsic, and a natural result of highly conformal adhesion. Graphene conforms to the substrate down to the smallest features with nearly 99% fidelity, indicating conformal adhesion can be highly effective for strain engineering of graphene.
authors.affiliation: Materials Research Science and Engineering Center, Department of Physics, University of Maryland, College Park, Maryland 20742-4111, USA.
authors.forename: W G
authors.initials: WG
authors.lastname: Cullen
authors.forename: M
authors.initials: M
authors.lastname: Yamamoto
authors.forename: K M
authors.initials: KM
authors.lastname: Burson
authors.forename: J H
authors.initials: JH
authors.lastname: Chen
authors.forename: C
authors.initials: C
authors.lastname: Jang
authors.forename: L
authors.initials: L
authors.lastname: Li
authors.forename: M S
authors.initials: MS
authors.lastname: Fuhrer
authors.forename: E D
authors.initials: ED
authors.lastname: Williams