Cryogenic plasmas for controlled processing of nanoporous materials.
Plasma processing at cryogenic temperatures tremendously suppresses the depth penetration of plasma radical species within nanoporous materials. We demonstrate that this confining effect is surprisingly unrelated to changes in the phase diffusivity of radical species gas, but is determined by the increase of the sticking coefficient and the radical recombination and reaction factors, favoring an early irreversible surface adsorption of the plasma radical species.
Department of Advanced Materials Science, Graduate School of Frontier Sciences, University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa-shi, Chiba-ken 277-8561, Japan. iacopi@plasma.k.u-tokyo.ac.jp
Francesca
F
Iacopi
Jai Hyuk
JH
Choi
Kazuo
K
Terashima
Philip M
PM
Rice
Geraud
G
Dubois
D000327:Adsorption; D005609:Free Radicals / Q000737:chemistry; D049329:Nanostructures / Q000737:chemistry*; D016062:Porosity; D013696:Temperature
D005609:Free Radicals