title: Reduced coercive field in BiFeO₃ thin films through domain engineering.
authors.affiliation: Center for Materials for Information Technology, University of Alabama, Tuscaloosa, AL 35487-0209, USA. drshelke@gmail.com
authors.forename: Vilas
authors.initials: V
authors.lastname: Shelke
authors.forename: Dipanjan
authors.initials: D
authors.lastname: Mazumdar
authors.forename: Gopalan
authors.initials: G
authors.lastname: Srinivasan
authors.forename: Amit
authors.initials: A
authors.lastname: Kumar
authors.forename: Stephen
authors.initials: S
authors.lastname: Jesse
authors.forename: Sergei
authors.initials: S
authors.lastname: Kalinin
authors.forename: Arthur
authors.initials: A
authors.lastname: Baddorf
authors.forename: Arunava
authors.initials: A
authors.lastname: Gupta
mesh_terms: D001729:Bismuth / Q000737:chemistry*; D004566:Electrodes; D004738:Engineering / Q000379:methods*; D058085:Iron Compounds / Q000737:chemistry*; D008280:Magnetics; D008853:Microscopy
chemical_list: D058085:Iron Compounds; D001729:Bismuth