title: Hierarchical nanostructures by sequential self-assembly of styrene-dimethylsiloxane block copolymers of different periods.
abstract: Poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) block copolymers with a period as low as 13 nm have been self-assembled on a template formed from PS-b-PDMS of a 34–40 nm period, which is itself templated by micron-scale substrate features prepared using conventional lithography. This hierarchical process provides a simple method for directing the self-assembly of sub-10 nm features and registering them on the substrate.
authors.affiliation: Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA.
authors.forename: Jeong Gon
authors.initials: JG
authors.lastname: Son
authors.forename: Adam F
authors.initials: AF
authors.lastname: Hannon
authors.forename: Kevin W
authors.initials: KW
authors.lastname: Gotrik
authors.forename: Alfredo
authors.initials: A
authors.lastname: Alexander-Katz
authors.forename: Caroline A
authors.initials: CA
authors.lastname: Ross
mesh_terms: D004129:Dimethylpolysiloxanes / Q000737:chemistry*; D049329:Nanostructures / Q000737:chemistry*; D036103:Nanotechnology / Q000379:methods*; D010084:Oxidation-Reduction; D058105:Polymerization; D011137:Polystyrenes / Q000737:chemistry*; D011327:Printing
chemical_list: D004129:Dimethylpolysiloxanes; D011137:Polystyrenes; C013830:baysilon