title: Solvent response of polymers for micromachine manipulation.
abstract: A novel solvent responsive polymer micromachine has been successfully fabricated by two-photon photopolymerization (TPP) of methacrylate-based photoresists. The moving part of the micromachine could be easily driven by interfacial solvent polarity induced swelling and shrinking of the photopolymer networks. Furthermore, the driving performance of the micromachine could be precisely modulated by varying the laser scanning step length during fabrication.
authors.affiliation: State Key Laboratory on Integrated Optoelectronics, College of Electronic Science and Engineering, Jilin University, 2699 Qianjin Street, Changchun 130012, China.
authors.forename: Ye
authors.initials: Y
authors.lastname: Tian
authors.forename: Yong-Lai
authors.initials: YL
authors.lastname: Zhang
authors.forename: Hong
authors.initials: H
authors.lastname: Xia
authors.forename: Li
authors.initials: L
authors.lastname: Guo
authors.forename: Jin-Feng
authors.initials: JF
authors.lastname: Ku
authors.forename: Yan
authors.initials: Y
authors.lastname: He
authors.forename: Ran
authors.initials: R
authors.lastname: Zhang
authors.forename: Bin-Zong
authors.initials: BZ
authors.lastname: Xu
authors.forename: Qi-Dai
authors.initials: QD
authors.lastname: Chen
authors.forename: Hong-Bo
authors.initials: HB
authors.lastname: Sun