title: Gradient solvent vapor annealing of block copolymer thin films using a microfluidic mixing device.
abstract: Solvent vapor annealing (SVA) with solvent mixtures is a promising approach for controlling block copolymer thin film self-assembly. In this work, we present the design and fabrication of a solvent-resistant microfluidic mixing device to produce discrete SVA gradients in solvent composition and/or total solvent concentration. Using this device, we identified solvent composition dependent morphology transformations in poly(styrene-b-isoprene-b-styrene) films. This device enables faster and more robust exploration of SVA parameter space, providing insight into self-assembly phenomena.
authors.affiliation: University of Delaware, Chemical Engineering Department, Newark, Delaware 19716, United States.
authors.forename: Julie N L
authors.initials: JN
authors.lastname: Albert
authors.forename: Timothy D
authors.initials: TD
authors.lastname: Bogart
authors.forename: Ronald L
authors.initials: RL
authors.lastname: Lewis
authors.forename: Kathryn L
authors.initials: KL
authors.lastname: Beers
authors.forename: Michael J
authors.initials: MJ
authors.lastname: Fasolka
authors.forename: J Brian
authors.initials: JB
authors.lastname: Hutchison
authors.forename: Bryan D
authors.initials: BD
authors.lastname: Vogt
authors.forename: Thomas H
authors.initials: TH
authors.lastname: Epps