title: An inorganic-organic diblock copolymer photoresist for direct mesoporous SiCN ceramic patterns via photolithography.
abstract: A high resolution negative-tone-type of inorganic-organic diblock copolymer photoresist was synthesized as a novel precursor for simple and direct fabrication of SiCN ceramic mesoporous patterns with ordered nanoscale pores by using a "top-down" photolithographic technique and the subsequent sacrificial processes of a "bottom-up" self-assembled nanostructure.
authors.affiliation: National Creative Research Center of Applied Microfluidic Chemistry, Chungnam National University, 220 Kung Dong, Yuseong Gu, Daejeon 305-764, Korea.
authors.forename: Chi Thanh
authors.initials: CT
authors.lastname: Nguyen
authors.forename: Phan Huy
authors.initials: PH
authors.lastname: Hoang
authors.forename: Jayakumar
authors.initials: J
authors.lastname: Perumal
authors.forename: Dong-Pyo
authors.initials: DP
authors.lastname: Kim
mesh_terms: D002516:Ceramics / Q000737:chemistry*; D003486:Cyanides / Q000737:chemistry*; D008027:Light; D009930:Organic Chemicals / Q000737:chemistry*; D011108:Polymers / Q000737:chemistry*; D016062:Porosity; D011327:Printing; D017655:Silicon Compounds / Q000737:chemistry*
chemical_list: D003486:Cyanides; D009930:Organic Chemicals; D011108:Polymers; D017655:Silicon Compounds