title: Aspect-ratio and lateral-resolution enhancement in force microscopy by attaching nanoclusters generated by an ion cluster source at the end of a silicon tip.
abstract: One of the factors that limit the spatial resolution in atomic force microscopy (AFM) is the physical size of the probe. This limitation is particularly severe when the imaged structures are comparable in size to the tip's apex. The resolution in the AFM is usually enhanced by using sharp tips with high aspect ratios. In the present paper we propose an approach to modify AFM tips that consists of depositing nanoclusters on standard silicon tips. We show that the use of those tips leads to atomic force microscopy images of higher aspect ratios and spatial resolution. The present approach has two major properties. It provides higher aspect-ratio images of nanoscale objects and, at the same time, enables to functionalize the AFM tips by depositing nanoparticles with well-controlled chemical composition.
authors.affiliation: Instituto de Ciencia de Materiales de Madrid, Consejo Superior de Investigaciones Científicas (CSIC), Madrid, Spain.
authors.forename: L
authors.initials: L
authors.lastname: Martínez
authors.forename: M
authors.initials: M
authors.lastname: Tello
authors.forename: M
authors.initials: M
authors.lastname: Díaz
authors.forename: E
authors.initials: E
authors.lastname: Román
authors.forename: R
authors.initials: R
authors.lastname: Garcia
authors.forename: Y
authors.initials: Y
authors.lastname: Huttel