title: Hard X-ray microbeam lithography using a Fresnel zone plate with a long focal length.
abstract: Focused hard X-ray microbeams for use in X-ray nanolithography have been investigated. A 7.5 keV X-ray beam generated at an undulator was focused to about 3 µm using a Fresnel zone plate fabricated on silicon. The focused X-ray beam retains a high degree of collimation owing to the long focal length of the zone plate, which greatly facilitates hard X-ray nanoscale lithography. The focused X-ray microbeam was successfully utilized to fabricate patterns with features as small as 100 nm on a photoresist.
authors.affiliation: School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Gwangju 500-712, Korea.
authors.forename: S Y
authors.initials: SY
authors.lastname: Lee
authors.forename: I H
authors.initials: IH
authors.lastname: Cho
authors.forename: J M
authors.initials: JM
authors.lastname: Kim
authors.forename: H C
authors.initials: HC
authors.lastname: Kang
authors.forename: D Y
authors.initials: DY
authors.lastname: Noh