title: Single crystal-like Si patterns for photonic crystal color filters.
abstract: A novel fabrication method for a two-dimensional photonic crystal color filter based on guided mode resonance is proposed. An amorphous silicon layer deposited through the low-temperature plasma enhanced chemical vapor deposition (PECVD) process is patterned into two-dimensional structures using low-cost nanoimprint lithography. It is then effectively crystallized using multi-shot excimer laser annealing at low energy. We have demonstrated analytically and experimentally that single crystal-like silicon patterns on a glass substrate can offer high-efficiency photonic crystal color filters for reflective display applications. The highly crystallized silicon patterning scheme presented here may be very attractive for a variety of devices requiring high carrier mobility and high optical efficiency.
authors.affiliation: Nano Fabrication Group, Material and Device Center, Samsung Electronics, San 14-1, Nongseo-Dong, Giheung-Gu, Yongin-City, Gyeonggi-Do 446-712, Korea. pnch@yonsei.ac.kr
authors.forename: Eun-Hyoung
authors.initials: EH
authors.lastname: Cho
authors.forename: Hae-Sung
authors.initials: HS
authors.lastname: Kim
authors.forename: Jin-Seung
authors.initials: JS
authors.lastname: Sohn
authors.forename: Chang-Youl
authors.initials: CY
authors.lastname: Moon
authors.forename: No-Cheol
authors.initials: NC
authors.lastname: Park
authors.forename: Young-Pil
authors.initials: YP
authors.lastname: Park