title: Metal plasma immersion ion implantation and deposition (MePIIID) on screw-shaped titanium implant: The effects of ion source, ion dose and acceleration voltage on surface chemistry and morphology.
abstract: The present study investigated the effect of metal plasma immersion ion implantation and deposition (MePIIID) process parameters, i.e., plasma sources of magnesium and calcium, ion dose, and acceleration voltage on the surface chemistry and morphology of screw-type titanium implants that have been most widely used for osseointegrated implants. It is found that irrespective of plasma ion source, surface topography and roughness showed no differences at the nanometer level; that atom concentrations increased with ion dose but decreased with acceleration voltage. Data obtained from X-ray photoelectron spectroscopy and auger electron spectroscopy suggested that MePIIID process produces 'intermixed' layer of cathodic arc deposition and plasma immersion ion implantation. The MePIIID process may create desired bioactive surface chemistry of dental and orthopaedic implants by tailoring ion and plasma sources and thus enable investigations of the effect of the surface chemistry on bone response.
authors.affiliation: Department of Biomaterials/Handicap Research, Institute for Clinical Sciences, The Sahlgrenska Academy at University of Gothenburg, Gothenburg, Sweden. byung-soo.kang@biomaterials.gu.se
authors.forename: Byung-Soo
authors.initials: BS
authors.lastname: Kang
authors.forename: Young-Taeg
authors.initials: YT
authors.lastname: Sul
authors.forename: Yongsoo
authors.initials: Y
authors.lastname: Jeong
authors.forename: Eungsun
authors.initials: E
authors.lastname: Byon
authors.forename: Jong-Kuk
authors.initials: JK
authors.lastname: Kim
authors.forename: Suyeon
authors.initials: S
authors.lastname: Cho
authors.forename: Se-Jung
authors.initials: SJ
authors.lastname: Oh
authors.forename: Tomas
authors.initials: T
authors.lastname: Albrektsson
mesh_terms: D001863:Bone Screws; D002118:Calcium / Q000737:chemistry; D020099:Coated Materials, Biocompatible / Q000737:chemistry*; D015921:Dental Implants; D004558:Electric Stimulation; D006900:Hydroxylation; D007477:Ions; D008274:Magnesium / Q000737:chemistry; D008855:Microscopy, Electron, Scanning; D016348:Osseointegration; D056951:Photoelectron Spectroscopy; D013499:Surface Properties; D014025:Titanium / Q000737:chemistry*
chemical_list: D020099:Coated Materials, Biocompatible; D015921:Dental Implants; D007477:Ions; C009495:titanium dioxide; D014025:Titanium; D008274:Magnesium; D002118:Calcium