title: Photodynamic inactivation of multi-drug resistant pathogens in Hong Kong.
authors.affiliation: Department of Health Technology and Informatics, Hong Kong Polytechnic University, Hung Hom, Kowloon, Hong Kong SAR, China. htcyow@inet.polyu.edu.hk
authors.forename: C M N
authors.initials: CM
authors.lastname: Yow
authors.forename: K
authors.initials: K
authors.lastname: Fung
authors.forename: K C
authors.initials: KC
authors.lastname: Wong
mesh_terms: D000622:Aminolevulinic Acid / Q000494:pharmacology*; D002175:Candida / Q000187:drug effects; D018432:Drug Resistance, Multiple / Q000187:drug effects*; D024901:Drug Resistance, Multiple, Bacterial / Q000187:drug effects; D004926:Escherichia coli / Q000187:drug effects; D006723:Hong Kong; D066298:In Vitro Techniques; D007711:Klebsiella pneumoniae / Q000187:drug effects; D055624:Methicillin-Resistant Staphylococcus aureus / Q000187:drug effects; D008751:Methylene Blue / Q000494:pharmacology*; D010778:Photochemotherapy / Q000379:methods*; D017319:Photosensitizing Agents / Q000494:pharmacology*; D011550:Pseudomonas aeruginosa / Q000187:drug effects; D014048:Tolonium Chloride / Q000494:pharmacology*
chemical_list: D017319:Photosensitizing Agents; D014048:Tolonium Chloride; D000622:Aminolevulinic Acid; D008751:Methylene Blue