title: Optimization and characterization of a highly-efficient diffraction nanograting for MHz XUV pulses.
abstract: We designed, fabricated and characterized a nano-periodical highly-efficient blazed grating for extreme-ultraviolet (XUV) radiation. The grating was optimized by the rigorous coupled-wave analysis method (RCWA) and milled into the top layer of a highly-reflective mirror for IR light. The XUV diffraction efficiency was determined to be around 20% in the range from 35.5 to 79.2 nm. The effects of the nanograting on the reflectivity of the IR light and non-linear effects introduced by the nanograting have been measured and are discussed.
authors.affiliation: Max-Planck-Institut für Quantenoptik, Hans-Kopfermann-Straße 1, 85748 Garching, Germany.
authors.forename: Ying-Ying
authors.initials: YY
authors.lastname: Yang
authors.forename: Frederik
authors.initials: F
authors.lastname: Süssmann
authors.forename: Sergey
authors.initials: S
authors.lastname: Zherebtsov
authors.forename: Ioachim
authors.initials: I
authors.lastname: Pupeza
authors.forename: Jan
authors.initials: J
authors.lastname: Kaster
authors.forename: Dennis
authors.initials: D
authors.lastname: Lehr
authors.forename: Hans-Jörg
authors.initials: HJ
authors.lastname: Fuchs
authors.forename: Ernst-Bernhard
authors.initials: EB
authors.lastname: Kley
authors.forename: Ernst
authors.initials: E
authors.lastname: Fill
authors.forename: Xuan-Ming
authors.initials: XM
authors.lastname: Duan
authors.forename: Zhen-Sheng
authors.initials: ZS
authors.lastname: Zhao
authors.forename: Ferenc
authors.initials: F
authors.lastname: Krausz
authors.forename: Sarah L
authors.initials: SL
authors.lastname: Stebbings
authors.forename: Matthias F
authors.initials: MF
authors.lastname: Kling
mesh_terms: D004867:Equipment Design; D019544:Equipment Failure Analysis; D036103:Nanotechnology / Q000295:instrumentation*; D012031:Refractometry / Q000295:instrumentation*; D012815:Signal Processing, Computer-Assisted / Q000295:instrumentation*; D014466:Ultraviolet Rays