title: Seeding of silicon wire growth by out-diffused metal precipitates.
authors.affiliation: Department of Mechanical Engineering, Massachusetts Institute of Technology, 77 Massachusetts Ave, Cambridge, MA 02139, USA.
authors.forename: Vidya
authors.initials: V
authors.lastname: Ganapati
authors.forename: David P
authors.initials: DP
authors.lastname: Fenning
authors.forename: Mariana I
authors.initials: MI
authors.lastname: Bertoni
authors.forename: Chito E
authors.initials: CE
authors.lastname: Kendrick
authors.forename: Alexandria E
authors.initials: AE
authors.lastname: Fecych
authors.forename: Joan M
authors.initials: JM
authors.lastname: Redwing
authors.forename: Tonio
authors.initials: T
authors.lastname: Buonassisi
mesh_terms: D002384:Catalysis; D053768:Metal Nanoparticles / Q000737:chemistry* / Q000648:ultrastructure; D008670:Metals / Q000737:chemistry*; D036103:Nanotechnology; D012825:Silicon / Q000737:chemistry*; D013696:Temperature
chemical_list: D008670:Metals; D012825:Silicon