title: Nanophotonic integration in state-of-the-art CMOS foundries.
abstract: We demonstrate a monolithic photonic integration platform that leverages the existing state-of-the-art CMOS foundry infrastructure. In our approach, proven XeF2 post-processing technology and compliance with electronic foundry process flows eliminate the need for specialized substrates or wafer bonding. This approach enables intimate integration of large numbers of nanophotonic devices alongside high-density, high-performance transistors at low initial and incremental cost. We demonstrate this platform by presenting grating-coupled, microring-resonator filter banks fabricated in an unmodified 28 nm bulk-CMOS process by sharing a mask set with standard electronic projects. The lithographic fidelity of this process enables the high-throughput fabrication of second-order, wavelength-division-multiplexing (WDM) filter banks that achieve low insertion loss without post-fabrication trimming.
authors.affiliation: Research Laboratory of Electronics, Massachusetts Institute of Technology, 77 Massachusetts Ave, Cambridge, Massachusetts 02139, USA. jsorcutt@mit.edu
authors.forename: Jason S
authors.initials: JS
authors.lastname: Orcutt
authors.forename: Anatol
authors.initials: A
authors.lastname: Khilo
authors.forename: Charles W
authors.initials: CW
authors.lastname: Holzwarth
authors.forename: Milos A
authors.initials: MA
authors.lastname: Popović
authors.forename: Hanqing
authors.initials: H
authors.lastname: Li
authors.forename: Jie
authors.initials: J
authors.lastname: Sun
authors.forename: Thomas
authors.initials: T
authors.lastname: Bonifield
authors.forename: Randy
authors.initials: R
authors.lastname: Hollingsworth
authors.forename: Franz X
authors.initials: FX
authors.lastname: Kärtner
authors.forename: Henry I
authors.initials: HI
authors.lastname: Smith
authors.forename: Vladimir
authors.initials: V
authors.lastname: Stojanović
authors.forename: Rajeev J
authors.initials: RJ
authors.lastname: Ram
mesh_terms: D017076:Computer-Aided Design; D004867:Equipment Design; D019544:Equipment Failure Analysis; D055617:Micro-Electrical-Mechanical Systems / Q000295:instrumentation*; D036103:Nanotechnology / Q000295:instrumentation*; D017785:Photons; D012031:Refractometry / Q000295:instrumentation*; D012666:Semiconductors; D018511:Systems Integration