title: Local doping of silicon using nanoimprint lithography and molecular monolayers.
authors.affiliation: Molecular Nanofabrication Group, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands.
authors.forename: W Pim
authors.initials: WP
authors.lastname: Voorthuijzen
authors.forename: M Deniz
authors.initials: MD
authors.lastname: Yilmaz
authors.forename: Wouter J M
authors.initials: WJ
authors.lastname: Naber
authors.forename: Jurriaan
authors.initials: J
authors.lastname: Huskens
authors.forename: Wilfred G
authors.initials: WG
authors.lastname: van der Wiel
mesh_terms: D049329:Nanostructures / Q000737:chemistry*; D010758:Phosphorus / Q000737:chemistry; D012666:Semiconductors; D012822:Silicon Dioxide / Q000737:chemistry*
chemical_list: D010758:Phosphorus; D012822:Silicon Dioxide