title: Optimized piranha etching process for SU8-based MEMS and MOEMS construction.
abstract: We demonstrate the optimization of the concentration, temperature and cycling of a piranha (H(2)O(2):H(2)SO(4)) mixture that produces high yields while quickly etching hollow structures made using a highly crosslinked SU8 polymer sacrificial core. The effects of the piranha mixture on the thickness, refractive index and roughness of common micro-electromechanical systems and micro-opto-electromechanical systems fabrication materials (SiN, SiO(2) and Si) were determined. The effectiveness of the optimal piranha mixture was demonstrated in the construction of hollow anti-resonant reflecting optical waveguides.
authors.affiliation: ECE Department, Brigham Young University, 459 Clyde Building, Provo, UT 84602, USA.
authors.forename: Matthew
authors.initials: M
authors.lastname: Holmes
authors.forename: Jared
authors.initials: J
authors.lastname: Keeley
authors.forename: Katherine
authors.initials: K
authors.lastname: Hurd
authors.forename: Holger
authors.initials: H
authors.lastname: Schmidt
authors.forename: Aaron
authors.initials: A
authors.lastname: Hawkins