title: High-density gold nanowire arrays by lithographically patterned nanowire electrodeposition.
abstract: Here we describe a new method for preparing multiple arrays of parallel gold nanowires with dimensions and separation down to 50 nm. This method uses photolithography to prepare an electrode consisting of a patterned nickel film on glass, onto which a gold and nickel nanowire array is sequentially electrodeposited. After the electrodeposition, the nickel is stripped away, leaving behind a gold nanowire array, with dimensions governed by the gold electrodeposition parameters, spacing determined by the nickel electrodeposition parameters, and overall placement and shape dictated by the photolithography.
authors.affiliation: Department of Chemistry, University of California, Merced, USA.
authors.forename: Justin E
authors.initials: JE
authors.lastname: Hujdic
authors.forename: Alan P
authors.initials: AP
authors.lastname: Sargisian
authors.forename: Jingru
authors.initials: J
authors.lastname: Shao
authors.forename: Tao
authors.initials: T
authors.lastname: Ye
authors.forename: Erik J
authors.initials: EJ
authors.lastname: Menke
mesh_terms: D004566:Electrodes; D004595:Electroplating; D006046:Gold / Q000737:chemistry*; D018625:Microscopy, Atomic Force; D053770:Nanowires / Q000737:chemistry* / Q000648:ultrastructure; D009532:Nickel / Q000737:chemistry
chemical_list: D006046:Gold; D009532:Nickel