title: Contact area lithography and pattern transfer of self-assembled organic monolayers on SiO2/Si substrates.
abstract: We describe a procedure for one-step patterning and transfer of self-assembled organic monolayers (SAMs) on SiO(2)/Si substrates. This procedure was inspired from an idea of pattern formation at contact area, which realizes high patterning fidelity, and enables a universal approach for the micro/nanometre scale patterning of SAMs.
authors.affiliation: Institute of Applied Physics, University of Hamburg, Jungiusstr. 11, 20355 Hamburg, Germany.
authors.forename: Changdeuck
authors.initials: C
authors.lastname: Bae
authors.forename: Hyunchul
authors.initials: H
authors.lastname: Kim
authors.forename: Hyunjung
authors.initials: H
authors.lastname: Shin