title: Nano-strip grating lines self-organized by a high speed scanning CW laser.
abstract: After a laser annealing experiment on Si wafer, we found an asymmetric sheet resistance on the surface of the wafer. Periodic nano-strip grating lines (nano-SGLs) were self-organized along the trace of one-time scanning of the continuous wave (CW) laser. Depending on laser power, the nano-trench formed with a period ranging from 500 to 800 nm with a flat trough between trench structures. This simple method of combining the scanning laser with high scanning speed of 300 m min(-1) promises a large area of nanostructure fabrication with a high output. As a demonstration of the versatile method, concentric circles were drawn on silicon substrate rotated by a personal computer (PC) cooling fan. Even with such a simple system, the nano-SGL showed iridescence from the concentric circles.
authors.affiliation: Kanagawa Industrial Technology Center, Kanagawa Prefectural Government, 705-1 Shimo-Imaizumi, Ebina, Kanagawa 243-0435, Japan. satoru@kanagawa-iri.go.jp
authors.forename: Satoru
authors.initials: S
authors.lastname: Kaneko
authors.forename: Takeshi
authors.initials: T
authors.lastname: Ito
authors.forename: Kensuke
authors.initials: K
authors.lastname: Akiyama
authors.forename: Manabu
authors.initials: M
authors.lastname: Yasui
authors.forename: Chihiro
authors.initials: C
authors.lastname: Kato
authors.forename: Satomi
authors.initials: S
authors.lastname: Tanaka
authors.forename: Yasuo
authors.initials: Y
authors.lastname: Hirabayashi
authors.forename: Akira
authors.initials: A
authors.lastname: Mastuno
authors.forename: Takashi
authors.initials: T
authors.lastname: Nire
authors.forename: Hiroshi
authors.initials: H
authors.lastname: Funakubo
authors.forename: Mamoru
authors.initials: M
authors.lastname: Yoshimoto