title: Plasma-etched organic layers for antireflection purposes.
abstract: Organic layers can be used to realize special functions in optical interference coatings. Suitable compounds for such layers were thermally evaporated and characterized. A plasma etching procedure was applied to produce nanostructures on top of the organic layers to reduce their effective refractive indices. Broadband antireflective coatings were obtained by combining these artificial low-index layers with conventionally prepared interference stacks.
authors: Fraunhofer-Institute for Applied Optics and Precision Engineering, Jena, Germany. ulrike.schulz@iof.fraunhofer.de
authors: Ulrike
authors: U
authors: Schulz
authors: Christiane
authors: C
authors: Präfke
authors: Christoph
authors: C
authors: Gödeker
authors: Norbert
authors: N
authors: Kaiser
authors: Andreas
authors: A
authors: Tünnermann