title: Tunable ultra-deep subwavelength photolithography using a surface plasmon resonant cavity.
abstract: Using numerical simulations, we report an observation of a novel tunable ultra-deep subwavelength nanolithography technique using a surface plasmon resonant cavity formed by a metallic grating and a metallic thin-film layer separated by a photoresist layer. The tuning capability is implemented by varying the cavity length, from which surface plasmon interferometric patterns with inherently higher optical resolution than that of conventional surface plasmon techniques are generated in the cavity of photoresist layer. The physical origin of the tunability is analytically confirmed by the dispersion relation derived from the cavity system.
authors: Institute of Modern Optical Technologies and Key Laboratory of Advanced Optical Manufacturing Technologies of Jiangsu Province, Soochow University, Suzhou, China.
authors: Weihao
authors: W
authors: Ge
authors: Chinhua
authors: C
authors: Wang
authors: Yinfei
authors: Y
authors: Xue
authors: Bing
authors: B
authors: Cao
authors: Baoshun
authors: B
authors: Zhang
authors: Ke
authors: K
authors: Xu
mesh_terms: D004867:Equipment Design; D019544:Equipment Failure Analysis; D008670:Metals / Q000737:chemistry*; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D036103:Nanotechnology / Q000295:instrumentation*; D010781:Photography / Q000295:instrumentation*; D020349:Surface Plasmon Resonance / Q000295:instrumentation*
chemical_list: D008670:Metals