title: Note: Quantitative (artifact-free) surface potential measurements using Kelvin force microscopy.
abstract: The measurement of local surface potentials by Kelvin force microscopy (KFM) can be sensitive to external perturbations which lead to artifacts such as strong dependences of experimental results (typically in a ∼1 V range) with KFM internal parameters (cantilever excitation frequency and/or the projection phase of the KFM feedback-loop). We analyze and demonstrate a correction of such effects on a KFM implementation in ambient air. Artifact-free KFM measurements, i.e., truly quantitative surface potential measurements, are obtained with a ∼30 mV accuracy.
authors: Institute of Electronics, Microelectronics and Nanotechnology, CNRS-UMR 8520, Avenue Poincaré, BP 60069, 59652 Villeneuve d'Ascq Cedex, France. thierry.melin@isen.iemn.univ-lille1.fr
authors: T
authors: T
authors: Mélin
authors: S
authors: S
authors: Barbet
authors: H
authors: H
authors: Diesinger
authors: D
authors: D
authors: Théron
authors: D
authors: D
authors: Deresmes