title: Instrument for close-to-process light scatter measurements of thin film coatings and substrates.
abstract: Scatter analysis is an effective method for the characterization of thin film components. The new highly sensitive table top system ALBATROSS-TT (3D-Arrangement for Laser Based Transmittance, Reflectance and Optical Scatter Measurement-Table Top) has been developed at the Fraunhofer Institute in Jena to meet the specific requirements for close-to-process applications. Extremely high sensitivity with a noise equivalent angle resolved scatter level of 2×10(-8) sr(-1), full three-dimensional spherical measurement capability, and an instrument size as small as 0.8 m×0.8 m×0.8 m have been achieved. Details of specifications, optical components, and software are presented, including a comparison to our laboratory system. Anisotropy analysis of diamond-turned aluminum substrates as well as substrate and coating characterization are demonstrated as examples of application.
authors: Fraunhofer Institute for Applied Optics and Precision Engineering, Jena, Germany. alexander.finck@iof.fraunhofer.de
authors: Alexander
authors: A
authors: von Finck
authors: Matthias
authors: M
authors: Hauptvogel
authors: Angela
authors: A
authors: Duparré