title: Plasma-assisted deposition of metal fluoride coatings and modeling the extinction coefficient of as-deposited single layers.
abstract: We realized metal fluoride coatings with a high packing density and a low extinction coefficient by plasma (ion)-assisted deposition. The densification can be performed by different types of plasma sources, e.g., by a Leybold LION source and a Leybold APSpro, respectively. But the as-deposited coatings show a characteristic absorption behavior, whereas the absorption losses can be reduced in a postdeposition UV treatment step. We show experimental results of the plasma-assisted metal fluorides before and after the UV treatment and present a new model that allows us to describe and calculate the characteristic absorption losses of LaF3, MgF2, and AlF3.
authors: Qioptiq Photonics GmbH & Co. KG., Göttingen, Germany. martin.bischoff@qioptiq.de
authors: Martin
authors: M
authors: Bischoff
authors: Olaf
authors: O
authors: Stenzel
authors: Karen
authors: K
authors: Friedrich
authors: Steffen
authors: S
authors: Wilbrandt
authors: Dieter
authors: D
authors: Gäbler
authors: Stefan
authors: S
authors: Mewes
authors: Norbert
authors: N
authors: Kaiser