title: Design and fabrication of multichannel Si/SiO2 autocloned photonic crystal edge filters.
abstract: An Si/SiO2 multilayer with zigzag layer interfaces is fabricated on a patterned silica substrate using the autocloning method. The multilayer is designed to function as multichannel long-wave pass type edge filters with various cutoff wavelengths. A cutoff wavelength shift of the order of 190 nm in the near infrared region (1300-1500 nm) is experimentally demonstrated.
authors: Department of Electrical and Communication Engineering, Graduate School of Engineering, Tohoku University, Aoba-ku, Sendai, Miyagi, Japan. ohtera@ecei.tohoku.ac.jp
authors: Yasuo
authors: Y
authors: Ohtera
authors: Daniel
authors: D
authors: Kurniatan
authors: Hirohito
authors: H
authors: Yamada