title: Ring opening metathesis polymerization derived polymers as photoresists: making use of thiol-ene chemistry.
abstract: Ring opening metathesis polymerization derived poly(norbornene) films and aggregates were crosslinked via photo chemically induced thiol-ene chemistry using a multifunctional thiol and the double bonds present in the polymer backbones. The presented method was illustrated by the description of a negative-toned photoresist formulation based on above mentioned ingredients.
authors: Institute of Chemistry of Polymeric Materials, University of Leoben, Otto-Glöckel-Strasse 2, 8700 Leoben, Austria.
authors: Archim
authors: A
authors: Wolfberger
authors: Barbara
authors: B
authors: Rupp
authors: Wolfgang
authors: W
authors: Kern
authors: Thomas
authors: T
authors: Griesser
authors: Christian
authors: C
authors: Slugovc
mesh_terms: D009636:Norbornanes / Q000737:chemistry*; D058105:Polymerization; D011108:Polymers / Q000737:chemistry*; D013438:Sulfhydryl Compounds / Q000737:chemistry*
chemical_list: D009636:Norbornanes; D011108:Polymers; D013438:Sulfhydryl Compounds