title: Improving thin-film manufacturing yield with robust optimization.
abstract: A novel robust optimization algorithm is demonstrated that is largely deterministic, and yet it attempts to account for statistical variations in coating. Through Monte Carlo simulations of manufacturing, we compare the performance of a proof-of-concept antireflection (AR) coating designed with our robust optimization to that of a conventionally optimized AR coating. We find that the robust algorithm produces an AR coating with a significantly improved yield.
authors: Department of Electrical and Computer Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, USA. birge@mit.edu
authors: Jonathan R
authors: JR
authors: Birge
authors: Franz X
authors: FX
authors: Kärtner
authors: Omid
authors: O
authors: Nohadani