title: Effects of substrate temperatures on the structure and properties of hafnium dioxide films.
abstract: Different HfO2 monolayers under different deposition conditions, such as substrate temperature and oxygen partial pressure, were prepared from metal hafnium using the reactive electron beam evaporation method. X-ray diffraction was applied to determine the crystalline phase of these films, the surface morphology of the samples was examined by atomic force microscopy, and the optical properties were analyzed using a spectrophotometer and the surface thermal lens technique. The relationship between substrate temperature and film characteristic was investigated, and the correlation between the observed film properties and the laser damage threshold was also discussed.
authors: Institute of Precision Optical Engineering, Department of Physics, Tongji University, Shanghai, China.
authors: Hongfei
authors: H
authors: Jiao
authors: Xinbin
authors: X
authors: Cheng
authors: Jiangtao
authors: J
authors: Lu
authors: Ganghua
authors: G
authors: Bao
authors: Yongli
authors: Y
authors: Liu
authors: Bin
authors: B
authors: Ma
authors: Pengfei
authors: P
authors: He
authors: Zhanshan
authors: Z
authors: Wang