title: Influence of the substrate finish and thin film roughness on the optical performance of Mo/Si multilayers.
abstract: Scattering resulting from interface imperfections critically affects the image contrast and optical throughput of multilayer coatings for 13.5 nm. To investigate the scattering mechanisms, at-wavelength scattering measurements in combination with atomic force microscopy are analyzed for an in-depth characterization of the roughness properties. The different impacts of substrate finish and intrinsic thin film roughness on the scattering distribution are separated and analyzed in detail. Furthermore, a novel approach to characterize the roughness of large extreme ultraviolet substrates is presented, based on light scattering measurements at 442 nm.
authors: Fraunhofer Institute for Applied Optics and Precision Engineering (IOF), Jena, Germany. Marcus.Trost@iof.fraunhofer.de
authors: Marcus
authors: M
authors: Trost
authors: Sven
authors: S
authors: Schröder
authors: Torsten
authors: T
authors: Feigl
authors: Angela
authors: A
authors: Duparré
authors: Andreas
authors: A
authors: Tünnermann