title: Fabrication of colloidal grid network by two-step convective self-assembly.
abstract: We explored a "template-free" approach to arranging colloidal particles into a network pattern by a convective self-assembly technique. In this approach, which we call "two-step convective self-assembly," a stripe pattern of colloidal particles is first prepared on a substrate by immersing it in a suspension. The substrate with the stripes is then rotated by 90° and again immersed in the suspension to produce stripes perpendicular to the first ones, resulting in a grid-pattern network of colloidal arrays. The width of the colloidal grid lines can be controlled by changing the particle concentration while maintaining an almost constant spacing between the lines. On the basis of these results, we propose a mechanism for grid pattern formation. Our method is applicable to various types of particles. In addition, the wide applicability of this method was employed to create a hybrid grid pattern.
authors: Department of Chemical Engineering, Kyoto University, Katsura, Nishikyo, Kyoto 615-8510, Japan.
authors: Yasushi
authors: Y
authors: Mino
authors: Satoshi
authors: S
authors: Watanabe
authors: Minoru T
authors: MT
authors: Miyahara
mesh_terms: D003102:Colloids / Q000737:chemistry*; D005898:Glass / Q000737:chemistry; D057927:Hydrophobic and Hydrophilic Interactions; D007101:Immersion; D055620:Optical Phenomena; D012822:Silicon Dioxide / Q000737:chemistry; D012834:Silver / Q000737:chemistry
chemical_list: D003102:Colloids; D012834:Silver; D012822:Silicon Dioxide