title: Novel plasma immersion ion implantation and deposition hardware and technique based on high power pulsed magnetron discharge.
abstract: A novel plasma immersion ion implantation technique based on high power pulsed magnetron sputtering (HPPMS) discharge that can produce a high density metal plasma is described. The metal plasma is clean and does not suffer from contamination from macroparticles, and the process can be readily scaled up for industrial production. The hardware, working principle, and operation modes are described. A matching circuit is developed to modulate the high-voltage and HPPMS pulses to enable operation under different modes such as simultaneous implantation and deposition, pure implantation, and selective implantation. To demonstrate the efficacy of the system and technique, CrN films with a smooth and dense surface without macroparticles were produced. An excellent adhesion with a critical load of 59.9 N is achieved for the pure implantation mode.
authors: State Key Laboratory of Advanced Welding Production and Technology, Harbin Institute of Technology, Harbin 150001, China.
authors: Zhongzhen
authors: Z
authors: Wu
authors: Xiubo
authors: X
authors: Tian
authors: Jingwei
authors: J
authors: Shi
authors: Zeming
authors: Z
authors: Wang
authors: Chunzhi
authors: C
authors: Gong
authors: Shiqin
authors: S
authors: Yang
authors: Paul K
authors: PK
authors: Chu