title: ZnO:Al thin films deposited by RF-magnetron sputtering with tunable and uniform properties.
abstract: Nanostructured, high quality and large area Al-doped ZnO (ZnO:Al) thin films were obtained by radiofrequency (RF) magnetron sputtering. The sample rotation during deposition has resulted in excellent spatial distribution of thickness and electro-optical properties compared to that obtained under static conditions. ZnO:Al thin films are employed in a large number of devices, including thin film solar cells, where the uniformity of the properties is a key factor for a possible up-scaling of the research results to industrially relevant substrate sizes. A chemical post etching treatment was employed achieving tunable surface nanotextures to generate light scattering at the desired wavelength for improved cell efficiency. Since the film resistivity is only slightly increased by the etching, this post-deposition step allows separating the optimization of electro-optical properties from light scattering behavior. The thin films were characterized by FE-SEM, XRD, UV-VIS spectroscopy, four probe and van der Paw techniques.
authors: CNR-Institute for Energetics and Interphases, Corso Stati Uniti 4, 35127 Padova, Italy.
authors: E
authors: E
authors: Miorin
authors: F
authors: F
authors: Montagner
authors: S
authors: S
authors: Battiston
authors: S
authors: S
authors: Fiameni
authors: M
authors: M
authors: Fabrizio
mesh_terms: D000535:Aluminum / Q000737:chemistry*; D003460:Crystallization / Q000379:methods*; D004595:Electroplating / Q000379:methods*; D008280:Magnetics; D008422:Materials Testing; D008567:Membranes, Artificial; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D010316:Particle Size; D011846:Radio Waves; D013499:Surface Properties; D015034:Zinc Oxide / Q000737:chemistry*
chemical_list: D008567:Membranes, Artificial; D000535:Aluminum; D015034:Zinc Oxide