title: Plasmonic nanofabrication by long-range excitation transfer via DNA nanowire.
abstract: Driven by the demand for ongoing integration and increased complexity of today's microelectronic circuits, smaller and smaller structures need to be fabricated with a high throughput. In contrast to serial nanofabrication techniques, based, e.g., on electron beam or scanning probe methods, optical methods allow a parallel approach and thus a high throughput. However, they rarely reach the desired resolution. One example is plasmon lithography, which is limited by the utilized plasmonic metal structures. Here we show a new approach extending plasmonic lithography with the potential for a highly parallel nanofabrication with a higher level of complexity based on nanoantenna effects combined with molecular nanowires. Thereby femtosecond laser pulse light is converted by Ag nanoparticles into a high plasmonic excitation guided along attached DNA structures. An underlying poly(methyl methacrylate) (PMMA) layer acting as an electron-sensitive resist is so structured along the former DNA position. This apparently DNA-guided effect leads to nanometer grooves reaching even micrometers away from the excited nanoparticle, representing a novel effect of long-range excitation transfer along DNA nanowires.
authors: Institute of Photonic Technology, Jena 07745, Germany.
authors: J
authors: J
authors: Wirth
authors: F
authors: F
authors: Garwe
authors: G
authors: G
authors: Hähnel
authors: A
authors: A
authors: Csáki
authors: N
authors: N
authors: Jahr
authors: O
authors: O
authors: Stranik
authors: W
authors: W
authors: Paa
authors: W
authors: W
authors: Fritzsche
mesh_terms: D004247:DNA / Q000737:chemistry*; D008422:Materials Testing; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D010316:Particle Size; D019904:Polymethyl Methacrylate / Q000737:chemistry*; D020349:Surface Plasmon Resonance / Q000379:methods*
chemical_list: D004247:DNA; D019904:Polymethyl Methacrylate