title: Iridium/silicon multilayers for extreme ultraviolet applications in the 20-35 nm wavelength range.
abstract: We have developed an Ir/Si multilayer for extreme ultraviolet (EUV) applications. Normal incidence reflectance measurements of a prototype film tuned to 30 nm wavelength show superior performance relative to a conventional Mo/Si multilayer structure; we also find good stability over time. Transmission electron microscopy and electron dispersive x-ray spectroscopy have been used to examine the microstructure and interface properties of this system: we find amorphous Si layers and polycrystalline Ir layers, with asymmetric interlayer regions of mixed composition. Potential applications of Ir/Si multilayers include instrumentation for solar physics and laboratory EUV beam manipulation.
authors.affiliation: Consiglio Nazionale delle Ricerche-Institute for Photonics and Nanotechnologies Laboratory for Ultraviolet and X-Ray Optical Research, via Trasea 7, 35131 Padova, Italy. zuppella@dei.unipd.it
authors.forename: Paola
authors.initials: P
authors.lastname: Zuppella
authors.forename: Gianni
authors.initials: G
authors.lastname: Monaco
authors.forename: Alain Jody
authors.initials: AJ
authors.lastname: Corso
authors.forename: Piergiorgio
authors.initials: P
authors.lastname: Nicolosi
authors.forename: David L
authors.initials: DL
authors.lastname: Windt
authors.forename: Valentina
authors.initials: V
authors.lastname: Bello
authors.forename: Giovanni
authors.initials: G
authors.lastname: Mattei
authors.forename: Maria Guglielmina
authors.initials: MG
authors.lastname: Pelizzo