title: Superhydrophobic nanostructured silicon surfaces with controllable broadband reflectance.
abstract: Nanostructured superhydrophobic silicon surfaces with tunable reflectance are fabricated via a simple maskless deep reactive-ion etching process. By controlling the scale of the high-aspect-ratio nanostructures on a wafer-scale surface, surface reflectance is maximized or minimized over the UV-vis-IR range while maintaining superhydrophobic properties.
authors.affiliation: Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), San 31, Pohang, Gyungbuk, 790-784, the Republic of Korea.
authors.forename: Seong J
authors.initials: SJ
authors.lastname: Cho
authors.forename: Taechang
authors.initials: T
authors.lastname: An
authors.forename: Jin Young
authors.initials: JY
authors.lastname: Kim
authors.forename: Jungwoo
authors.initials: J
authors.lastname: Sung
authors.forename: Geunbae
authors.initials: G
authors.lastname: Lim
mesh_terms: D057927:Hydrophobic and Hydrophilic Interactions; D049329:Nanostructures / Q000737:chemistry*; D012825:Silicon / Q000737:chemistry*; D013055:Spectrophotometry, Infrared; D013056:Spectrophotometry, Ultraviolet; D013499:Surface Properties
chemical_list: D012825:Silicon