title: Soft-lithographic approach to functionalization and nanopatterning oxide-free silicon.
abstract: We report a simple, reliable high-throughput method for patterning passivated silicon with reactive organic monolayers and demonstrate selective functionalization of the patterned substrates with both small molecules and proteins. The approach completely protects silicon from chemical oxidation, provides precise control over the shape and size of the patterned features in the 100 nm domain, and gives rapid, ready access to chemically discriminated patterns that can be further functionalized with both organic and biological molecules.
authors.affiliation: Department of Chemistry, Duke University, Durham, North Carolina 27708, United States.
authors.forename: Alexander A
authors.initials: AA
authors.lastname: Shestopalov
authors.forename: Carleen J
authors.initials: CJ
authors.lastname: Morris
authors.forename: Briana N
authors.initials: BN
authors.lastname: Vogen
authors.forename: Amanda
authors.initials: A
authors.lastname: Hoertz
authors.forename: Robert L
authors.initials: RL
authors.lastname: Clark
authors.forename: Eric J
authors.initials: EJ
authors.lastname: Toone
mesh_terms: D000179:Acrylates / Q000737:chemistry; D002264:Carboxylic Acids / Q000737:chemistry; D002384:Catalysis; D006868:Hydrolysis; D036103:Nanotechnology / Q000379:methods*; D010084:Oxidation-Reduction; D011140:Polyurethanes / Q000737:chemistry; D011327:Printing / Q000379:methods*; D015203:Reproducibility of Results; D012825:Silicon / Q000737:chemistry*; D013388:Succinimides / Q000737:chemistry; D013499:Surface Properties
chemical_list: D000179:Acrylates; D002264:Carboxylic Acids; D011140:Polyurethanes; D013388:Succinimides; C036658:acrylic acid; C001426:N-hydroxysuccinimide; D012825:Silicon