title: Photodegradation of melanin by an interferometric technique.
abstract: Photodegradation of melanin thin films is investigated for a UVA wavelength of 355 nm and a UVC wavelength of 244 nm. The technique involves interferometric exposure of melanin with two coherent beams from a low-power UV laser. The periodic photodegradation-grating pattern is monitored by diffraction of a second low-power He-Ne laser. Dependence of the photodegradation rate on UV intensity as well as the effect of ambient humidity is investigated and explained with a simple model. The technique has promise for investigating photo-induced effects in other biomolecular substrates as well.
authors.affiliation: Department of Physics, Alabama A&M University, Normal, Alabama 35762, USA.
authors.forename: C W
authors.initials: CW
authors.lastname: Farley
authors.forename: A
authors.initials: A
authors.lastname: Kassu
authors.forename: A
authors.initials: A
authors.lastname: Sharma
mesh_terms: D004307:Dose-Response Relationship, Radiation; D007368:Interferometry / Q000379:methods*; D008543:Melanins / Q000737:chemistry*; D055668:Photochemical Processes; D014466:Ultraviolet Rays
chemical_list: D008543:Melanins