title: Optical properties and residual stress in aluminum nitride films prepared by alternating-current dual reactive magnetron sputtering.
abstract: Aluminum nitride films were deposited by alternating-current dual reactive magnetron sputtering. The influence of different nitrogen flow and working pressures at a sputtering power of 5 kW on the refractive index, extinction coefficient, crystalline structure, residual stress, and surface roughness of aluminum nitride films was discussed. The aluminum nitride film would have high refractive index, low extinction coefficient and small residual stress at suitable nitrogen flow rate and low working pressure.
authors.affiliation: Department of Optoelectronic System Engineering, Minghsin University of Science and Technology, Hsin-Chu 304, Taiwan. cjtang@must.edu.tw
authors.forename: Chien-Jen
authors.initials: CJ
authors.lastname: Tang
authors.forename: Cheng-Chung
authors.initials: CC
authors.lastname: Jaing
authors.forename: Kun-Hsien
authors.initials: KH
authors.lastname: Lee
authors.forename: Cheng-Chung
authors.initials: CC
authors.lastname: Lee