title: A route to nanoscopic materials via sequential infiltration synthesis on block copolymer templates.
abstract: Sequential infiltration synthesis (SIS), combining stepwise molecular assembly reactions with self-assembled block copolymer (BCP) substrates, provides a new strategy to pattern nanoscopic materials in a controllable way. The selective reaction of a metal precursor with one of the pristine BCP domains is the key step in the SIS process. Here we present a straightforward strategy to selectively modify self-assembled polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) BCP thin films to enable the SIS of a variety of materials including SiO(2), ZnO, and W. The selective and controlled interaction of trimethyl aluminum with carbonyl groups in the PMMA polymer domains generates Al-CH(3)/Al-OH sites inside the BCP scaffold which can seed the subsequent growth of a diverse range of materials without requiring complex block copolymer design and synthesis.
authors.affiliation: Energy Systems Division, Center for Nanoscale Materials, Argonne National Laboratory, 9700 S. Cass Avenue, Argonne, Illinois 60439, United States.
authors.forename: Qing
authors.initials: Q
authors.lastname: Peng
authors.forename: Yu-Chih
authors.initials: YC
authors.lastname: Tseng
authors.forename: Seth B
authors.initials: SB
authors.lastname: Darling
authors.forename: Jeffrey W
authors.initials: JW
authors.lastname: Elam
mesh_terms: D000535:Aluminum / Q000737:chemistry; D002244:Carbon / Q000737:chemistry; D008422:Materials Testing; D049329:Nanostructures / Q000737:chemistry; D036103:Nanotechnology / Q000379:methods*; D010100:Oxygen / Q000737:chemistry; D044367:Phase Transition; D011108:Polymers / Q000737:chemistry*; D019904:Polymethyl Methacrylate / Q000737:chemistry; D011137:Polystyrenes / Q000737:chemistry; D012825:Silicon / Q000737:chemistry; D012822:Silicon Dioxide / Q000737:chemistry; D013696:Temperature; D014783:Viscosity
chemical_list: D011108:Polymers; D011137:Polystyrenes; D002244:Carbon; D012822:Silicon Dioxide; D019904:Polymethyl Methacrylate; D000535:Aluminum; D010100:Oxygen; D012825:Silicon