title: Nanotransfer printing using plasma etched silicon stamps and mediated by in situ deposited fluoropolymer.
abstract: This communication describes a simple method that uses a thin film of octafluorocyclobutane (OFCB) polymer for efficient nanoscale transfer printing (nTP). Plasma polymerization of OFCB produces a Teflon-like fluoropolymer which strongly adheres and conformally covers a 3-D inorganic stamp. The inherently low surface energy of in situ deposited OFCB polymer on nanoscale silicon features is demonstrated as a unique nanocomposite stamp to fabricate various test structures with improved nTP feature resolution down to sub-100 nm.
authors.affiliation: Department of Chemistry, University of Tennessee, Knoxville, Tennessee 37996, USA.
authors.forename: Deepak
authors.initials: D
authors.lastname: Bhandari
authors.forename: Ivan I
authors.initials: II
authors.lastname: Kravchenko
authors.forename: Nickolay V
authors.initials: NV
authors.lastname: Lavrik
authors.forename: Michael J
authors.initials: MJ
authors.lastname: Sepaniak