title: Two degrees-of-freedom Lloyd-mirror interferometer for superior pattern coverage area.
abstract: In this study, we have developed a tunable Lloyd-mirror interferometer with two degrees of freedom, in contrast to a traditional system with one degree of freedom. This new Lloyd-mirror interferometer allows an angular rotation of the mirror independently from that of a sample stage, resulting in an increased pattern coverage area with tunable pattern periodicity. Both theoretical and experimental results verify that the tunable characteristic of the modified configuration enhances the nanopatterning capabilities of the Lloyd-mirror interference lithography system especially in achieving greater pattern coverage area for larger pattern periodicities.
authors.affiliation: Department of Mechanical Engineering, Stevens Institute of Technology, Castle Point on Hudson, Hoboken, New Jersey 07030, USA.
authors.forename: Ishan
authors.initials: I
authors.lastname: Wathuthanthri
authors.forename: Weidong
authors.initials: W
authors.lastname: Mao
authors.forename: Chang-Hwan
authors.initials: CH
authors.lastname: Choi