title: Method for patterning various nanomaterials: electrochemical deposition of patterned Ni thin films and their utilization as a strippable mask.
abstract: We report an interesting approach for preparing micropatternings of nanomaterials, such as carbon nanotubes and TiO(2) nanoparticles. In the method, exfoliation of electrodeposited Ni thin films was the key process. After patterning indium thin oxide (ITO) plates with an insulating photoresist by conventional photolithography, Ni was electrodeposited on only the exposed ITO areas. The resulting substrates were evenly covered with nanomaterials by a drop cast method. By exfoliating the electrodeposited Ni thin films from the substrates, patterned nanomaterial films were formed.
authors.affiliation: Department of Chemistry & Materials Science, Tokyo Institute of Technology 2-12-1, Ookayama, Tokyo 152-8552, Japan. ogihara@cms.titech.ac.jp
authors.forename: Hitoshi
authors.initials: H
authors.lastname: Ogihara
authors.forename: Masaru
authors.initials: M
authors.lastname: Fukasawa
authors.forename: Tetsuo
authors.initials: T
authors.lastname: Saji
mesh_terms: D004563:Electrochemistry / Q000379:methods*; D004595:Electroplating; D053758:Nanoparticles / Q000737:chemistry; D049329:Nanostructures / Q000737:chemistry*; D037742:Nanotubes, Carbon / Q000737:chemistry*; D009532:Nickel / Q000737:chemistry*
chemical_list: D037742:Nanotubes, Carbon; D009532:Nickel