title: Patterning of tailored polycarbonate based non-chemically amplified resists using extreme ultraviolet lithography.
abstract: A series of high-performance polycarbonates have been prepared with glass-transition temperatures and decomposition temperatures that are tunable by varying the repeat-unit chemical structure. Patterning of the polymers with extreme UV lithography has been achieved by taking advantage of direct photoinduced chain scission of the polymer chains, which results in a molecular-weight based solubility switch. After selective development of the irradiated regions of the polymers, feature sizes as small as 28.6 nm have been printed and the importance of resist-developer interactions for maximizing image quality has been demonstrated.
authors.affiliation: The University of Queensland, Australian Institute for Bioengineering & Nanotechnology and Centre for Advanced Imaging, Queensland, 4072 Australia.
authors.forename: Anguang
authors.initials: A
authors.lastname: Yu
authors.forename: Heping
authors.initials: H
authors.lastname: Liu
authors.forename: James P
authors.initials: JP
authors.lastname: Blinco
authors.forename: Kevin S
authors.initials: KS
authors.lastname: Jack
authors.forename: Michael
authors.initials: M
authors.lastname: Leeson
authors.forename: Todd R
authors.initials: TR
authors.lastname: Younkin
authors.forename: Andrew K
authors.initials: AK
authors.lastname: Whittaker
authors.forename: Idriss
authors.initials: I
authors.lastname: Blakey