title: Accelerated reliability testing of highly aligned single-walled carbon nanotube networks subjected to DC electrical stressing.
abstract: We investigate the electrical reliability of nanoscale lines of highly aligned, networked, metallic/semiconducting single-walled carbon nanotubes (SWCNTs) fabricated through a template-based fluidic assembly process. We find that these SWCNT networks can withstand DC current densities larger than 10 MA cm(-2) for several hours and, in some cases, several days. We develop test methods that show that the degradation rate, failure predictability and total device lifetime can be linked to the initial resistance. Scanning electron and transmission electron microscopy suggest that fabrication variability plays a critical role in the rate of degradation, and we offer an empirical method of quickly determining the long-term performance of a network. We find that well-fabricated lines subject to constant electrical stress show a linear accumulation of damage reminiscent of electromigration in metallic interconnects, and we explore the underlying physical mechanisms that could cause such behavior.
authors.affiliation: Materials Reliability Division, National Institute of Standards and Technology, Boulder, CO 80305, USA. mark.strus@nist.gov
authors.forename: Mark C
authors.initials: MC
authors.lastname: Strus
authors.forename: Ann N
authors.initials: AN
authors.lastname: Chiaramonti
authors.forename: Young Lae
authors.initials: YL
authors.lastname: Kim
authors.forename: Yung Joon
authors.initials: YJ
authors.lastname: Jung
authors.forename: Robert R
authors.initials: RR
authors.lastname: Keller