title: Large-area graphene films by simple solution casting of edge-selectively functionalized graphite.
abstract: We report edge-selective functionalization of graphite (EFG) for the production of large-area uniform graphene films by simply solution-casting EFG dispersions in dichloromethane on silicon oxide substrates, followed by annealing. The resultant graphene films show ambipolar transport properties with sheet resistances of 0.52-3.11 kΩ/sq at 63-90% optical transmittance. EFG allows solution processing methods for the scalable production of electrically conductive, optically transparent, and mechanically robust flexible graphene films for use in practice.
authors: Interdisciplinary School of Green Energy and Institute of Advanced Materials and Devices, Ulsan National Institute of Science and Technology (UNIST), 100, Banyeon, Ulsan 689-798, South Korea.
authors: Seo-Yoon
authors: SY
authors: Bae
authors: In-Yup
authors: IY
authors: Jeon
authors: Jieun
authors: J
authors: Yang
authors: Noejung
authors: N
authors: Park
authors: Hyeon Suk
authors: HS
authors: Shin
authors: Sungjin
authors: S
authors: Park
authors: Rodney S
authors: RS
authors: Ruoff
authors: Liming
authors: L
authors: Dai
authors: Jong-Beom
authors: JB
authors: Baek