title: A crossbar-type high sensitivity ultraviolet photodetector array based on a one hole-one nanorod configuration via nanoimprint lithography.
abstract: Single crystalline vertical ZnO nanorods were grown in a one hole-one rod configuration using a hydrothermal method with a patterned polymer template generated by nanoimprint lithography, allowing precise control over the position and density of the ZnO nanorods. An 8×8 ZnO nanorod-based ultraviolet photodetector array is demonstrated, in which a well-confined number of ZnO nanorods are sandwiched between crossbar-type platinum and indium tin oxide electrodes (e.g. 16 nanorods in a 2×2 µm2 area). A high photocurrent/dark current ratio of 3×10(3) at a reverse bias of 1.5 V under UV illumination at room temperature, a responsivity of 4381.4 A W(-1) at 365 nm, and an ultraviolet-to-visible rejection ratio of 83 are obtained and maintained, irrespective of pixel size. A uniform photoresponse is achieved in each of the pixels, indicating the scalability with this technique for fabricating an integrated UV photodetector array circuit.
authors: School of Materials Science and Engineering, Gwangju Institute of Science and Technology (GIST), Gwangju, 500-712, Republic of Korea.
authors: Huisu
authors: H
authors: Jeong
authors: Ki Seok
authors: KS
authors: Kim
authors: Yong Hwan
authors: YH
authors: Kim
authors: Hyun
authors: H
authors: Jeong
authors: Hui
authors: H
authors: Song
authors: Kwang Ho
authors: KH
authors: Lee
authors: Mun Seok
authors: MS
authors: Jeong
authors: Deli
authors: D
authors: Wang
authors: Gun Young
authors: GY
authors: Jung