title: High-fidelity solvent-resistant replica molding of hydrophobic polymer surfaces produced by femtosecond laser nanofabrication.
abstract: We demonstrate that hydrophobic areas formed by femtosecond laser irradiation on poly(methyl methacrylate) (PMMA) and polystyrene (PS) polymer substrates can be faithfully replicated on samples of the same material via a solvent-resistant perfluoropolyether (PFPE) elastomer mold. The replicated PMMA and PS samples show nearly identical micro-nanoscale topography and hydrophobic wetting characteristics as the laser-patterned master substrates. This work combines the femtosecond laser capability of spatially tailoring the wettability with a high-resolution parallel replication method, offering the potential for the efficient production of microfluidic devices with selectively tailored flow behavior.
authors.affiliation: Dipartimento di Chimica, Materiali e Ingegneria Chimica Giulio Natta, Politecnico di Milano, Piazza Leonardo da Vinci 32, 20133 Milan, Italy. carmela.demarco@chem.polimi.it
authors.forename: Carmela
authors.initials: C
authors.lastname: De Marco
authors.forename: Shane M
authors.initials: SM
authors.lastname: Eaton
authors.forename: Marinella
authors.initials: M
authors.lastname: Levi
authors.forename: Giulio
authors.initials: G
authors.lastname: Cerullo
authors.forename: Stefano
authors.initials: S
authors.lastname: Turri
authors.forename: Roberto
authors.initials: R
authors.lastname: Osellame
mesh_terms: D004987:Ethers / Q000737:chemistry; D057927:Hydrophobic and Hydrophilic Interactions; D007834:Lasers; D036103:Nanotechnology; D010316:Particle Size; D019904:Polymethyl Methacrylate / Q000737:chemistry*; D011137:Polystyrenes / Q000737:chemistry*; D012997:Solvents / Q000737:chemistry; D013499:Surface Properties; D013997:Time Factors
chemical_list: D004987:Ethers; D011137:Polystyrenes; D012997:Solvents; D019904:Polymethyl Methacrylate