title: Deposition of platinum patterns by a liquid process.
abstract: In contrast to the traditional chemical vapor deposition technique under high vacuum, we introduce a deposition method in liquid to prepare Pt patterns on substrate near 100 °C by seed growth.
authors.affiliation: Japan Science and Technology Agency, ERATO, Shimoda Nano Liquid Process Project, 2-5-3 Asahidai, Nomi 923-1211, Japan. z-shen@ishikawa-sp.com
authors.forename: Zhongrong
authors.initials: Z
authors.lastname: Shen
authors.forename: Jinwang
authors.initials: J
authors.lastname: Li
authors.forename: Yasuo
authors.initials: Y
authors.lastname: Matsuki
authors.forename: Tatsuya
authors.initials: T
authors.lastname: Shimoda