title: A 50 nm spatial resolution EUV imaging-resolution dependence on object thickness and illumination bandwidth.
abstract: In this paper we report a desk-top microscopy reaching 50 nm spatial resolution in very compact setup using a gas-puff laser plasma EUV source. The thickness of an object and the bandwidth of illuminating radiation were studied in order to estimate their quantitative influence on the EUV microscope spatial resolution. EUV images of various thickness objects obtained by illumination with variable bandwidth EUV radiation were compared in terms of knife-edge spatial resolution to study the bandwidth/object thickness parasitic influence on spatial resolution of the EUV microscope.
authors.affiliation: Institute of Optoelectronics, Military University of Technology, ul. gen. S. Kaliskiego 2, 00-908 Warsaw, Poland. wachulak@gmail.com
authors.forename: Przemyslaw W
authors.initials: PW
authors.lastname: Wachulak
authors.forename: Andrzej
authors.initials: A
authors.lastname: Bartnik
authors.forename: Henryk
authors.initials: H
authors.lastname: Fiedorowicz
authors.forename: Jerzy
authors.initials: J
authors.lastname: Kostecki