title: Semiconductor dendritic-linear block copolymers by nitroxide mediated radical polymerization.
abstract: The first synthesis of a semiconductor hybrid diblock copolymer comprised of p-type dendritic and n-type linear blocks by nitroxide mediated radical polymerization (NMRP) is reported. A triphenylamine (TPA) bearing second generation polyether dendron [G2]-OH has been functionalized with an alkoxyamine and, subsequently, perylene bisimide acrylate (PerAcr) was polymerized to obtain a hybrid block copolymer, [G2]-b-PPerAcr. The hybrid block copolymer structure is supported by (1) H NMR and size exclusion chromatography. Furthermore, the novel materials were studied by UV-vis absorption spectrometry, photoluminescence, cyclic voltammetry, differential scanning calorimetry and thermogravimetry analysis.
authors.affiliation: Applied Functional Polymers, Department of Macromolecular Chemistry I, University of Bayreuth, Universitätsstr. 30, 95440 Bayreuth, Germany.
authors.forename: Andreas S
authors.initials: AS
authors.lastname: Lang
authors.forename: Franz René
authors.initials: FR
authors.lastname: Kogler
authors.forename: Michael
authors.initials: M
authors.lastname: Sommer
authors.forename: Ulrich
authors.initials: U
authors.lastname: Wiesner
authors.forename: Mukundan
authors.initials: M
authors.lastname: Thelakkat