title: Improved arrayed-waveguide-grating layout avoiding systematic phase errors.
abstract: We present a detailed description of an improved arrayed-waveguide-grating (AWG) layout for both, low and high diffraction orders. The novel layout presents identical bends across the entire array; in this way systematic phase errors arising from different bends that are inherent to conventional AWG designs are completely eliminated. In addition, for high-order AWGs our design results in more than 50% reduction of the occupied area on the wafer. We present an experimental characterization of a low-order device fabricated according to this geometry. The device has a resolution of 5.5 nm, low intrinsic losses (< 2 dB) in the wavelength region of interest for the application, and is polarization insensitive over a wide spectral range of 215 nm.
authors.affiliation: MESA + Institute for Nanotechnology, University of Twente, Enschede, The Netherlands. n.ismail@ewi.utwente.nl
authors.forename: Nur
authors.initials: N
authors.lastname: Ismail
authors.forename: Fei
authors.initials: F
authors.lastname: Sun
authors.forename: Gabriel
authors.initials: G
authors.lastname: Sengo
authors.forename: Kerstin
authors.initials: K
authors.lastname: Wörhoff
authors.forename: Alfred
authors.initials: A
authors.lastname: Driessen
authors.forename: René M
authors.initials: RM
authors.lastname: de Ridder
authors.forename: Markus
authors.initials: M
authors.lastname: Pollnau
mesh_terms: D016477:Artifacts; D017076:Computer-Aided Design; D004867:Equipment Design; D019544:Equipment Failure Analysis; D012031:Refractometry / Q000295:instrumentation*