title: Modeling for accurate dimensional scanning electron microscope metrology: then and now.
abstract: A review of the evolution of modeling for accurate dimensional scanning electron microscopy is presented with an emphasis on developments in the Monte Carlo technique for modeling the generation of the electrons used for imaging and measurement. The progress of modeling for accurate metrology is discussed through a schematic technology timeline. In addition, a discussion of a future vision for accurate SEM dimensional metrology and the requirements to achieve it are presented.
authors.affiliation: Mechanical Metrology Division, National Institute of Standards and Technology, Gaithersburg, Maryland, USA. postek@nist.gov
authors.forename: Michael T
authors.initials: MT
authors.lastname: Postek
authors.forename: András E
authors.initials: AE
authors.lastname: Vladár