title: 2-step plasma-enhanced CVD for low-temperature fabrication of silica membranes with high gas-separation performance.
abstract: Amorphous SiO(2) membranes were prepared via a 2-step plasma-enhanced CVD (PECVD) technique at room temperature on porous TiO(2)/Al(2)O(3) substrates. SiO(2) membranes showed molecular sieving properties with a high separation factor for He/N(2) and He/H(2), and high thermal stability, indicating the successful preparation of high-performance membranes at low temperatures.
authors.affiliation: Department of Chemical Engineering, Hiroshima University, Higashi-Hiroshima 739-8527, Japan. tsuru@hiroshima-u.acjp
authors.forename: Toshinori
authors.initials: T
authors.lastname: Tsuru
authors.forename: Hironobu
authors.initials: H
authors.lastname: Shigemoto
authors.forename: Masakoto
authors.initials: M
authors.lastname: Kanezashi
authors.forename: Tomohisa
authors.initials: T
authors.lastname: Yoshioka