title: In situ x-ray reflectivity studies of dynamics and morphology during heteroepitaxial complex oxide thin film growth.
abstract: We present a method, based on refraction effects in continuous, stratified media, for quantitative analysis of specular x-ray reflectivity from interfaces with atomic-scale roughness. Roughness at interfaces has previously been incorporated into this framework via Fourier transform of a continuous height distribution, but this approach breaks down when roughness approaches the atomic scale and manifests discrete character. By modeling the overall roughness at interfaces as a convolution of discrete and continuous height distributions, we have extended the applicability of this reflectivity model to atomic-scale roughness. The parameterization of thickness and roughness enables quantitative analysis of time-resolved in situ reflectivity studies of thin film growth, modeling step-flow, layer-by-layer and three-dimensional growth within a single framework. We present the application of this model to the analysis of anti-Bragg growth oscillations measured in situ during heteroepitaxial growth of La(0.7)Sr(0.3)MnO(3) on [Formula: see text] SrTiO(3) at different temperatures and pressures, and discuss the evolution of surface morphology.
authors.affiliation: Department of Materials Science and Engineering, Cornell University, Ithaca, NY 14853, USA. Cornell Center for Materials Research, Cornell University, Ithaca, NY 14853, USA.
authors.forename: Darren
authors.initials: D
authors.lastname: Dale
authors.forename: Y
authors.initials: Y
authors.lastname: Suzuki
authors.forename: J D
authors.initials: JD
authors.lastname: Brock