title: Low-loss VIS/IR-XUV beam splitter for high-power applications.
abstract: We present a low-loss VIS/IR-XUV beam splitter, suitable for high-power operation. The spatial separation of the VIS/IR and XUV components of a beam is achieved by the wedged top layer of a dielectric multilayer structure, onto which the beam is impinging under Brewster's angle (for VIS/IR). With a fused silica wedge with an angle of 0.5° we achieve a separation angle of 2.2° and an IR reflectivity of 0.9995. Typical XUV reflectivities amount to 0.1-0.2. The novel element is mechanically robust, exhibiting two major advantages over free-standing Brewster plates: (i) a significant improvement of heat conduction and (ii) easier handling, in particular for high-optical-quality fabrication. The beam splitter could be used as an output coupler for intracavity-generated XUV radiation, promising a boost of the power regime of current MHz-HHG experiments. It is also suited for single-pass experiments and as a beam combiner for pump-probe experiments.
authors.affiliation: Max-Planck-Institut für Quantenoptik, Hans-Kopfermann-Str. 1, 85748 Garching, Germany. ioachim.pupeza@mpq.mpg.de
authors.forename: Ioachim
authors.initials: I
authors.lastname: Pupeza
authors.forename: Ernst E
authors.initials: EE
authors.lastname: Fill
authors.forename: Ferenc
authors.initials: F
authors.lastname: Krausz
mesh_terms: D004867:Equipment Design; D007834:Lasers; D017711:Nonlinear Dynamics; D055095:Optics and Photonics / Q000295:instrumentation*; D012822:Silicon Dioxide / Q000737:chemistry; D013696:Temperature; D014466:Ultraviolet Rays; D014965:X-Rays
chemical_list: D012822:Silicon Dioxide