title: Ordered GeSi nanorings grown on patterned Si (001) substrates.
abstract: An easy approach to fabricate ordered pattern using nanosphere lithography and reactive iron etching technology was demonstrated. Long-range ordered GeSi nanorings with 430 nm period were grown on patterned Si (001) substrates by molecular beam epitaxy. The size and shape of rings were closely associated with the size of capped GeSi quantum dots and the Si capping processes. Statistical analysis on the lateral size distribution shows that the high growth temperature and the long-term annealing can improve the uniformity of nanorings.PACS code1·PACS code2·moreMathematics Subject Classification (2000) MSC code1·MSC code2·more.
authors.affiliation: State Key Laboratory of Surface Physics and Department of Physics, Fudan University, Shanghai 200433, People's Republic of China. tsuijian@gmail.com.
authors.forename: Yingjie
authors.initials: Y
authors.lastname: Ma
authors.forename: Jian
authors.initials: J
authors.lastname: Cui
authors.forename: Yongliang
authors.initials: Y
authors.lastname: Fan
authors.forename: Zhenyang
authors.initials: Z
authors.lastname: Zhong
authors.forename: Zuimin
authors.initials: Z
authors.lastname: Jiang