title: Direct laser writing for active and passive high-Q polymer microdisks on silicon.
abstract: We report the fabrication of high-Q polymeric microdisks on silicon via direct laser writing utilizing two-photon absorption induced polymerization. The quality factors of the passive cavities are above 10(6) in the 1300 nm wavelength region. The flexible three-dimensional (3D) lithography method allows for the fabrication of different cavity thicknesses on the same substrate, useful for rapid prototyping of active and passive optical microcavities. Microdisk lasers are realized by doping the resist with dye, resulting in laser emission at visible wavelengths.
authors.affiliation: Institute of Applied Physics and DFG Center for Functional Nanostructures CFN, Karlsruhe Institute of Technology KIT, Karlsruhe, Germany. tobias.grossmann@kit.edu
authors.forename: Tobias
authors.initials: T
authors.lastname: Grossmann
authors.forename: Simone
authors.initials: S
authors.lastname: Schleede
authors.forename: Mario
authors.initials: M
authors.lastname: Hauser
authors.forename: Torsten
authors.initials: T
authors.lastname: Beck
authors.forename: Michael
authors.initials: M
authors.lastname: Thiel
authors.forename: Georg
authors.initials: G
authors.lastname: von Freymann
authors.forename: Timo
authors.initials: T
authors.lastname: Mappes
authors.forename: Heinz
authors.initials: H
authors.lastname: Kalt