title: Nanoindentation characteristics of clamped freestanding Cu membranes.
abstract: This research employed instrumented nanoindentation to address the issue of bending to stretching-induced deformation of clamped freestanding Cu membranes. The experimental results show that indentation-induced plastic deformation only comes into effect at the centre and the indented edge of the Cu membrane when the indenter is applied, while the other locations remain undamaged. A step-by-step evolution was presumed for the time histories of the bending to stretching-induced deformation and for the timing of the significant change in slope of the load-deflection curve. Deformation was deliberately introduced at the transition from the single-point bending indentation to the surface stretching indentation at the impact location touched with the indenter. Good elastic recovery was found at locations away from the indenter. A similar finding can be arrived at by means of finite element analysis.
authors: Department of Engineering Science, National Cheng Kung University, 1 University Road, Tainan 701, Taiwan. Stress-Reliability Laboratory, Advanced Semiconductor Engineering Incorporated, Kaohsiung 811, Taiwan.
authors: Tong Hong
authors: TH
authors: Wang
authors: Te-Hua
authors: TH
authors: Fang
authors: Shao-Hui
authors: SH
authors: Kang
authors: Yu-Cheng
authors: YC
authors: Lin