title: Color filters including infrared cut-off integrated on CMOS image sensor.
abstract: A color image was taken with a CMOS image sensor without any infrared cut-off filter, using red, green and blue metal/dielectric filters arranged in Bayer pattern with 1.75 µm pixel pitch. The three colors were obtained by a thickness variation of only two layers in the 7-layer stack, with a technological process including four photolithography levels. The thickness of the filter stack was only half of the traditional color resists, potentially enabling a reduction of optical crosstalk for smaller pixels. Both color errors and signal to noise ratio derived from optimized spectral responses are expected to be similar to color resists associated with infrared filter.
authors: CEA, LETI, MINATEC, Grenoble, France. laurent.frey@cea.fr
authors: Laurent
authors: L
authors: Frey
authors: Pascale
authors: P
authors: Parrein
authors: Jacques
authors: J
authors: Raby
authors: Catherine
authors: C
authors: Pellé
authors: Didier
authors: D
authors: Hérault
authors: Michel
authors: M
authors: Marty
authors: Jean
authors: J
authors: Michailos
mesh_terms: D003116:Color; D003124:Colorimetry / Q000295:instrumentation*; D004867:Equipment Design; D019544:Equipment Failure Analysis; D005374:Filtration / Q000295:instrumentation*; D007259:Infrared Rays; D008027:Light; D012666:Semiconductors; D012815:Signal Processing, Computer-Assisted / Q000295:instrumentation*; D018511:Systems Integration; D014159:Transducers