title: Fabrication of ultrahigh-density nanowires by electrochemical nanolithography.
abstract: An approach has been developed to produce silver nanoparticles (AgNPs) rapidly on semiconductor wafers using electrochemical deposition. The closely packed AgNPs have a density of up to 1.4 × 1011 cm-2 with good size uniformity. AgNPs retain their shape and position on the substrate when used as nanomasks for producing ultrahigh-density vertical nanowire arrays with controllable size, making it a one-step nanolithography technique. We demonstrate this method on Si/SiGe multilayer superlattices using electrochemical nanopatterning and plasma etching to obtain high-density Si/SiGe multilayer superlattice nanowires.
authors: University of Wisconsin-Madison, Madison, WI 53706, USA. lagally@engr.wisc.edu.
authors: Feng
authors: F
authors: Chen
authors: Hongquan
authors: H
authors: Jiang
authors: Arnold M
authors: AM
authors: Kiefer
authors: Anna M
authors: AM
authors: Clausen
authors: Yuk-Hong
authors: YH
authors: Ting
authors: Amy E
authors: AE
authors: Wendt
authors: Bingjun
authors: B
authors: Ding
authors: Max G
authors: MG
authors: Lagally