title: Selective and Sequential Re-Assembly of Patterned Block Copolymer Thin Film for Fabricating Polymeric, Inorganic, and Their Composite Nanostructured Arrays.
abstract: We report that the nanostructures of poly(styrene-block-4-vinylpyridine) block copolymer (PS-b-P4VP) thin film on a wafer substrate can be re-assembled by sequential vapor treatment using selected solvents. Metal or other inorganic nanoparticles that were randomly pre-loaded inside or on the surface of PS-b-P4VP thin film could be pulled to the rim of PS and P4VP along with the movements of PS and P4VP blocks during the treatment. As a result, the patterned polymeric or inorganic/polymer composite nanoisland and nanoring arrays were fabricated.
authors: School of Chemical and Biomolecular Engineering, Georgia Institute of Technology, 500 10th Street NW, Atlanta, Georgia 30332-0620, USA.|School of Chemistry and Chemical Engineering, South China University of Technology, Guangzhou 510640, Guangdong, P.R. China.
authors: Xihong
authors: X
authors: Zu
authors: School of Chemical and Biomolecular Engineering, Georgia Institute of Technology, 500 10th Street NW, Atlanta, Georgia 30332-0620, USA.
authors: Jian
authors: J
authors: Gong
authors: School of Chemistry and Chemical Engineering, South China University of Technology, Guangzhou 510640, Guangdong, P.R. China.
authors: Weiping
authors: W
authors: Tu
authors: School of Chemical and Biomolecular Engineering, Georgia Institute of Technology, 500 10th Street NW, Atlanta, Georgia 30332-0620, USA. Yulin.deng@chbe.gatech.edu.
authors: Yulin
authors: Y
authors: Deng
mesh_terms: D008567:Membranes, Artificial; D053768:Metal Nanoparticles / Q000737:chemistry*; D011137:Polystyrenes / Q000737:chemistry*
chemical_list: D008567:Membranes, Artificial; D011137:Polystyrenes