title: Formation of a nanogroove-striped NiO surface using atomic steps.
abstract: A nanogroove-striped pattern was formed on a NiO film surface. The periodic nanopattern was successfully obtained over the entire surface via high-temperature annealing of the epitaxial NiO thin film, which was grown on an atomically stepped sapphire substrate at low temperature. The depth, width and interval of straight nanogrooves were about 3 nm, 35 nm and about 100 nm, respectively. The periodicity of the stripe agrees well with that of the atomic steps of the substrate.
authors: Materials and Structures Laboratory, Tokyo Institute of Technology, 4259-R3-6 Nagatsuta-cho, Midori-ku, Yokohama 226-8503, Japan.
authors: S
authors: S
authors: Akiba
authors: A
authors: A
authors: Matsuda
authors: H
authors: H
authors: Isa
authors: M
authors: M
authors: Kasahara
authors: S
authors: S
authors: Sato
authors: T
authors: T
authors: Watanabe
authors: W
authors: W
authors: Hara
authors: M
authors: M
authors: Yoshimoto