title: Fabrication of silicon dioxide submicron channels without nanolithography for single biomolecule detection.
abstract: We successfully fabricated nanochannel arrays with silicon dioxide (SiO(2)) surfaces for single biomolecule detection. The SiO(2) nanochannel fabrication is based on the combination of anisotropic etching by potassium hydroxide (KOH) solution, local oxidation of silicon (LOCOS) and plasma etching of silicon. This fabrication technique is easily controllable and is a simple and practical solution for low-cost and high-throughput fabrication of nanofluidic channels. Thus, this technique enables the generation of nanochannels with various nanoscale dimensions without using nanolithography.
authors: Institute of Industrial Science, The University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan.
authors: Y H
authors: YH
authors: Cho
authors: S W
authors: SW
authors: Lee
authors: B J
authors: BJ
authors: Kim
authors: T
authors: T
authors: Fujii