title: Molecular lithography through DNA-mediated etching and masking of SiO2.
abstract: We demonstrate a new approach to pattern transfer for bottom-up nanofabrication. We show that DNA promotes/inhibits the etching of SiO(2) at the single-molecule level, resulting in negative/positive tone pattern transfers from DNA to the SiO(2) substrate.
authors.affiliation: Department of Chemistry, University of Pittsburgh, Pittsburgh, Pennsylvania 15260, USA.
authors.forename: Sumedh P
authors.initials: SP
authors.lastname: Surwade
authors.forename: Shichao
authors.initials: S
authors.lastname: Zhao
authors.forename: Haitao
authors.initials: H
authors.lastname: Liu
mesh_terms: D004247:DNA / Q000737:chemistry*; D007700:Kinetics; D049329:Nanostructures / Q000737:chemistry*; D010316:Particle Size; D012822:Silicon Dioxide / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D012822:Silicon Dioxide; D004247:DNA