title: Design of robust binary film onto carbon surface using diazonium electrochemistry.
abstract: The electroreduction of functionalized aryldiazonium salts combined with a protection-deprotection method was evaluated for the fabrication of organized mixed layers covalently bound onto carbon substrates. The first modification consists of the grafting of a protected 4-((triisopropylsilyl)ethynyl)benzene layer onto the carbon surface on which the introduction of a second functional group is possible without altering the first grafted functional group. After deprotection, we obtained an ultrathin robust layer presenting high densities of both active ethynylbenzene groups (available for "click" chemistry) and the second functional group. The strategy was successfully demonstrated using azidomethylferrocene to react with ethynyl moieties in the binary film by "click" chemistry, and NO(2)-phenyl as the second functional group. Two possible modification pathways with different orderings of the various steps were considered to show the influence and importance of the protection-deprotection process on the final surface obtained. Using mild conditions for the grafting of the second layer maintains a concentration of active ethynyl groups similar to that obtained for a one-component monolayer while achieving a high surface concentration of the second modifier. Considering the wide range of functional aryldiazonium salts that could be electrodeposited onto carbon surfaces and the versatility and specificity of the "click" chemistry, this approach appears very promising for the preparation of mixed layers in well-controlled conditions without altering the reactivity of either functional group.
authors.affiliation: Sciences Chimiques de Rennes (Equipe MaCSE), CNRS, UMR 6226, Université de Rennes 1, Campus de Beaulieu, Bat 10C, 35042 Rennes Cedex, France.
authors.forename: Yann R
authors.initials: YR
authors.lastname: Leroux
authors.forename: Fei
authors.initials: F
authors.lastname: Hui
authors.forename: Jean-Marc
authors.initials: JM
authors.lastname: Noël
authors.forename: Clément
authors.initials: C
authors.lastname: Roux
authors.forename: Alison J
authors.initials: AJ
authors.lastname: Downard
authors.forename: Philippe
authors.initials: P
authors.lastname: Hapiot