title: Photolabile protecting groups in metal-organic frameworks: preventing interpenetration and masking functional groups.
abstract: Photolabile groups can be incorporated into metal-organic frameworks (MOFs) and then quantitatively cleaved following MOF formation. Here, a 2-nitrobenzyl ether prevents lattice interpenetration (catenation) in a cubic MOF derived from zinc(II). Subsequent photolysis unmasks a hydroxyl group, and produces an open MOF that cannot be synthesized directly.
authors.affiliation: MacDiarmid Institute for Advanced Materials and Nanotechnology, Institute of Fundamental Sciences, Palmerston North, New Zealand.
authors.forename: Rajesh K
authors.initials: RK
authors.lastname: Deshpande
authors.forename: Geoffrey I N
authors.initials: GI
authors.lastname: Waterhouse
authors.forename: Geoffrey B
authors.initials: GB
authors.lastname: Jameson
authors.forename: Shane G
authors.initials: SG
authors.lastname: Telfer
mesh_terms: D018360:Crystallography, X-Ray; D008958:Models, Molecular; D009578:Nitrobenzenes / Q000737:chemistry*; D009942:Organometallic Compounds / Q000138:chemical synthesis / Q000737:chemistry*; D010647:Phenyl Ethers / Q000737:chemistry*; D015032:Zinc / Q000737:chemistry*
chemical_list: D009578:Nitrobenzenes; D009942:Organometallic Compounds; D010647:Phenyl Ethers; D015032:Zinc