title: Replication of micro-optical elements with continuous relief by ultraviolet embossing with thiol-ene-based resist.
abstract: We propose in this paper to use the delayed gel point character of thiol-ene-based resist to reduce the influence of polymerization shrinkage during the replication of micro-optical elements with continuous relief by UV embossing. Experiment results indicate that this resist can be used to bring down the fabrication error to less than 2% in the vertical direction at a proper thickness of the residual resist, which is far less than that of traditional acrylate-based resist. This resist can also be used to transfer continuous relief into a fused silica substrate through reactive ion etching because of its good etching resistance.
authors.affiliation: Research Center of Ultra-precision Optoelectronic Instrumentation, Harbin Institute of Technology, Harbin 150080, China. P.Jin@hit.edu.cn
authors.forename: Peng
authors.initials: P
authors.lastname: Jin
authors.forename: Nan
authors.initials: N
authors.lastname: Liu
authors.forename: Jie
authors.initials: J
authors.lastname: Lin
authors.forename: Jiubin
authors.initials: J
authors.lastname: Tan
authors.forename: Philip D
authors.initials: PD
authors.lastname: Prewett