title: Simultaneous fabrication of line defects-embedded periodic lattice by topographically assisted holographic lithography.
abstract: We have demonstrated simultaneous fabrication of designed defects within a periodic structure. For rapid fabrication of periodic structures incorporating nanoscale line-defects at large area, topographically assisted holographic lithography (TAHL) technique, combining the strength of hologram lithography and phase-shift interference, was proposed. Hot-embossing method generated the photoresist patterns with vertical side walls which enabled phase-shift mask effect at the edge of patterns. Embossing temperature and relief height were crucial parameters for the successful TAHL process. Periodic holes with a diameter of 600 nm at a 1 μm-pitch incorporating 250 nm wide line-defects were obtained simultaneously.
authors.affiliation: Department of Materials Science and Engineering Gwangju Institute of Science and Technology (GIST), 261 Cheomdan-gwagiro, Buk-gu, Gwangju 500-712, Republic of Korea. gyjung@gist.ac.kr.
authors.forename: Byung-Yeon
authors.initials: BY
authors.lastname: Choi
authors.forename: Yusin
authors.initials: Y
authors.lastname: Pak
authors.forename: Ki Seok
authors.initials: KS
authors.lastname: Kim
authors.forename: Kwang-Ho
authors.initials: KH
authors.lastname: Lee
authors.forename: Gun-Young
authors.initials: GY
authors.lastname: Jung