title: Fabrication of silicon nanowire for detecting p-amyloid (1-42) by nanoimprint lithography.
abstract: Ultraviolet nanoimprint lithography (UV-NIL) is a high volume and cost-effective patterning technique with sub-10 nm resolution. It has great potential as a candidate for next generation lithography. Using UV-NIL, nanowire patterns were successfully fabricated on a four-inch silicon-on-insulator (SOI) wafer under moderate conditions. The fabricated nanowire patterns were characterized by FE-SEM. Its electrical properties were confirmed by semiconductor parameter analysis. Monoclonal antibodies against beta-amyloid (1-42) were immobilized on the silicon nanowire using a chemical linker. Using this fabricated silicon nanowire device, beta-amyloid (1-42) levels of 1 pM to 100 nM were successfully determined from conductance versus time characteristics. Consequently, the nanopatterned SOI nanowire device can be applied to bioplatforms for the detection of proteins.
authors.affiliation: Interdisciplinary Program of Integrated Biotechnology, Sogang University, #1 Shinsu-Dong, Mapo-Gu, Seoul 121-742, Korea.
authors.forename: Dong-Sik
authors.initials: DS
authors.lastname: Choi
authors.forename: Jin-Ho
authors.initials: JH
authors.lastname: Lee
authors.forename: Hee-Soo
authors.initials: HS
authors.lastname: Jung
authors.forename: Gun-Young
authors.initials: GY
authors.lastname: Jung
authors.forename: Jae-Hak
authors.initials: JH
authors.lastname: Choi
authors.forename: Jeong-Woo
authors.initials: JW
authors.lastname: Choi
authors.forename: Byung-Keun
authors.initials: BK
authors.lastname: Oh
mesh_terms: D016229:Amyloid beta-Peptides / Q000737:chemistry*; D008855:Microscopy, Electron, Scanning; D053770:Nanowires; D010446:Peptide Fragments / Q000737:chemistry*; D012666:Semiconductors; D012825:Silicon / Q000737:chemistry*
chemical_list: D016229:Amyloid beta-Peptides; D010446:Peptide Fragments; C075222:amyloid beta-protein (1-42); D012825:Silicon