title: 3D finite element analysis of changes in stress levels and distributions for an osseointegrated implant after vertical bone loss.
abstract: OBJECTIVE
  The effect of stress levels and distributions around the internal nonsubmerged type implants after vertical bone resorption was investigated in this study.
  
  
  METHODS
  An HSII implant was placed in 4 cylindrical alveolar bone models with differing degrees of thread exposures. The load applied to each implant was von Mises stress and principal stress, 250 N in axial direction and 30 degrees lateral pressure. The difference in the load between the bone and the connective portion of the implant was obtained using ANSYS analysis.
  
  
  RESULTS
  Bone loss in the cervical area of the implant was more obvious under lateral pressure. When more threads were exposed, bone level decreased and the maximum load applied on the fixture increased.
  
  
  CONCLUSIONS
  It was concluded that higher bone level has a biomechanical advantage with respect to stress concentration.
authors.affiliation: Department of Oral and Maxillofacial Surgery, School of Dentistry, Chosun University, DongGu, Gwangju, Republic of Korea.
authors.forename: Kyung-Ho
authors.initials: KH
authors.lastname: Yoon
authors.forename: Su-Gwan
authors.initials: SG
authors.lastname: Kim
authors.forename: Jeong-Hoon
authors.initials: JH
authors.lastname: Lee
authors.forename: Seung-Woo
authors.initials: SW
authors.lastname: Suh
mesh_terms: D016301:Alveolar Bone Loss / Q000503:physiopathology*; D000539:Alveolar Process / Q000503:physiopathology; D001696:Biomechanical Phenomena; D001732:Bite Force; D003198:Computer Simulation; D003442:Crowns; D000044:Dental Abutments; D001840:Dental Bonding; D059605:Dental Implant-Abutment Design; D015921:Dental Implants; D055119:Elastic Modulus; D020342:Finite Element Analysis; D006801:Humans; D021621:Imaging, Three-Dimensional / Q000379:methods*; D008953:Models, Anatomic; D008954:Models, Biological; D016348:Osseointegration / Q000502:physiology*; D013314:Stress, Mechanical
chemical_list: D015921:Dental Implants