title: Nanoimprint lithography patterns with a vertically aligned nanoscale tubular carbon structure.
abstract: A nanoscale tubular carbon structure array was demonstrated as a mold for nanoimprint lithography (NIL), in which a vertically formed and hexagonally aligned nanoscale tubular carbon array was fabricated through carbon growth inside an anodic aluminum oxide (AAO) nanotemplate, followed by controlled chemical etching of the AAO layer. High density (over 10(10) cm(-2)) of the nanoscale carbon pillars with their controlled diameters and protruded lengths was inversely replicated onto a UV-curable resist for the first time using the imprinting lithography technique.
authors.affiliation: Department of Materials Science and Engineering and Program for Integrated Molecular Systems (PIMS), Gwangju Institute of Science and Technology (GIST), 261 Cheomdan-gwagiro, Buk-gu, Gwangju 500-712, Korea.
authors.forename: Youn-Su
authors.initials: YS
authors.lastname: Kim
authors.forename: Kyeongmi
authors.initials: K
authors.lastname: Lee
authors.forename: Jae Suk
authors.initials: JS
authors.lastname: Lee
authors.forename: Gun Young
authors.initials: GY
authors.lastname: Jung
authors.forename: Won
authors.initials: W
authors.lastname: Bae Kim