title: Positive ion chemistry of SiH4/GeF4 gaseous mixtures studied by ion trap mass spectrometry and ab initio calculations.
abstract: The positive ion chemistry occurring in SiH(4)/GeF(4) gaseous mixtures was investigated by ion trap mass spectrometry and ab initio theoretical calculations. The GeF(3)(+) cation, the only fragment obtained from ionized GeF(4), was unreactive towards SiH(4). All the primary ions SiH(n)(+) (n = 0-3) react instead with GeF(4) so to form SiF(+) or SiH(2)F(+). The latter species reacts in turn with SiH(4) and GeF(4) so to form SiH(3)(+) and SiHF(2)(+), respectively. The potential energy profiles conceivably involved in these reactions were investigated by ab initio calculations performed at the MP2 and coupled cluster (CCSD(T)) level of theory.
authors.affiliation: Dipartimento di Chimica Generale e Chimica Organica, Università di Torino, C.so M. D' Azeglio, 48, 10125 Torino, Italy.
authors.forename: Lorenzo
authors.initials: L
authors.lastname: Operti
authors.forename: Roberto
authors.initials: R
authors.lastname: Rabezzana
authors.forename: Francesca
authors.initials: F
authors.lastname: Turco
authors.forename: Stefano
authors.initials: S
authors.lastname: Borocci
authors.forename: Maria
authors.initials: M
authors.lastname: Giordani
authors.forename: Felice
authors.initials: F
authors.lastname: Grandinetti