title: Potential-induced copper periodic micro-/nanostructures by electrodeposition on silicon substrate.
abstract: We demonstrate the fabrication of large scale nano- and micropatterned copper periodic structures on a silicon substrate without imposed templates. In the electrodeposition process, we employ a periodic variation voltage in an ultrathin layer of concentrated CuSO(4) electrolyte. The pattern can be controlled by varying the frequency of the applied potential. We suggest that the observed periodic micro-/nanostructures are caused by the lag of the migrating ion concentration profile versus the applied voltage profile near the tip of the growth.
authors.affiliation: National Laboratory of Superhard Materials and Institute of Atomic and Molecular Physics, Jilin University, Changchun 130012, People's Republic of China.
authors.forename: Zhaocun
authors.initials: Z
authors.lastname: Zong
authors.forename: Hai
authors.initials: H
authors.lastname: Yu
authors.forename: Lianping
authors.initials: L
authors.lastname: Nui
authors.forename: Mingzhe
authors.initials: M
authors.lastname: Zhang
authors.forename: Chen
authors.initials: C
authors.lastname: Wang
authors.forename: Wei
authors.initials: W
authors.lastname: Li
authors.forename: Yongfan
authors.initials: Y
authors.lastname: Men
authors.forename: Binbin
authors.initials: B
authors.lastname: Yao
authors.forename: Guangtian
authors.initials: G
authors.lastname: Zou