title: High speed fabrication of aluminum nanostructures with 10 nm spatial resolution by electrochemical replication.
abstract: A high fidelity electrochemical replication technique for the rapid fabrication of Al nanostructures with 10 nm lateral resolution has been successfully demonstrated. Aluminum is electrodeposited onto a lithographically patterned Si master using a non-aqueous organic hydride bath of aluminum chloride and lithium aluminum hydride at room temperature. Chemical pretreatment of the Si surface allows a clean detachment of the replicated Al foil from the master, permitting its repetitive use for mass replication. This high throughput technique opens up new possibilities in the fabrication of Al-related nanostructures, including the growth of long range ordered anodic alumina nanochannel arrays.
authors.affiliation: Taiwan International Graduate Program, Department of Chemistry, National Tsing-Hua University, Hsinchu, Taiwan. Institute of Atomic and Molecular Sciences, Academia Sinica, PO Box 23-166, Taipei 10617, Taiwan.
authors.forename: Sajal
authors.initials: S
authors.lastname: Biring
authors.forename: Kun-Tong
authors.initials: KT
authors.lastname: Tsai
authors.forename: Ujjal Kumar
authors.initials: UK
authors.lastname: Sur
authors.forename: Yuh-Lin
authors.initials: YL
authors.lastname: Wang