title: Joule-assisted silicidation for short-channel silicon nanowire devices.
abstract: We report on a technique enabling electrical control of the contact silicidation process in silicon nanowire devices. Undoped silicon nanowires were contacted by pairs of nickel electrodes, and each contact was selectively silicided by means of the Joule effect. By a real-time monitoring of the nanowire electrical resistance during the contact silicidation process we were able to fabricate nickel-silicide/silicon/nickel-silicide devices with controlled silicon channel length down to 8 nm.
authors.affiliation: SPSMS/LaTEQS, CEA-INAC/UJF-Grenoble 1, 17 Rue des Martyrs, 38054 Grenoble Cedex 9, France.
authors.forename: Massimo
authors.initials: M
authors.lastname: Mongillo
authors.forename: Panayotis
authors.initials: P
authors.lastname: Spathis
authors.forename: Georgios
authors.initials: G
authors.lastname: Katsaros
authors.forename: Pascal
authors.initials: P
authors.lastname: Gentile
authors.forename: Marc
authors.initials: M
authors.lastname: Sanquer
authors.forename: Silvano
authors.initials: S
authors.lastname: De Franceschi