title: Full-field hard x-ray microscopy below 30 nm: a challenging nanofabrication achievement.
abstract: The fabrication of devices to focus hard x-rays is one of the most difficult-and important-challenges in nanotechnology. Here we show that Fresnel zone plates combining 30 nm external zones and a high aspect ratio finally bring hard x-ray microscopy beyond the 30 nm Rayleigh spatial resolution level and measurable spatial frequencies down to 20-23 nm feature size. After presenting the overall nanofabrication process and the characterization test results, we discuss the potential research impact of these resolution levels.
authors.affiliation: Institute of Physics, Academia Sinica, Taipei 115, Taiwan. Department of Materials Engineering, Tatung University, Taipei 104, Taiwan.
authors.forename: Yu-Tung
authors.initials: YT
authors.lastname: Chen
authors.forename: Tsung-Nan
authors.initials: TN
authors.lastname: Lo
authors.forename: Yong S
authors.initials: YS
authors.lastname: Chu
authors.forename: Jaemock
authors.initials: J
authors.lastname: Yi
authors.forename: Chi-Jen
authors.initials: CJ
authors.lastname: Liu
authors.forename: Jun-Yue
authors.initials: JY
authors.lastname: Wang
authors.forename: Cheng-Liang
authors.initials: CL
authors.lastname: Wang
authors.forename: Chen-Wei
authors.initials: CW
authors.lastname: Chiu
authors.forename: Tzu-En
authors.initials: TE
authors.lastname: Hua
authors.forename: Yeukuang
authors.initials: Y
authors.lastname: Hwu
authors.forename: Qun
authors.initials: Q
authors.lastname: Shen
authors.forename: Gung-Chian
authors.initials: GC
authors.lastname: Yin
authors.forename: Keng S
authors.initials: KS
authors.lastname: Liang
authors.forename: Hong-Ming
authors.initials: HM
authors.lastname: Lin
authors.forename: Jung Ho
authors.initials: JH
authors.lastname: Je
authors.forename: Giorgio
authors.initials: G
authors.lastname: Margaritondo