title: Tunable, high aspect ratio pillars on diverse substrates using copolymer micelle lithography: an interesting platform for applications.
abstract: We demonstrate the use of copolymer micelle lithography using polystyrene-block-poly(2-vinylpyridine) reverse micelle thin films in their as-coated form to create nanopillars with tunable dimensions and spacing, on different substrates such as silicon, silicon oxide, silicon nitride and quartz. The promise of the approach as a versatile application oriented platform is highlighted by demonstrating its utility for creating super-hydrophobic surfaces, fabrication of nanoporous polymeric membranes, and controlling the areal density of physical vapor deposition derived titanium nitride nanostructures.
authors.affiliation: Centre Suisse d'Electronique et de Microtechnique SA, Jaquet Droz 1, CH-2007 Neuchâtel, Switzerland.
authors.forename: S
authors.initials: S
authors.lastname: Krishnamoorthy
authors.forename: Y
authors.initials: Y
authors.lastname: Gerbig
authors.forename: C
authors.initials: C
authors.lastname: Hibert
authors.forename: R
authors.initials: R
authors.lastname: Pugin
authors.forename: C
authors.initials: C
authors.lastname: Hinderling
authors.forename: J
authors.initials: J
authors.lastname: Brugger
authors.forename: H
authors.initials: H
authors.lastname: Heinzelmann