title: The fabrication of a flexible mold for high resolution soft ultraviolet nanoimprint lithography.
abstract: One key issue for all nanoimprint techniques is an appropriate method for the fabrication of desirable molds. We report on a novel flexible mold fabrication process-pressure-assisted molding (PAM)-for high resolution soft ultraviolet nanoimprint lithography (soft UV-NIL). In PAM, enhanced master filling is achieved by applying an external pressure during the mold fabrication process. Flexible molds, fabricated with PAM using different pressures in the range of 10-90 kPa, are compared to determine the role of pressures applied in the imprint performance.
authors.affiliation: Advanced Microelectronic Center Aachen (AMICA)/AMO GmbH, Otto-Blumenthal-Strasse 25, Aachen, Germany.
authors.forename: Namil
authors.initials: N
authors.lastname: Koo
authors.forename: Ulrich
authors.initials: U
authors.lastname: Plachetka
authors.forename: Martin
authors.initials: M
authors.lastname: Otto
authors.forename: Jens
authors.initials: J
authors.lastname: Bolten
authors.forename: Jun-Ho
authors.initials: JH
authors.lastname: Jeong
authors.forename: Eung-Sug
authors.initials: ES
authors.lastname: Lee
authors.forename: Heinrich
authors.initials: H
authors.lastname: Kurz