title: Modeling of three-dimensional photoresist profiles exposed by localized fields of high-transmission nano-apertures.
abstract: Using a simple theoretical model, we calculate three-dimensional profiles of photoresist exposed by arbitrarily shaped localized fields of high-transmission metal nano-apertures. We apply the finite difference time domain (FDTD) method to obtain the localized field distributions, which are generated by excitation of localized surface plasmon polaritons underneath a C-shaped or a bow-tie-shaped aperture. Incorporating the results of FDTD simulations with the theoretical model, we visualize three-dimensional exposure profiles of the photoresist as a function of the exposure dose and the gap distance between the aperture and the photoresist. It is found that the three-dimensional exposure profiles provide useful information for choosing process parameters for nanopatterning by plasmonic lithography using the aperture.
authors.affiliation: Nano Photonics Laboratory, School of Mechanical Engineering, Yonsei University, 134 Sinchon-dong, Seodaemun-gu, Seoul 120-749, Republic of Korea.
authors.forename: Eungman
authors.initials: E
authors.lastname: Lee
authors.forename: Jae Won
authors.initials: JW
authors.lastname: Hahn