title: Durable diamond-like carbon templates for UV nanoimprint lithography.
abstract: The interaction between resist and template during the separation process after nanoimprint lithography (NIL) can cause the formation of defects and damage to the templates and resist patterns. To alleviate these problems, fluorinated self-assembled monolayers (F-SAMs, i.e. tridecafluoro-1,1,2,2,tetrahydrooctyl trichlorosilane or FDTS) have been employed as template release coatings. However, we find that the FDTS coating undergoes irreversible degradation after only 10 cycles of UV nanoimprint processes with SU-8 resist. The degradation includes a 28% reduction in surface F atoms and significant increases in the surface roughness. In this paper, diamond-like carbon (DLC) films were investigated as an alternative material not only for coating but also for direct fabrication of nanoimprint templates. DLC films deposited on quartz templates in a plasma enhanced chemical vapor deposition system are shown to have better chemical and physical stability than FDTS. After the same 10 cycles of UV nanoimprints, the surface composition as well as the roughness of DLC films were found to be unchanged. The adhesion energy between the DLC surface and SU-8 is found to be smaller than that of FDTS despite the slightly higher total surface energy of DLC. DLC templates with 40 nm features were fabricated using e-beam lithography followed by Cr lift-off and reactive ion etching. UV nanoimprinting using the directly patterned DLC templates in SU-8 resist demonstrates good pattern transfer fidelity and easy template-resist separation. These results indicate that DLC is a promising material for fabricating durable templates for UV nanoimprint lithography.
authors.affiliation: Department of Electrical Engineering, University of Texas at Dallas, Richardson, TX 75083, USA.
authors.forename: L
authors.initials: L
authors.lastname: Tao
authors.forename: S
authors.initials: S
authors.lastname: Ramachandran
authors.forename: C T
authors.initials: CT
authors.lastname: Nelson
authors.forename: M
authors.initials: M
authors.lastname: Lin
authors.forename: L J
authors.initials: LJ
authors.lastname: Overzet
authors.forename: M
authors.initials: M
authors.lastname: Goeckner
authors.forename: G
authors.initials: G
authors.lastname: Lee
authors.forename: C G
authors.initials: CG
authors.lastname: Willson
authors.forename: W
authors.initials: W
authors.lastname: Wu
authors.forename: W
authors.initials: W
authors.lastname: Hu