title: A comparative study of CCl(4) reactions on Ag and Si surfaces by in situ ultraviolet photoemission electron microscopy.
abstract: The reactivity of a bulk Ag surface, an Ag monolayer film on Si(111)- 7 × 7 (denoted as the [Formula: see text]-Ag-Si surface), and Si(111)-7 × 7 to CCl(4) was investigated by x-ray photoelectron spectroscopy (XPS) and ultraviolet photoemission electron microscopy (UV-PEEM). In situ UV-PEEM was used to monitor simultaneously the CCl(4) dissociation on different surface domains, including the bulk Ag, [Formula: see text]-Ag-Si, and Si(111). The PEEM results combined with XPS data show that CCl(4) adsorbs dissociatively on bulk Ag(111) and Si(111) but adsorbs molecularly on the [Formula: see text]-Ag-Si surface, and the surface reactivity follows the order of [Formula: see text]-Ag-Si.
authors.affiliation: State Key Laboratory of Catalysis, Dalian Institute of Chemical Physics, The Chinese Academy of Sciences, Dalian 116023, People's Republic of China.
authors.forename: Yunxi
authors.initials: Y
authors.lastname: Yao
authors.forename: Qiang
authors.initials: Q
authors.lastname: Fu
authors.forename: Dali
authors.initials: D
authors.lastname: Tan
authors.forename: Xinhe
authors.initials: X
authors.lastname: Bao