title: Nanopatterning of plasma polymer reactive surfaces by DUV interferometry.
abstract: A new method is described for producing patterned solid surfaces with reactive groups. This entails pulsed plasma deposition of anhydride functionalized films, followed by the covalent attachment of an amine-terminated nucleophile via aminolysis reaction. Characterization of the surface chemistry was achieved by XPS, PM-IRRAS and contact angle measurement. Patterning was achieved by DUV irradiation using an ArF excimer laser and an interferometric set-up. Well-defined patterns have been obtained at different scales on a large surface area and using this unique procedure. Spectroscopic characterizations coupled with AFM measurements allow explanation to some measure of the photoinduced phenomena. Trenches with a width ranging from 75 to 500 nm and a depth up to 30 nm were written. Using this approach it is possible to create combinatorial patterned surfaces with well-controlled topography and chemistry.
authors.affiliation: Département de Photochimie Générale, Université de Haute-Alsace, CNRS-UMR 7525, 34 rue Marc Seguin, F-68058 Mulhouse Cedex, France.
authors.forename: Olivier
authors.initials: O
authors.lastname: Soppera
authors.forename: Ali
authors.initials: A
authors.lastname: Dirani
authors.forename: Arnaud
authors.initials: A
authors.lastname: Ponche
authors.forename: Vincent
authors.initials: V
authors.lastname: Roucoules