title: Patterning sub-10 nm line patterns from a block copolymer hybrid.
abstract: We report the formation and directed self-assembly of sub-10 nm half-pitch line patterns from lamellar microdomains of a block copolymer hybrid. The hybrid, which is a mixture of poly(styrene-b-ethylene oxide) (PS-b-PEO) and a low molecular weight organosilicate (OS), shows strong segregation between two phases (i.e. PS and PEO+OS) and forms lamellar microdomains of down to approximately 7 nm in half-pitch. Patterns applicable to multifinger device layouts are created by self-assembling the hybrid on topographic pre-patterns with a chemically non-selective surface. With careful design of the guiding topographic pattern geometry, well-controlled lateral placement including bent structures of lamellar microdomains can be obtained by this approach.
authors.affiliation: IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120, USA.
authors.forename: Sang-Min
authors.initials: SM
authors.lastname: Park
authors.forename: Oun-Ho
authors.initials: OH
authors.lastname: Park
authors.forename: Joy Y
authors.initials: JY
authors.lastname: Cheng
authors.forename: Charles T
authors.initials: CT
authors.lastname: Rettner
authors.forename: Ho-Cheol
authors.initials: HC
authors.lastname: Kim