title: Patterning functional materials using channel diffused plasma-etched self-assembled monolayer templates.
abstract: A simple and cost-effective methodology for large-area micrometer-scale patterning of a wide range of metallic and oxidic functional materials is presented. Self-assembled monolayers (SAM) of alkyl thiols on Au were micropatterned by channel-diffused oxygen plasma etching, a method in which selected areas of SAM were protected from plasma oxidation via a soft lithographic stamp. The patterned SAMs were used as templates for site-selective electrodeposition, electroless deposition and solution-phase deposition of functional materials such as ZnO, Ni, Ag thin films, and ZnO nanowires. The patterned SAMs and functional materials were characterized by scanning electron microscopy (SEM), X-ray diffraction (XRD), atomic force microscopy (AFM), and tunneling AFM (TUNA).
authors.affiliation: Inorganic Materials Science Group, MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands.
authors.forename: Antony
authors.initials: A
authors.lastname: George
authors.forename: A Wouter
authors.initials: AW
authors.lastname: Maijenburg
authors.forename: Michiel G
authors.initials: MG
authors.lastname: Maas
authors.forename: Dave H A
authors.initials: DH
authors.lastname: Blank
authors.forename: Johan E
authors.initials: JE
authors.lastname: ten Elshof