title: Multilayer thin-film inspection through measurements of reflection coefficients.
abstract: A vibration-insensitive interferometer is described to measure the thickness, refraction index and surface profile of thin-film stack at normal incidence. By satisfying the continuous boundary conditions of electric and magnetic fields at interfaces in a multilayer film stack, the reflection coefficient phase of the thin-film stack can be distinguished from the phase of spatial path difference, thus thickness and refraction index can be extracted. The experiment results showed that the measurement precision is significantly increased after the phase analysis was added into the reflectance analysis.
authors.affiliation: Department of Optics and Photonics/Thin Film Technology Center, National Central University, Chung-Li, 32001, Taiwan.
authors.forename: Kai
authors.initials: K
authors.lastname: Wu
authors.forename: Cheng-Chung
authors.initials: CC
authors.lastname: Lee
authors.forename: Neal J
authors.initials: NJ
authors.lastname: Brock
authors.forename: Brad
authors.initials: B
authors.lastname: Kimbrough