title: Study of the adsorption reactions of thiophene on Cu(I)/HY-Al2O3 by Fourier transform infrared and temperature-programmed desorption: adsorption, desorption, and sorbent regeneration mechanisms.
abstract: This work mainly involved the investigation of the adsorption of thiophene on Cu(I)-supported HY-Al(2)O(3). It demonstrated a high sulfur capacity of 10 mg sulfur/g sorbent when the HY/Al(2)O(3) mass ratio was 3, loaded with 12% copper, calcined at 550 °C, and tested at ambient temperature. In situ Fourier transform infrared (FTIR) and temperature-programmed desorption (TPD) results indicated that the adsorption mechanisms on Cu(I)/HY-Al(2)O(3) primarily were π-complexation and sulfur-adsorbent (S-M; σ) bonds. Pyridine-FTIR showed the total weak Lewis acid contribution to the Cu(I)/HY-Al(2)O(3) adsorption desulfurization performance.
authors.affiliation: The State Key Laboratory of Chemical Engineering, East China University of Science and Technology, Shanghai 200237, People's Republic of China.
authors.forename: Xiao-Lin
authors.initials: XL
authors.lastname: Tang
authors.forename: Li
authors.initials: L
authors.lastname: Shi
mesh_terms: D000327:Adsorption; D000537:Aluminum Oxide / Q000737:chemistry*; D003300:Copper / Q000737:chemistry*; D017550:Spectroscopy, Fourier Transform Infrared; D013499:Surface Properties; D013696:Temperature; D013876:Thiophenes / Q000737:chemistry*; D013997:Time Factors; D017641:Zeolites / Q000737:chemistry*
chemical_list: D013876:Thiophenes; D017641:Zeolites; D003300:Copper; D000537:Aluminum Oxide