title: Fabrication and characterization of bit-patterned media beyond 1.5 Tbit/in2.
abstract: We fabricated bit-patterned media (BPM) at densities as high as 3.3 Tbit/in(2) using a process consisting of high-resolution electron-beam lithography followed directly by magnetic film deposition. By avoiding pattern transfer processes such as etching and liftoff that inherently reduce pattern fidelity, the resolution of the final pattern was kept close to that of the lithographic step. Magnetic force microscopy (MFM) showed magnetic isolation of the patterned bits at 1.9 Tbit/in(2), which was close to the resolution limit of the MFM. The method presented will enable studies on magnetic bits packed at ultra-high densities, and can be combined with other scalable patterning methods such as templated self-assembly and nanoimprint lithography for high-volume manufacturing.
authors.affiliation: Institute of Materials Research and Engineering, A*STAR, Singapore. yangkwj@imre.a-star.edu.sg
authors.forename: Joel K W
authors.initials: JK
authors.lastname: Yang
authors.forename: Yunjie
authors.initials: Y
authors.lastname: Chen
authors.forename: Tianli
authors.initials: T
authors.lastname: Huang
authors.forename: Huigao
authors.initials: H
authors.lastname: Duan
authors.forename: Naganivetha
authors.initials: N
authors.lastname: Thiyagarajah
authors.forename: Hui Kim
authors.initials: HK
authors.lastname: Hui
authors.forename: Siang Huei
authors.initials: SH
authors.lastname: Leong
authors.forename: Vivian
authors.initials: V
authors.lastname: Ng