title: Self-organized poly(n-octadecylsilsesquioxane) films via sol-gel photopolymerization.
abstract: We describe a novel solvent- and water-free sol-gel process for n-octadecyltriclorosilane (C(18)H(37)SiCl(3)) film catalyzed by photogenerated Brönsted acids. Driven by hydrophobic van der Waals interactions, a photoinduced self-assembly process occurs to afford a long-range ordered lamellar mesostructure, characterized by X-ray diffraction and transmission electron microscopy. Real-time Fourier transform IR spectroscopy was instrumental to probe the fast hydrolysis kinetics and assess the change of conformational behavior of the alkyl chains during UV irradiation. A unique combination of different solid-state NMR techniques ((29)Si, (13)C, (1)H) provided an insight into the supramolecular organization of this hybrid film.
authors: Laboratory of Photochemistry and Macromolecular Engineering, CNRS, ENSCMu, LRC 7228, University of Haute-Alsace, 3 rue Alfred Werner 68093 Mulhouse Cedex, France. Abraham.chemtob@uha.fr
authors: Abraham
authors: A
authors: Chemtob
authors: Lingli
authors: L
authors: Ni
authors: Céline
authors: C
authors: Croutxé-Barghorn
authors: Aude
authors: A
authors: Demarest
authors: Jocelyne
authors: J
authors: Brendlé
authors: Loïc
authors: L
authors: Vidal
authors: Séverinne
authors: S
authors: Rigolet