title: In situ characterization of alloy catalysts for low-temperature graphene growth.
abstract: Low-temperature (∼450 °C), scalable chemical vapor deposition of predominantly monolayer (74%) graphene films with an average D/G peak ratio of 0.24 and domain sizes in excess of 220 μm(2) is demonstrated via the design of alloy catalysts. The admixture of Au to polycrystalline Ni allows a controlled decrease in graphene nucleation density, highlighting the role of step edges. In situ, time-, and depth-resolved X-ray photoelectron spectroscopy and X-ray diffraction reveal the role of subsurface C species and allow a coherent model for graphene formation to be devised.
authors: Department of Engineering, University of Cambridge , Cambridge CB3 0FA, UK.
authors: Robert S
authors: RS
authors: Weatherup
authors: Bernhard C
authors: BC
authors: Bayer
authors: Raoul
authors: R
authors: Blume
authors: Caterina
authors: C
authors: Ducati
authors: Carsten
authors: C
authors: Baehtz
authors: Robert
authors: R
authors: Schlögl
authors: Stephan
authors: S
authors: Hofmann