title: Note: Continuous synthesis of uniform vertical graphene on cylindrical surfaces.
abstract: This note describes a new reactor design for continuous synthesis of vertically oriented graphene (VG) sheets on cylindrical wire substrates using an atmospheric plasma-enhanced chemical vapor deposition (PECVD) system. Through combining a U-shaped reactor design with "dynamic mode" synthesis featuring simultaneous rotational and axial movements of the metallic wire substrate, the new setup can enable continuous synthesis of VG sheets on the wire surface with remarkable uniformity in both circumferential and axial directions. In contrast, synthesis of VG at "static mode" with a fixed substrate can only lead to non-uniform growth of VG sheets on the wire surface. Potential applications of the resulting uniform-VG-coated metallic wire could include field emitters, field-ionization-based neutral atom detectors, and indoor corona discharges.
authors: Department of Mechanical Engineering, University of Wisconsin-Milwaukee, Milwaukee, Wisconsin 53211, USA.
authors: Zheng
authors: Z
authors: Bo
authors: Shumao
authors: S
authors: Cui
authors: Kehan
authors: K
authors: Yu
authors: Ganhua
authors: G
authors: Lu
authors: Shun
authors: S
authors: Mao
authors: Junhong
authors: J
authors: Chen