title: Time-resolved investigation of nanometer scale deformations induced by a high flux x-ray beam.
abstract: We present results of a time-resolved pump-probe experiment where a Si sample was exposed to an intense 15 keV beam and its surface monitored by measuring the wavefront deformation of a reflected optical laser probe beam. By reconstructing and back propagating the wavefront, the deformed surface can be retrieved for each time step. The dynamics of the heat bump, build-up and relaxation, is followed with a spatial resolution in the nanometer range. The results are interpreted taking into account results of finite element method simulations. Due to its robustness and simplicity this method should find further developments at new x-ray light sources (FEL) or be used to gain understanding on thermo-dynamical behavior of highly excited materials.
authors.affiliation: European XFEL, Albert-Einstein-Ring 19, D-22761 Hamburg, Germany. jerome.gaudin@xfel.eu
authors.forename: J
authors.initials: J
authors.lastname: Gaudin
authors.forename: B
authors.initials: B
authors.lastname: Keitel
authors.forename: A
authors.initials: A
authors.lastname: Jurgilaitis
authors.forename: R
authors.initials: R
authors.lastname: Nüske
authors.forename: L
authors.initials: L
authors.lastname: Guérin
authors.forename: J
authors.initials: J
authors.lastname: Larsson
authors.forename: K
authors.initials: K
authors.lastname: Mann
authors.forename: B
authors.initials: B
authors.lastname: Schäfer
authors.forename: K
authors.initials: K
authors.lastname: Tiedtke
authors.forename: A
authors.initials: A
authors.lastname: Trapp
authors.forename: Th
authors.initials: T
authors.lastname: Tschentscher
authors.forename: F
authors.initials: F
authors.lastname: Yang
authors.forename: M
authors.initials: M
authors.lastname: Wulff
authors.forename: H
authors.initials: H
authors.lastname: Sinn
authors.forename: B
authors.initials: B
authors.lastname: Flöter
mesh_terms: D002138:Calibration; D003198:Computer Simulation; D004583:Electrons; D004867:Equipment Design; D020342:Finite Element Analysis; D007834:Lasers; D008422:Materials Testing; D015233:Models, Statistical; D036103:Nanotechnology / Q000379:methods*; D055095:Optics and Photonics; D012825:Silicon / Q000737:chemistry; D017356:Synchrotrons; D013816:Thermodynamics; D014965:X-Rays
chemical_list: D012825:Silicon