title: Optimization of pH sensing using silicon nanowire field effect transistors with HfO2 as the sensing surface.
abstract: Silicon nanowire field effect transistor sensors with SiO(2)/HfO(2) as the gate dielectric sensing surface are fabricated using a top down approach. These sensors are optimized for pH sensing with two key characteristics. First, the pH sensitivity is shown to be independent of buffer concentration. Second, the observed pH sensitivity is enhanced and is equal to the Nernst maximum sensitivity limit of 59 mV/pH with a corresponding subthreshold drain current change of ∼ 650%/pH. These two enhanced pH sensing characteristics are attributed to the use of HfO(2) as the sensing surface and an optimized fabrication process compatible with silicon processing technology.
authors.affiliation: IBM T J Watson Research Center, Yorktown Heights, NY 10598, USA.
authors.forename: Sufi
authors.initials: S
authors.lastname: Zafar
authors.forename: Christopher
authors.initials: C
authors.lastname: D'Emic
authors.forename: Ali
authors.initials: A
authors.lastname: Afzali
authors.forename: Benjamin
authors.initials: B
authors.lastname: Fletcher
authors.forename: Y
authors.initials: Y
authors.lastname: Zhu
authors.forename: Tak
authors.initials: T
authors.lastname: Ning