title: X-ray photoelectron spectroscopy depth profiling of La2O3/Si thin films deposited by reactive magnetron sputtering.
abstract: The La(2)O(3)/Si thin films have been deposited by reactive DC magnetron sputtering. Amorphous state of La(2)O(3) layer has been shown by RHEED observation. Top surface chemistry of the a-La(2)O(3) has been evaluated with layer-by-layer depth profiling by ion bombardment and XPS measurements. It was found by core level spectroscopy that the top surface of the a-La(2)O(3) film consists of hydrocarbon admixture, lanthanum carbonate, and hydroxides that formed as a result of contact with air atmosphere. Thickness of this top surface modified layer is below 1 nm for a contact time of ~1.5 h with air at normal conditions.
authors.affiliation: Department of Mechanical Engineering, University of Texas at El Paso, El Paso, Texas 79968, USA.
authors.forename: C V
authors.initials: CV
authors.lastname: Ramana
authors.forename: R S
authors.initials: RS
authors.lastname: Vemuri
authors.forename: V V
authors.initials: VV
authors.lastname: Kaichev
authors.forename: V A
authors.initials: VA
authors.lastname: Kochubey
authors.forename: A A
authors.initials: AA
authors.lastname: Saraev
authors.forename: V V
authors.initials: VV
authors.lastname: Atuchin