title: Pixelated source mask optimization for process robustness in optical lithography.
abstract: Optical lithography has enabled the printing of progressively smaller circuit patterns over the years. However, as the feature size shrinks, the lithographic process variation becomes more pronounced. Source-mask optimization (SMO) is a current technology allowing a co-design of the source and the mask for higher resolution imaging. In this paper, we develop a pixelated SMO using inverse imaging, and incorporate the statistical variations explicitly in an optimization framework. Simulation results demonstrate its efficacy in process robustness enhancement.
authors: Imaging Systems Laboratory, Department of Electrical and Electronic Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong.
authors: Ningning
authors: N
authors: Jia
authors: Edmund Y
authors: EY
authors: Lam
mesh_terms: D000465:Algorithms; D003198:Computer Simulation; D008029:Lighting / Q000379:methods*; D008420:Manufactured Materials; D008962:Models, Theoretical; D055095:Optics and Photonics / Q000379:methods*; D010781:Photography; D011327:Printing