title: Ru cyclooctatetraene precursors for MOCVD.
abstract: A series of Ru(0) cyclooctatetraene complexes are presented with optimal properties for MOCVD (metal organic chemical vapour deposition) applications, including combinations of the two lowest melting points and lowest decomposition temperatures yet reported for such materials. The compounds are easy to handle and lead to highly conformal thin films of Ru on SiO(2) features; even within holes with aspect ratios of 40 : 1. SEM, AFM and XPS studies confirm the near ideal nature of the resulting conformal thin film.
authors: Department of Chemistry and Biochemistry, Graduate School of Engineering, Kyushu University, 744 Moto-oka, Nishi-ku, Fukuoka 819-0395, Japan.
authors: Tatsuya
authors: T
authors: Ando
authors: Naoki
authors: N
authors: Nakata
authors: Kazuharu
authors: K
authors: Suzuki
authors: Takahiro
authors: T
authors: Matsumoto
authors: Seiji
authors: S
authors: Ogo