title: Optical force stamping lithography.
abstract: Here we introduce a new paradigm of far-field optical lithography, optical force stamping lithography. The approach employs optical forces exerted by a spatially modulated light field on colloidal nanoparticles to rapidly stamp large arbitrary patterns comprised of single nanoparticles onto a substrate with a single-nanoparticle positioning accuracy well beyond the diffraction limit. Because the process is all-optical, the stamping pattern can be changed almost instantly and there is no constraint on the type of nanoparticle or substrates used.
authors: Photonics and Optoelectronics Group, Physics Department and CeNS, Ludwig-Maximilians-Universität München, Amalienstr 54, 80799 Munich, Germany.
authors: Spas
authors: S
authors: Nedev
authors: Alexander S
authors: AS
authors: Urban
authors: Andrey A
authors: AA
authors: Lutich
authors: Jochen
authors: J
authors: Feldmann
mesh_terms: D003102:Colloids / Q000737:chemistry*; D008422:Materials Testing; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D052898:Optical Tweezers; D010316:Particle Size; D010781:Photography / Q000379:methods*; D013499:Surface Properties
chemical_list: D003102:Colloids