title: Assembly of sub-10-nm block copolymer patterns with mixed morphology and period using electron irradiation and solvent annealing.
abstract: Block copolymer self-assembly generates patterns with periodicity in the ∼10-100 nm range and is increasingly recognized as a route to lithographic patterning beyond the resolution of photolithography. Block copolymers naturally produce periodic patterns with a morphology and length-scale determined by the molecular architecture, and considerable research has been carried out to extend the range of patterns that can be produced from a given block copolymer, but the ability to control the period of the pattern over a wide range and to achieve complex structures with mixed morphologies from a given block copolymer is limited. Here we show how patterns consisting of coexisting sub-10-nm spheres and cylinders and sphere patterns with a range of periods can be created using a combination of serial solvent anneal processes and electron-beam irradiation of selected areas of a film of poly(styrene-block-dimethylsiloxane). These techniques extend the capabilities of block copolymer lithography, enabling complex aperiodic nanoscale patterns to be formed from a single block copolymer thin film.
authors: Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139, United States.
authors: Jeong Gon
authors: JG
authors: Son
authors: Jae-Byum
authors: JB
authors: Chang
authors: Karl K
authors: KK
authors: Berggren
authors: Caroline A
authors: CA
authors: Ross
mesh_terms: D003460:Crystallization / Q000379:methods*; D004583:Electrons; D006244:Hardness; D008422:Materials Testing; D049329:Nanostructures / Q000737:chemistry* / Q000648:ultrastructure*; D010316:Particle Size; D011108:Polymers / Q000737:chemistry*; D012997:Solvents / Q000737:chemistry*; D013499:Surface Properties
chemical_list: D011108:Polymers; D012997:Solvents