Iridium wire grid polarizer fabricated using atomic layer deposition.
In this work, an effective multistep process toward fabrication of an iridium wire grid polarizer for UV applications involving a frequency doubling process based on ultrafast electron beam lithography and atomic layer deposition is presented. The choice of iridium as grating material is based on its good optical properties and a superior oxidation resistance. Furthermore, atomic layer deposition of iridium allows a precise adjustment of the structural parameters of the grating much better than other deposition techniques like sputtering for example. At the target wavelength of 250 nm, a transmission of about 45% and an extinction ratio of 87 are achieved.
Friedrich-Schiller-University Jena, Institute of Applied Physics, Max-Wien-Platz 1, 07749 Jena, Germany. th.weber@uni-jena.de.
Thomas
T
Weber
Thomas
T
Käsebier
Adriana
A
Szeghalmi
Mato
M
Knez
Ernst-Bernhard
EB
Kley
Andreas
A
Tünnermann