Combinatorial optimization of a molecular glass photoresist system for electron beam lithography.
Electron beam lithography is a powerful technique for the production of nanostructures but pattern quality depends on numerous interacting process variables. Orthogonal gradients of resist composition, baking temperatures, and development time as well as dose variations inside writing fields are used to prepare ternary combinatorial libraries for an efficient stepwise optimization of a molecular glass negative tone resist system.
Melville Laboratory for Polymer Synthesis, Department of Chemistry, University of Cambridge, UK.
Wolfgang-Andreas C
WA
Bauer
Christian
C
Neuber
Christopher K
CK
Ober
Hans-Werner
HW
Schmidt
D000480:Alkynes / Q000737:chemistry; D004583:Electrons; D005898:Glass / Q000737:chemistry*; D007093:Imidazoles / Q000737:chemistry; D008027:Light; D019800:Phenol / Q000737:chemistry; D011327:Printing / Q000379:methods*; D013451:Sulfonic Acids / Q000737:chemistry; D006574:Heterocyclic Compounds, 2-Ring; D048289:Imidazolidines
D000480:Alkynes; D007093:Imidazoles; D019800:Phenol; D013451:Sulfonic Acids; C092018:glycoluril; D006574:Heterocyclic Compounds, 2-Ring; D048289:Imidazolidines